公开(公告)号：US5637953A

公开(公告)日：1997-06-10

申请号：US589265

申请日：1996-01-22

Applicant: George Wakalopulos

Inventor： George Wakalopulos

IPC: H01J3/12 ,  H01J33/02 ,  H01J29/70 ,  H01J29/58

CPC classification number: H01J3/12 ,  H01J33/02

Abstract: An electron beam device has a cathode that generates a fan-shaped electron beam. A first focusing lens includes first and second plates on opposed sides of a filament. The edges of the plates closest to a positively charged anode are arcuate, so that as individual electrons are accelerated normal to the edge of the charged plates, the beam increases in length with departure from the filament. A second focusing lens includes third and fourth plates on opposed sides of the first focusing lens. Each of the third and fourth plates has an arcuate edge proximate to the positively charged anode. The plates of the first and second focusing lenses provide focusing in a widthwise direction, while defining the increase in the lengthwise direction. Preferably, the filament is also curved. In the preferred embodiment, the curvature of the plates of the first focusing lens defines a common radius with the plates of the second focusing lens. The electron beam may be projected from the interior of an evacuated tube and may have a length that is not limited by the length of the filament.

Abstract translation: 电子束装置具有产生扇形电子束的阴极。 第一聚焦透镜包括在灯丝的相对侧上的第一和第二板。 最靠近正电荷的阳极的板的边缘是弧形的，使得随着各个电子垂直于带电板的边缘加速，光束随着灯丝的长度而增加。 第二聚焦透镜在第一聚焦透镜的相对侧上包括第三和第四平板。 第三和第四板中的每一个具有靠近带正电的阳极的弧形边缘。 第一和第二聚焦透镜的板在宽度方向上提供聚焦，同时限定长度方向上的增加。 优选地，细丝也是弯曲的。 在优选实施例中，第一聚焦透镜的板的曲率与第二聚焦透镜的平板形成共同的半径。 电子束可以从真空管的内部突出并且可以具有不受长丝长度限制的长度。

公开(公告)号：US20170154750A1

公开(公告)日：2017-06-01

申请号：US14785730

申请日：2015-01-09

Applicant: TECHNOLOGY RESEARCH ASSOCIATION FOR FUTURE ADDITIVE MANUFACTURING

Inventor： Takashi SATO

IPC: H01J37/065

CPC classification number: H01J37/065 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2003/1057 ,  B22F2999/00 ,  B33Y30/00 ,  H01J3/08 ,  H01J3/12 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/06308 ,  H01J2237/0653 ,  Y02P10/295 ,  B22F2203/03 ,  B22F2202/06 ,  B22F2202/11

Abstract: When an emission current is changed, a decrease in brightness of an electron beam is prevented. An electron gun includes a cathode that emits thermoelectrons, a Wehnelt electrode that focuses the thermoelectrons, a control electrode that extracts the thermoelectrons from a distal end of said cathode, an anode that accelerates the thermoelectrons and irradiates a powder with the thermoelectrons as an electron beam, and an optimum condition collection controller that changes at least one of a bias voltage to be applied to the Wehnelt electrode and a control electrode voltage to be applied to the control electrode, and decides a combination of the bias voltage and the control electrode voltage at which the brightness of the electron beam reaches a peak.

公开(公告)号：US09256068B2

公开(公告)日：2016-02-09

申请号：US14338542

申请日：2014-07-23

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Yu Jimbo

IPC: G02B27/14 ,  H01J3/14 ,  H01J3/26 ,  G02B27/00 ,  H01J3/12 ,  H01J37/05 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  G21K1/08 ,  G01N23/20 ,  G02B27/42 ,  H01J3/04

CPC classification number: G02B27/0037 ,  G01N23/20 ,  G02B27/42 ,  G02B27/4205 ,  G21K1/08 ,  H01J3/04 ,  H01J3/12 ,  H01J3/26 ,  H01J37/05 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534

Abstract: A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector (100) is for use with a charged particle beam instrument (1) for obtaining the image and the diffraction pattern and has a hexapole field generating portion (110) for producing plural stages of hexapole fields, an octopole field superimposing portion (120) for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion (130) for deflecting a charged particle beam.

