公开(公告)号：NL2011276A

公开(公告)日：2014-03-10

申请号：NL2011276

申请日：2013-08-07

Applicant: ASML NETHERLANDS BV

Inventor： MOS EVERHARDUS ,  SIMONS HUBERTUS ,  BERGE PETER TEN ,  SCHOUMANS NICOLE ,  KUBIS MICHAEL ,  ABEN PAUL

IPC: G01N21/47 ,  G03F7/20

Abstract: A method of calculating process corrections for a lithographic tool, and associated apparatuses. The method comprises measuring process defect data on a substrate that has been previously exposed using the lithographic tool; fitting a process signature model to the measured process defect data, so as to obtain a model of the process signature for the lithographic tool; and using the process signature model to calculate the process corrections for the lithographic tool.

公开(公告)号：NL2009508A

公开(公告)日：2013-04-25

申请号：NL2009508

申请日：2012-09-24

Applicant: ASML NETHERLANDS BV

Inventor： KOOLEN ARMAND ,  PELLEMANS HENRICUS ,  SCHAAR MAURITS ,  VANOPPEN PETER ,  KUBIS MICHAEL

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2009079A

公开(公告)日：2013-02-27

申请号：NL2009079

申请日：2012-06-28

Applicant: ASML NETHERLANDS BV

Inventor： SCHIJNDEL MARK ,  KUBIS MICHAEL ,  WARNAAR PATRICK

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2007765A

公开(公告)日：2012-05-15

申请号：NL2007765

申请日：2011-11-10

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  BLEEKER ARNO ,  COENE WILLEM ,  KUBIS MICHAEL ,  WARNAAR PATRICK

IPC: G03F7/20