公开(公告)号：JP2009055062A

公开(公告)日：2009-03-12

申请号：JP2008279191

申请日：2008-10-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment in which a liquid supply system keeps liquid in a space between the final component of the projection system and a substrate by a liquid sealing system. SOLUTION: The liquid supply system 100 is further equipped with a de-mineralizing unit 130, a distillation unit 120, and a UV radiation source 145 to purify an immersion liquid. Chemicals can be added to the immersion liquid to inhibit the growth of living organisms. The components of the liquid supply system 100 can be made of materials non-transparent to visible light to prevent the growth of living organism. COPYRIGHT: (C)2009,JPO&INPIT

公开(公告)号：JP2009055061A

公开(公告)日：2009-03-12

申请号：JP2008279190

申请日：2008-10-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment in which a liquid supply system keeps liquid in a space between the final component of the projection system and a substrate by a liquid sealing system. SOLUTION: The liquid supply system 100 is further equipped with a de-mineralizing unit 130, a distillation unit 120, and a UV radiation source 145 to purify an immersion liquid. Chemicals can be added to the immersion liquid to inhibit the growth of living organisms. The components of the liquid supply system 100 can be made of materials non-transparent to visible light to prevent the growth of living organism. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供平版印刷设备，其中液体供应系统通过液体密封系统将液体保持在投影系统的最终部件和基板之间的空间中。 解决方案：液体供应系统100还配备有去矿化单元130，蒸馏单元120和UV辐射源145以净化浸没液体。 可以将化学品加入到浸液中以抑制生物体的生长。 液体供应系统100的部件可以由对可见光不透明的材料制成，以防止生物体的生长。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2005354062A

公开(公告)日：2005-12-22

申请号：JP2005166720

申请日：2005-06-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  MARKUS FRANCISCUS ANTONIUS EUR ,  VOORMA HARM-JAN ,  FRIJNS OLAV WALDEMAR VLADIMIR

IPC: G01B11/00 ,  G01B11/26 ,  G02B5/08 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70141

Abstract: PROBLEM TO BE SOLVED: To provide a radiating system including a radiation generator and an illuminating system capable of measuring a relative position of the radiation generator to the illuminating system with the loss of energy suppressed to a minimum level. SOLUTION: The radiating system includes the radiation generator for generating a radiation beam, a radiation source and the illuminating system so as to receive the radiation beam and provide a projected beam of the radiation. The illuminating system includes a beam measuring system for measuring at least any one of the position and gradient of the radiation beam and a projector for re-directing a part of the section of the radiation beam to the beam measuring system. The beam measuring system may include several position sensors, thereby enabling the system to judge the position adjustment of the radiation source to the illuminating system. A diaphragm is connected to a collector of the radiation generator to enable the compensation of Rx, Ry and Rz besides the compensation of X, Y and Z. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种包括辐射发生器和照明系统的辐射系统，其能够以能量损失被抑制到最小水平来测量辐射发生器与照明系统的相对位置。 解决方案：辐射系统包括用于产生辐射束的辐射发生器，辐射源和照明系统，以便接收辐射束并提供投影的辐射束。 照明系统包括用于测量辐射束的位置和梯度中的至少任何一个的光束测量系统和用于将辐射束的该部分的一部分重新引导到光束测量系统的投影仪。 光束测量系统可以包括多个位置传感器，从而使系统能够判断辐射源对照明系统的位置调整。 除了X，Y和Z的补偿之外，隔膜连接到辐射发生器的收集器以使得能够补偿Rx，Ry和Rz。（C）2006，JPO和NCIPI

公开(公告)号：JP2004179663A

公开(公告)日：2004-06-24

申请号：JP2003397604

申请日：2003-11-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOWISCH MARTIN ,  DIERICHS MARCEL MATHIJS THEODO ,  VAN INGEN SCHENAU KOEN ,  VAN DER LAAN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  MCGOO ELAINE ,  MICKAN UWE