Abstract translation: 提供了一种球面像差校正器，其允许校正图像和衍射图案中的至少一个的圆度的偏差和单独进行的轴上像差校正。 球面像差校正器（100）用于带电粒子束仪器（1），用于获得图像和衍射图案，并具有用于产生多级六极场的六极场产生部分（110），八极场叠加部分 （120），用于将至少一个六极场中的至少一个叠加八极杆，以校正图像和衍射图案中的至少一个的圆度的偏差，以及用于偏转带电粒子束的偏转部分（130）。

公开(公告)号：US08835848B2

公开(公告)日：2014-09-16

申请号：US14180350

申请日：2014-02-13

Applicant: Industry-University Cooperation Foundation Sunmoon University

Inventor： Tae Sik Oh ,  Ho Seob Kim ,  Dae Wook Kim ,  Seung-Joon Ahn

IPC: H01J29/46 ,  H01J3/36 ,  H01J3/14 ,  H01J3/26

CPC classification number: H01J3/26 ,  H01J3/021 ,  H01J3/12 ,  H01J3/14 ,  H01J3/18 ,  H01J3/30 ,  H01J37/04 ,  H01J2237/1205

Abstract: An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an extraction electrode causing the emission of electrons from the electron-emitting source, a focusing electrode to which voltage is flexibly applied in response to a working distance to a target for regulating a focusing force of electron beams emitted from the electron-emitting source, an acceleration electrode accelerating electrons emitted by the extraction electrode, a limit electrode regulating an amount and a size of electron beams using electrons accelerated by the acceleration electrode, and a deflector deflecting electron beams towards the target.

Abstract translation: 提供超小型电子光学微柱。 电子光学微柱包括使用场致发射原理发射电子的电子发射源，引起来自电子发射源的电子的引出电极，响应于工作距离而被柔性施加电压的聚焦电极 用于调节从电子发射源发射的电子束的聚焦力的目标，加速由引出电极发射的电子的加速电极，限制电极使用由加速电极加速的电子来调节电子束的量和尺寸，以及 偏转器偏转电子束朝向目标。

公开(公告)号：US4795912A

公开(公告)日：1989-01-03

申请号：US15193

申请日：1987-02-17

Applicant: Alfred W. Maschke

Inventor： Alfred W. Maschke

IPC: G21K1/08 ,  H01J3/12 ,  H01J3/14

CPC classification number: H01J3/12 ,  G21K1/08

Abstract: A technique for compensating for chromatic aberration in particle beams, caused by differing particle energy levels when a beam is deflected for beam steering or beam focusing. A compensating deflection is applied to the beam upstream of its intended point of deflection. When the particles reach the point of deflection, the effect of the compensating deflection is proportional to the energy level of each particle, and compensates for the aberration that would normally occur. The point at which the compensating deflection is applied is selected to be one-fourth of a cycle in longitudinal phase space and an integral number of half-cycles in transverse phase space. With this critical spacing, the compensating deflection at the point of its application is proportional to relative phase in longitudinal phase space, but is proportional to energy level at the intended point of deflection.

Abstract translation: 一种用于补偿粒子束中的色差的技术，当束被偏转以用于光束转向或光束聚焦时，由不同的粒子能级引起。 在其预期的偏转点上游向梁施加补偿偏转。 当颗粒到达偏转点时，补偿偏转的影响与每个颗粒的能级成比例，并补偿通常发生的像差。 施加补偿偏转的点被选择为纵向相位空间中的周期的四分之一和横向相位空间中的半周期的整数。 利用这个临界间距，其应用点处的补偿偏转与纵向相位空间中的相对相位成比例，但与预期的偏转点处的能级成比例。

公开(公告)号：US4763003A

公开(公告)日：1988-08-09

申请号：US15208

申请日：1987-02-17

Applicant: Alfred W. Maschke

Inventor： Alfred W. Maschke

IPC: G21K1/087 ,  H01J3/12

CPC classification number: G21K1/087 ,  H01J3/12

Abstract: A technique for correcting spherical and other aberrations in a particle beam. Spherical aberration is caused by variations in beam behavior dependent on the cube of the radius or radial position with respect to the beam axis. To correct for such aberration, the beam is passed through multiple compensation electric field arrays, each of which has multiple rows of parallel wires stretched transversely across the beam path, the rows being biased with separate voltages to provide an electric field that varies in proportion to the cube of the distance from the central row of the array. The multiple arrays provide a cylindrically symmetrical electric field, and are oriented at a uniform angular spacing, which, for spherical aberration, is 120 degrees.

