公开(公告)号：WO2017148650A1

公开(公告)日：2017-09-08

申请号：PCT/EP2017/052343

申请日：2017-02-03

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  DE HOON, Cornelius, Adrianus, Lambertus ,  JACOBS, Fransiscus, Mathijs ,  KAGAN, Pavel ,  STARREVELD, Jeroen, Pieter ,  WIJCKMANS, Maurice, Willem, Jozef, Etiënne

IPC: G03F7/20 ,  F16F15/02 ,  F16F15/023 ,  F16F15/027 ,  F16F9/02

Abstract: The invention relates to a vibration isolator (VI), comprising: a base (10); a coupling element (20) to be coupled to a vibration sensitive object; a decoupling mass (30); a first vibration isolator part (31) arranged between the base (10) and the decoupling mass (30); and a second vibration isolator part (40) arranged between the decoupling mass (30) and the coupling element (20), and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.

Abstract translation: 本发明涉及一种隔振器（VI），包括：底座（10）;以及底座 耦合到振动敏感物体的耦合元件（20） 一个解耦体（30）; 布置在所述基座（10）与所述解耦质量体（30）之间的第一隔振器部件（31）; 和布置在所述解耦质量体（30）与所述耦合元件（20）之间的第二隔振器部件（40），并且其中所述第一隔振器部件和所述第二隔振器部件中的至少一个包括气动隔离器。

公开(公告)号：WO2016034348A1

公开(公告)日：2016-03-10

申请号：PCT/EP2015/067889

申请日：2015-08-04

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  VAN DUIJNHOVEN, Martinus

IPC: F16F15/027

CPC classification number: F16F15/027

Abstract: The invention relates to a vibration isolation system to support a structure on a basis. The vibration isolation system being provided with a low frequency support. The vibration isolation system comprises: a force sensor to provide a force signal representative of the force; an internal force actuator for applying an internal force in parallel to the force; and, an internal force controller operably connected to the force sensor and the internal force actuator and the internal force controller is configured to control the internal force actuator on the basis of the force signal.

Abstract translation: 本发明涉及一种在基础上支撑结构的隔振系统。 隔振系统设有低频支架。 振动隔离系统包括：力传感器，用于提供代表力的力信号; 用于施加平行于该力的内力的内力致动器; 并且可操作地连接到力传感器和内力致动器和内力控制器的内力控制器构造成基于力信号来控制内力致动器。

公开(公告)号：WO2016005568A1

公开(公告)日：2016-01-14

申请号：PCT/EP2015/065858

申请日：2015-07-10

Applicant: ASML NETHERLANDS B.V.

Inventor： DAMS, Johannes, Adrianus, Antonius, Theodorus ,  ENGELEN, Dirk Hendrikus Marinus ,  HEIJMANS, Peter, Michel, Silvester, Maria ,  MARTENS, Simon, Bernardus, Cornelis, Maria ,  BUTLER, Hans ,  DE GROOT, Antonius, Franciscus, Johannes

IPC: G03F7/20

CPC classification number: G03F7/70758 ,  H02K11/21 ,  H02K11/30 ,  H02K15/06 ,  H02K41/031 ,  H02K2201/18

Abstract: An actuator (51) comprises: coil assemblies (60) arranged in an array, wherein each coil assembly defines a core chamber (61) having a core chamber height (61d); and at least one magnetic member (62) that extends partly along the core chamber height of the core chamber of a corresponding at least one coil assembly, wherein the at least one magnetic member is made of a magnetic material. At least one of a shape of the at least one magnetic member, a size of the at least one magnetic member, a position of the at least one magnetic member and the magnetic material of the at least one magnetic member may be selected so as to control one or more parameters of the actuator.

