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    Substrate support and lithographic process
    12.
    发明专利
    Substrate support and lithographic process 有权
    基板支持和图形处理

    公开(公告)号：JP2008172214A

    公开(公告)日：2008-07-24

    申请号：JP2007316876

    申请日：2007-12-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： HENNUS PIETER RENAAT MARIA ,  VAN DER MEULEN FRITS ,  OTTENS JOOST JEROEN ,  STEIJAART PETER PAUL ,  STEIJNS HUBERT MATTHIEU RICHAR ,  SMITS PETER

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

    CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To disclose a substrate support constituted to support a substrate for immersion lithographic processing. SOLUTION: The substrate support has a central part and a peripheral part, the peripheral part includes an extraction duct for extracting a liquid from an upper surface of the substrate support, and extraction duct is connected to an exit duct for duct the liquid away from the substrate support. The substrate support further includes a thermal decoupler for decreasing heat transmission between the central part and the peripheral part. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：公开一种用于支持浸没式光刻处理用基板的基板支撑体。 解决方案：基板支撑件具有中心部分和周边部分，周边部分包括用于从基板支撑件的上表面提取液体的提取管道，并且提取管道连接到出口管道，用于将液体 远离基板支撑。 衬底支撑件还包括用于减小中心部分和周边部分之间的热传递的热分离器。 版权所有（C）2008，JPO＆INPIT

    Lithography apparatus, and device manufacturing method
    14.
    发明专利
    Lithography apparatus, and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2010103549A

    公开(公告)日：2010-05-06

    申请号：JP2009282658

    申请日：2009-12-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MARIA HENNUS PIETER R ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  CORNELUS HENDRIK SMULDERS PATRICK J ,  SMITS PETER

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of efficiently sealing liquid between different regions on a substrate table.
    SOLUTION: The substrate table includes a cover plate 100 disposed on the top surface of a substrate table body MB. Having a flat and continuous top surface, the cover plate 100 can be applied to a local region-type liquid supply system. The top surface of the cover plate 100 is substantially coplanar with that of a substrate W. This makes it possible to install a seal projection portion 200 for reducing or protecting the entry of liquid into a recess between a substrate support SS and the substrate table body MB. The seal projection portion 200 connects between the bottom internal edge of the cover plate 100 and the top surface of the substrate support SS.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够有效地密封衬底台上的不同区域之间的液体的光刻设备。 解决方案：衬底台包括设置在衬底台体MB的顶表面上的盖板100。 具有平坦且连续的顶表面，盖板100可以应用于局部区域型液体供应系统。 盖板100的上表面基本上与基板W共面。这使得可以安装用于减少或保护液体进入基板支撑件SS和基板台体之间的凹部中的密封突出部分200 MB。 密封突起部分200连接在盖板100的底部内部边缘和基板支撑件SS的顶表面之间。 版权所有（C）2010，JPO＆INPIT

    Lithography equipment and device manufacturing method
    15.
    发明专利
    Lithography equipment and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2006165572A

    公开(公告)日：2006-06-22

    申请号：JP2005353110

    申请日：2005-12-07

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： MARIA HENNUS PIETER R ,  MERTENS JEROEN JOHANNES SOPHIA ,  CORNELUS HENDRIK SMULDERS PATR ,  SMITS PETER

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

    CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment which can efficiently seal a liquid between different regions of a substrate table.
    SOLUTION: The substrate table is provided with a cover plate 100 which is arranged above a main body MB of the substrate table. The cover plate 100 which has is a flat and continuous upper surface can be applied to a local region type liquid feed system. The upper surface of the cover plate 100 is approximately the same plane as the upper surface of a substrate W. A sealing projection 200 may be formed to reduce or prevent liquid to enter a recess between a substrate support SS and the main body MB of the substrate table. The sealing projection 200 connects the interior edge of the cover plate 100 and the upper surface of the substrate support SS.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供能够有效地密封衬底台的不同区域之间的液体的光刻设备。 解决方案：衬底台设置有盖板100，盖板100布置在衬底台的主体MB的上方。 具有平坦且连续的上表面的盖板100可以施加到局部区域型的液体供给系统。 盖板100的上表面与基板W的上表面大致相同。可以形成密封突起200以减少或防止液体进入基板支撑件SS和主体MB之间的凹部 底物台。 密封突起200连接盖板100的内部边缘和基板支撑件SS的上表面。 版权所有（C）2006，JPO＆NCIPI

    CHUCK SYSTEM, LITHOGRAPHIC APPARATUS USING THE SAME AND DEVICE MANUFACTURING METHOD
    16.
    发明申请
    CHUCK SYSTEM, LITHOGRAPHIC APPARATUS USING THE SAME AND DEVICE MANUFACTURING METHOD 审中-公开
    卡盘系统，使用它的平面设备和设备制造方法

    公开(公告)号：WO2005064400A3

    公开(公告)日：2006-03-09

    申请号：PCT/EP2004014481

    申请日：2004-12-20

    Applicant: ASML NETHERLANDS BV ,  SMITS PETER ,  SMULDERS PATRICK JOHANNES CORN ,  ZAAL KOEN JACOBUS JOHANNES MAR ,  COX HENRIKUS HERMAN MARIE ,  OTTENS JOOST JEROEN ,  GILISSEN NOUD JAN ,  STARREVELD JEROEN

    Inventor： SMITS PETER ,  SMULDERS PATRICK JOHANNES CORN ,  ZAAL KOEN JACOBUS JOHANNES MAR ,  COX HENRIKUS HERMAN MARIE ,  OTTENS JOOST JEROEN ,  GILISSEN NOUD JAN ,  STARREVELD JEROEN

    IPC: G03F7/20 ,  H01L21/00 ,  H01L21/67 ,  H02N13/00

    CPC classification number: G03F7/70783

    Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The lithographic apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus has a chuck system (100) for supporting an object, such as the substrate or the patterning device, in the lithographic apparatus. The chuck system includes a chuck (120) for supporting the object, a frame (110) for supporting the chuck, and a chuck support structure (114) for supporting the chuck relative to the frame. The chuck support structure includes at least one flexure element (130), which flexure element is flexible in at least one degree of freedom and is coupled to the chuck and the frame.

    Abstract translation: 光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 光刻设备包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 该装置具有用于在光刻设备中支撑诸如基板或图案形成装置的物体的卡盘系统（100）。 卡盘系统包括用于支撑物体的卡盘（120），用于支撑卡盘的框架（110）和用于相对于框架支撑卡盘的卡盘支撑结构（114）。 卡盘支撑结构包括至少一个挠曲元件（130），该挠曲元件在至少一个自由度上是柔性的并且联接到卡盘和框架。

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