公开(公告)号：NL2004969A

公开(公告)日：2010-08-02

申请号：NL2004969

申请日：2010-06-25

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  LABETSKI DZMITRY ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2003456A

公开(公告)日：2010-05-11

申请号：NL2003456

申请日：2009-09-08

Applicant: ASML NETHERLANDS BV

Inventor： LABETSKI DZMITRY ,  VIJVER YURI

IPC: G01B13/12 ,  G03F7/20

公开(公告)号：NL2010236A

公开(公告)日：2013-03-19

申请号：NL2010236

申请日：2013-02-04

Applicant: ASML NETHERLANDS BV

Inventor： YEREMENKO SERGIY ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  LABETSKI DZMITRY ,  YAKUNIN ANDREI

IPC: G03F7/20

公开(公告)号：NL2009257A

公开(公告)日：2013-03-05

申请号：NL2009257

申请日：2012-07-31

Applicant: ASML NETHERLANDS BV

Inventor： SCHIMMEL HENDRIKUS ,  DIJKSMAN JOHAN ,  LABETSKI DZMITRY

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL1035943A1

公开(公告)日：2009-03-18

申请号：NL1035943

申请日：2008-09-16

Applicant: ASML NETHERLANDS BV

Inventor： VAN DE VIJVER YURI JOHANNES GABRIEL ,  EMPEL TJARKO ADRIAAN RUDOLF VAN ,  SCHOOT JAN BERNARD PLECHELMUS ,  SWINKELS GERARDUS HUBERTUS PETRUS MARIA ,  SCHIMMEL HENDRIKUS GIJSBERTUS ,  LABETSKI DZMITRY

IPC: G03F7/20 ,  G21K1/00 ,  H01L21/027

公开(公告)号：NL1035863A1

公开(公告)日：2009-02-24

申请号：NL1035863

申请日：2008-08-25

Applicant: ASML NETHERLANDS BV

Inventor： EMPEL TJARKO ADRIAAN RUDOLF VAN ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVICH ,  LOOPSTRA ERIK ROELOF ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SCHOOT JAN BERNARD PLECHELMUS ,  VIJVER YURI JOHANNES GABRIEL VAN DE ,  SWINKELS GERARDUS HUBERTUS PETRUS MARIA ,  SCHIMMEL HENDRIKUS GIJSBERTUS ,  LABETSKI DZMITRY

IPC: H05G2/00 ,  G03F7/20

公开(公告)号：NL2009359A

公开(公告)日：2013-03-26

申请号：NL2009359

申请日：2012-08-24

Applicant: ASML NETHERLANDS BV

Inventor： SCHIMMEL HENDRIKUS ,  DIJKSMAN JOHAN ,  LABETSKI DZMITRY

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2010218A

公开(公告)日：2013-03-07

申请号：NL2010218

申请日：2013-01-31

Applicant: ASML NETHERLANDS BV

Inventor： LABETSKI DZMITRY

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：SG183434A1

公开(公告)日：2012-09-27

申请号：SG2012062014

申请日：2011-01-31

Applicant: ASML NETHERLANDS BV

Inventor： LABETSKI DZMITRY ,  BANINE VADIM ,  LOOPSTRA ERIK ,  YAKUNIN ANDREI

Abstract: A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.

公开(公告)号：NL1036153A1

公开(公告)日：2009-05-11

申请号：NL1036153

申请日：2008-11-04

Applicant: ASML NETHERLANDS BV

Inventor： SCHIMMEL HENDRIKUS GIJSBERTUS ,  EMPEL TJARKO ADRIAAN RUDOLF VAN ,  FRERIKS JOHANNES MARIA ,  VIJVER YURI JOHANNES GABRIEL VAN ,  SWINKELS GERARDUS HUBERTUS PETRUS MARIA ,  HAAST MARC ANTONIUS MARIA ,  VERSTEEG WENDELIN JOHANNA MARIA ,  JONKERS PETER GERARDUS ,  LABETSKI DZMITRY

IPC: G03F7/20 ,  H01J37/02 ,  H01L21/02