Abstract translation: 用于校正粒子束中的球面和其他像差的技术。 球面像差由取决于相对于光束轴的半径或径向位置的立方体的光束行为的变化引起。 为了校正这种像差，光束通过多个补偿电场阵列，每个阵列具有跨行束路径横向延伸的多排平行线，这些行被单独的电压偏置以提供与...成比例地变化的电场 距阵列中心行距离的立方体。 多个阵列提供圆柱对称的电场，并且以均匀的角度间隔定向，其用于球面像差为120度。

公开(公告)号：JP6178699B2

公开(公告)日：2017-08-09

申请号：JP2013232668

申请日：2013-11-11

Applicant: 株式会社日立ハイテクノロジーズ

Inventor： 池上 明 ,  土肥 英登 ,  数見 秀之 ,  小瀬 洋一 ,  鈴木 直正 ,  圓山 百代 ,  西 竜治 ,  鷹岡 昭夫

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/153

CPC classification number: H01J37/28 ,  H01J3/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/15 ,  H01J2237/2611 ,  H01J2237/2814

公开(公告)号：WO2013163450A3

公开(公告)日：2013-12-27

申请号：PCT/US2013038249

申请日：2013-04-25

Applicant: ELWHA LLC

Inventor： CHEATHAM JESSE R III ,  ECKHOFF PHILIP ANDREW ,  GATES WILLIAM ,  HYDE RODERICK A ,  ISHIKAWA MURIEL Y ,  KARE JORDIN T ,  MYHRVOLD NATHAN P ,  PAN TONY S ,  PETROSKI ROBERT C ,  TEGREENE CLARENCE T ,  TUCKERMAN DAVID B ,  WHITMER CHARLES ,  WOOD LOWELL L JR ,  WOOD VICTORIA Y H

IPC: H01J7/44 ,  H01J35/00

CPC classification number: H01J3/021 ,  H01J3/027 ,  H01J3/029 ,  H01J3/08 ,  H01J3/12 ,  H01J37/063 ,  H01J37/073 ,  H01J45/00

Abstract: A field emission device is configured as a heat engine, wherein the configuration of the heat engine is variable as a function of time.

Abstract translation: 场发射装置被配置为热引擎，其中热引擎的配置可随时间变化。

公开(公告)号：WO1981001220A1

公开(公告)日：1981-04-30

申请号：PCT/US1980001243

申请日：1980-09-19

Applicant: DEPARTMENT ENERGY US

Inventor： DEPARTMENT ENERGY US ,  KOPF D ,  CREWE A

IPC: H01J03/12

CPC classification number: B82Y15/00 ,  H01J3/12 ,  H01J37/153

Abstract: A means is provided for compensating for spherical aberration in charged particle beam devices. The means includes a sextupole (22) positioned between two focusing lenses (18, 24).

公开(公告)号：US09767985B2

公开(公告)日：2017-09-19

申请号：US14895708

申请日：2014-10-17

Applicant: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY

Inventor： Jiang Huang ,  Mingwu Fan ,  Tiaoqin Yu ,  Lige Zhang ,  Chen Zuo ,  Jun Yang ,  Yongqian Xiong ,  Kaifeng Liu ,  Gerald F. Wu ,  Lei Cao

IPC: H01J37/143 ,  H01J3/12 ,  G21K1/093 ,  G21K5/04

CPC classification number: H01J37/143 ,  G21K1/093 ,  G21K5/04 ,  H01J3/12 ,  H01J33/00 ,  H01J37/3178 ,  H01J2237/0835 ,  H01J2237/1405 ,  H01J2237/152

Abstract: Provided is a device for optimizing a diffusion section of an electron beam, comprising two groups of permanent magnets, a magnetic field formed by the four magnetic poles extending the electron beam in a longitudinal direction, and compressing the electron beam in a transverse direction, so that the electron beam becomes an approximate ellipse; another magnetic field formed by the eight magnetic poles optimizing an edge of a dispersed electron-beam bunch into an approximate rectangle; by controlling the four longitudinal connection mechanisms so that the upper magnetic yoke and the lower magnetic yoke of the first group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate ellipse, and the upper magnetic yoke and the lower magnetic yoke of the second group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate rectangle, and the process of longitudinal compression is repeated until a longitudinal size of the electron-beam bunch is reduced to 80 mm. The invention is capable of reasonably compressing a longitudinal size of an electron-beam bunch after diffusion to approximately 80 mm, which ensures optimum irradiation uniformity and efficiency, and enables the longitudinal size to be within the range of a conventional titanium window.