公开(公告)号：JP2008135769A

公开(公告)日：2008-06-12

申请号：JP2007339406

申请日：2007-12-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: A liquid supply system 180 further comprises a de-mineralizing unit 130, a distillation unit 120 and a UV radiating source 145 for the purification of an immersion liquid. Chemicals can be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体供应系统使用液体限制系统在投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统180还包括去矿化单元130，蒸馏单元120和用于净化浸液的UV辐射源145。 可以将化学品添加到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2005079584A

公开(公告)日：2005-03-24

申请号：JP2004247635

申请日：2004-08-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of an immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中液体供应系统在具有液体限制系统的投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统还包括去矿化单元，蒸馏单元和用于净化浸液的UV辐射源。 可以将化学品加入到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2009055062A

公开(公告)日：2009-03-12

申请号：JP2008279191

申请日：2008-10-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment in which a liquid supply system keeps liquid in a space between the final component of the projection system and a substrate by a liquid sealing system. SOLUTION: The liquid supply system 100 is further equipped with a de-mineralizing unit 130, a distillation unit 120, and a UV radiation source 145 to purify an immersion liquid. Chemicals can be added to the immersion liquid to inhibit the growth of living organisms. The components of the liquid supply system 100 can be made of materials non-transparent to visible light to prevent the growth of living organism. COPYRIGHT: (C)2009,JPO&INPIT

公开(公告)号：JP2009055061A

公开(公告)日：2009-03-12

申请号：JP2008279190

申请日：2008-10-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment in which a liquid supply system keeps liquid in a space between the final component of the projection system and a substrate by a liquid sealing system. SOLUTION: The liquid supply system 100 is further equipped with a de-mineralizing unit 130, a distillation unit 120, and a UV radiation source 145 to purify an immersion liquid. Chemicals can be added to the immersion liquid to inhibit the growth of living organisms. The components of the liquid supply system 100 can be made of materials non-transparent to visible light to prevent the growth of living organism. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供平版印刷设备，其中液体供应系统通过液体密封系统将液体保持在投影系统的最终部件和基板之间的空间中。 解决方案：液体供应系统100还配备有去矿化单元130，蒸馏单元120和UV辐射源145以净化浸没液体。 可以将化学品加入到浸液中以抑制生物体的生长。 液体供应系统100的部件可以由对可见光不透明的材料制成，以防止生物体的生长。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：SG109609A1

公开(公告)日：2005-03-30

申请号：SG200405049

申请日：2004-08-23

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20 ,  H01L21/027

Abstract: In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate with a liquid confinement system. The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms is reduced.

公开(公告)号：DE602004029970D1

公开(公告)日：2010-12-23

申请号：DE602004029970

申请日：2004-08-25

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODORE MARIE ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  SEUNTIENS-GRUDA LEJLA

IPC: G03F7/20 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  H01L21/027