公开(公告)号：JP2010199581A

公开(公告)日：2010-09-09

申请号：JP2010031894

申请日：2010-02-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  GILISSEN NOUD JAN ,  COMPEN RENE THEODORUS PETRUS ,  KENNON JAMES

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: B24B31/112 ,  B24B35/00 ,  G03B27/58 ,  G03F7/707 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which prevents unevenness in supporting a substrate. SOLUTION: A lithographic projection apparatus includes: a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of the substrate; a support table including protrusions to support an article; a detector to detect height deviations of the protrusions; a material removing device arranged to modify a height of protrusion material; a controller coupled between the detector and the material removing device. The material removing device includes a removal tool selected from a group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种防止支撑基板的不均匀性的光刻设备。 光刻投影设备包括：光束产生系统，用于提供辐射束，对辐射束进行图案化，并将图案化的光束投射到基板的目标部分上; 支撑台，其包括用于支撑制品的突起; 用于检测突起的高度偏差的检测器; 布置成改变突起材料的高度的材料去除装置; 耦合在检测器和材料去除装置之间的控制器。 材料去除装置包括从由机械抛光装置，磁流变整理工具和单点或多点金刚石工具组成的组中选择的清除工具。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010141319A

公开(公告)日：2010-06-24

申请号：JP2009275031

申请日：2009-12-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GILISSEN NOUD JAN ,  CADEE THEODORUS PETRUS MARIA

IPC: H01L21/027

CPC classification number: G03F7/70875 ,  F25B21/00 ,  G03F7/70858 ,  Y02B30/66

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus with reduced imaging problems and/or overlay errors.
SOLUTION: The lithographic apparatus includes: a movable first object OB1 and a heat exchanger. The heat exchanger includes: a heat exchanging body BO which includes a material with electro-caloric or magneto-caloric properties and is configured to affect the temperature of the first object OB1 by exchanging heat with the movable first object; and a generator GEN configured to supply an electromagnetic field to the heat exchanging body BO to change the temperature of the heat exchanging body BO in order to cool or heat the first object OB1.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有降低的成像问题和/或重叠误差的光刻设备。 光刻设备包括：可运动的第一物体OB1和热交换器。 热交换器包括：热交换体BO，其包括具有电热量或磁热能特性的材料，并且被配置为通过与可移动第一物体交换热量来影响第一物体OB1的温度; 以及发电机GEN，被配置为向热交换体BO提供电磁场以改变热交换体BO的温度，以便冷却或加热第一物体OB1。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：WO2005064400A3

公开(公告)日：2006-03-09

申请号：PCT/EP2004014481

申请日：2004-12-20

Applicant: ASML NETHERLANDS BV ,  SMITS PETER ,  SMULDERS PATRICK JOHANNES CORN ,  ZAAL KOEN JACOBUS JOHANNES MAR ,  COX HENRIKUS HERMAN MARIE ,  OTTENS JOOST JEROEN ,  GILISSEN NOUD JAN ,  STARREVELD JEROEN

Inventor： SMITS PETER ,  SMULDERS PATRICK JOHANNES CORN ,  ZAAL KOEN JACOBUS JOHANNES MAR ,  COX HENRIKUS HERMAN MARIE ,  OTTENS JOOST JEROEN ,  GILISSEN NOUD JAN ,  STARREVELD JEROEN

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/67 ,  H02N13/00

CPC classification number: G03F7/70783

Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The lithographic apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus has a chuck system (100) for supporting an object, such as the substrate or the patterning device, in the lithographic apparatus. The chuck system includes a chuck (120) for supporting the object, a frame (110) for supporting the chuck, and a chuck support structure (114) for supporting the chuck relative to the frame. The chuck support structure includes at least one flexure element (130), which flexure element is flexible in at least one degree of freedom and is coupled to the chuck and the frame.

Abstract translation: 光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 光刻设备包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 该装置具有用于在光刻设备中支撑诸如基板或图案形成装置的物体的卡盘系统（100）。 卡盘系统包括用于支撑物体的卡盘（120），用于支撑卡盘的框架（110）和用于相对于框架支撑卡盘的卡盘支撑结构（114）。 卡盘支撑结构包括至少一个挠曲元件（130），该挠曲元件在至少一个自由度上是柔性的并且联接到卡盘和框架。

公开(公告)号：SG162668A1

公开(公告)日：2010-07-29

申请号：SG2009079930

申请日：2009-12-01

Applicant: ASML NETHERLANDS BV

Inventor： GILISSEN NOUD JAN ,  CADEE THEODORUS PETRUS MARIA

Abstract: A lithographic apparatus includes a moveable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the moveable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object. [Figure 1]

公开(公告)号：DE60225216D1

公开(公告)日：2008-04-10

申请号：DE60225216

申请日：2002-09-06

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS HENDRIKUS AN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  LOOPSTRA ERIK ROELOF ,  GILISSEN NOUD JAN ,  EURLINGS MARKUS F A

IPC: G03F7/20 ,  G21K1/04 ,  G21K5/02 ,  H01L21/027

Abstract: An illumination intensity adjustment device includes a plurality of blades disposed in the projection beam so as to cast half-shadows extending across the illumination field. The blades can be selectively rotated to increase their width perpendicular to the projection beam to control uniformity.

公开(公告)号：NL1036924A1

公开(公告)日：2009-12-03

申请号：NL1036924

申请日：2009-05-05

Applicant: ASML NETHERLANDS BV

Inventor： MONDT EVA ,  GILISSEN NOUD JAN ,  JACOBS HERNES ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VERMEULEN MARCUS MARTINUS PETRUS ,  RIEPEN MICHEL

IPC: G03F7/20

公开(公告)号：DE60225216T2

公开(公告)日：2009-03-05

申请号：DE60225216

申请日：2002-09-06

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  LOOPSTRA ERIK ROELOF ,  GILISSEN NOUD JAN ,  EURLINGS MARKUS F A

IPC: G03F7/20 ,  G21K1/04 ,  G21K5/02 ,  H01L21/027

Abstract: An illumination intensity adjustment device includes a plurality of blades disposed in the projection beam so as to cast half-shadows extending across the illumination field. The blades can be selectively rotated to increase their width perpendicular to the projection beam to control uniformity.

公开(公告)号：SG115678A1

公开(公告)日：2005-10-28

申请号：SG200402166

申请日：2004-04-20

Applicant: ASML NETHERLANDS BV

Inventor： GILISSEN NOUD JAN ,  OTTENS JOOST JEROEN ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/027 ,  H01L21/68

Abstract: A carrier for carrying a lithographic substrate or a lithographic patterning means. The carrier comprises a first member provided with an open hollow structure that is open to at least one side of the member. The carrier further comprises a second member connected to the first member, such that a closed hollow internal structure is formed between the carrier members.