IPC: G03F1/24 ,  G03F7/20 ,  G03F7/22 ,  G03F9/02 ,  H01L21/027

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70283 ,  G03F7/706

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a device that has corrected the distortion in formed images produced because of the use of a reflective mask having a thick absorbing layer and inclined lighting in a lithography device that uses extreme ultraviolet rays as projection beams.
SOLUTION: The distortion induced by the reflective mask (MA), on the absorbing layer of which a mask pattern has been embodied, and the inclined lighting is calculated and aberration in a projection system (PL) is introduced and/or controlled in order to correct the distortion. Since this can be done by the control of the optical elements already present in the projection system (MA), there is no need to modify the device. In Zernike polynomial, it is desirable that the aberrations described above are Z2 (inclination of X), Z3 (inclination of Y), or Z7 (frame X).
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003318107A

公开(公告)日：2003-11-07

申请号：JP2003126054

申请日：2003-03-26

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BAKKER LEVINUS PIETER ,  JONKERS JEROEN ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  DIERICHS MARCEL MATHIJS THEODO

IPC: G21K1/04 ,  G03F7/20 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027 ,  H05G2/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70166 ,  G03F7/7055 ,  G21K1/04 ,  G21K1/043 ,  H05G2/00

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus for reducing causes of beam strength loss.
SOLUTION: An opening that passes through a barrier is provided, for separating two parts of the apparatus, whereby a controlled aperture is constituted so that a pulse of radiation can be radiated from one part of the apparatus to the other. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow between the first and the second parts.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种减少光束强度损失原因的光刻投影装置。 解决方案：提供穿过屏障的开口，用于分离设备的两个部分，由此构造受控孔径，使得辐射脉冲可以从设备的一部分辐射到另一部分。 受控孔径关闭辐射脉冲之间的开口，以最小化第一和第二部分之间的气体流动。 版权所有（C）2004，JPO

公开(公告)号：DE60303882T2

公开(公告)日：2006-10-05

申请号：DE60303882

申请日：2003-12-23

Applicant: ASML NETHERLANDS BV

Inventor： BAKKER LEVINUS PIETER ,  DIERICHS MARCEL MATHIJS THEODO ,  FRERIKS JOHANNES MARIA ,  SCHUURMANS FRANK JEROEN PIETER ,  VIJFVINKEL JAKOB ,  BOX WILHELMUS JOSEPHUS

IPC: G03F7/20 ,  G21K1/00 ,  G21K3/00 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027 ,  H05G2/00

Abstract: A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

公开(公告)号：SG109609A1

公开(公告)日：2005-03-30

申请号：SG200405049

申请日：2004-08-23

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20 ,  H01L21/027

Abstract: In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate with a liquid confinement system. The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms is reduced.

公开(公告)号：SG135931A1

公开(公告)日：2007-10-29

申请号：SG2003068699

申请日：2003-11-24

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT AG

Inventor： LOWISCH MARTIN ,  DIERICHS MARCEL MATHIJS THEODO ,  VAN INGEN SCHENAU KOEN ,  VAN DER LAAN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  MCGOO ELAINE ,  MICKAN UWE

IPC: G03F1/24 ,  G03F7/20 ,  G03F7/22 ,  G03F9/02 ,  H01L21/027 ,  G03F1/14

Abstract: System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z5 astigmatism, Z9 spherical, and Z12 astigmatism.

公开(公告)号：SG135034A1

公开(公告)日：2007-09-28

申请号：SG2004030987

申请日：2004-06-01

Applicant: ASML NETHERLANDS BV

Inventor： STRAAIJER ALEXANDER ,  CUMMINGS KEVIN ,  DIERICHS MARCEL MATHIJS THEODO ,  FLAGELLO DONIS GEORGE

IPC: G02B5/30 ,  G03F7/20

公开(公告)号：SG121762A1

公开(公告)日：2006-05-26

申请号：SG200301295

申请日：2003-03-17

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODO

IPC: G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: In an illumination system using mirrors, the facets of a field facet mirror focus plural source images on respective facets of a pupil facet mirror to perform the function of an integrator. A facet mask is constructed and arranged to selectively block facets of the filed or pupil facet mirrors. The facet mask has a grid selectively interposable in the projection beam to provide intermediate illumination settings. The grid has a spacing smaller than the source images but larger than the wavelength of the projection beam so that there is no diffraction.