Abstract translation: 致动器（51）包括：布置成阵列的线圈组件（60），其中每个线圈组件限定具有芯室高度（61d）的芯室（61）; 以及至少一个磁性构件（62），其部分地沿着对应的至少一个线圈组件的芯室的芯室高度延伸，其中所述至少一个磁性构件由磁性材料制成。 可以选择至少一个磁性构件的形状，至少一个磁性构件的尺寸，至少一个磁性构件的位置和至少一个磁性构件的磁性材料中的至少一个，以便 控制致动器的一个或多个参数。

公开(公告)号：WO2015197260A1

公开(公告)日：2015-12-30

申请号：PCT/EP2015/060618

申请日：2015-05-13

Applicant: ASML NETHERLANDS B.V.

Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  BUTLER, Hans ,  HOOGENDAM, Christiaan, Alexander ,  KERSSEMAKERS, Sander ,  SMEETS, Bart ,  VAN BALLEGOIJ, Robertus, Nicodemus, Jacobus ,  VAN BUSSEL, Hubertus, Petrus, Leonardus, Henrica

IPC: G03F7/20 ,  G02B13/14

CPC classification number: G03F7/70258 ,  G03F7/70066 ,  G03F7/70141 ,  G03F7/70641

Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.

Abstract translation: 一种修改包括用于提供辐射束的照明系统的光刻设备的方法，用于支撑图案形成装置以将辐射束赋予其横截面图案的支撑结构，用于将辐射束投射在图案化处的第一透镜 具有第一放大率的装置，用于保持基板的基板台，以及用于以第二倍率将图案化的辐射束投影在基板的目标部分的第一投影系统。 第一透镜和第一投影系统一起提供第三放大率。 该方法包括以第一因子减小第一倍率以提供用于以第四放大率投影辐射束的第二透镜; 并且通过第一因子增加第二倍率以提供第二投影系统，用于以第五放大率将图案化的辐射束投影到基板的目标部分。

公开(公告)号：WO2015062791A1

公开(公告)日：2015-05-07

申请号：PCT/EP2014/070472

申请日：2014-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  KAMIDI, Ramidin, Izair ,  KASEMSINSUP, Yanin

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G01B9/02 ,  G01B11/002 ,  G03F7/70725

Abstract: An object positioning system includes an object (P); a measurement system (MS) for measuring the position (APOS) of the object; an actuator system (AS) for positioning the object; a control system (CU, OBS) configured to drive the actuator system, wherein each sensor of the measurement system has an associated measurement area on the object, wherein a location of at least one measurement area on the object is dependent on the position of the object, wherein the control system (CU, OBS) comprises an observer (OBS) with a dynamic model of the object to estimate an internal dynamic behavior (IDB) of the object, wherein the dynamic model includes the dependency of the location of at least one measurement area on the position of the object, and wherein the control system (CU, OBS) is configured to drive the actuator system (AS) in dependency of an output (IDB) of the observer (OBS) as well.

Abstract translation: 物体定位系统包括物体（P）; 用于测量物体的位置（APOS）的测量系统（MS）; 用于定位物体的致动器系统（AS）; 配置为驱动所述致动器系统的控制系统（CU，OBS），其中所述测量系统的每个传感器在所述物体上具有相关联的测量区域，其中所述物体上的至少一个测量区域的位置取决于所述物体的位置 对象，其中所述控制系统（CU，OBS）包括具有所述对象的动态模型的观察者（OBS）以估计所述对象的内部动态行为（IDB），其中所述动态模型包括至少所述位置的依赖性 所述对象的位置上的一个测量区域，并且其中所述控制系统（CU，OBS）被配置为依赖于所述观察者（OBS）的输出（IDB）来驱动所述致动器系统（AS）。

公开(公告)号：WO2014016163A1

公开(公告)日：2014-01-30

申请号：PCT/EP2013/064973

申请日：2013-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans

IPC: G03F7/20

CPC classification number: G03F7/70066 ,  G03F7/70341 ,  G03F7/70558 ,  G03F7/70916

Abstract: A masking device (200) for use in an immersion lithographic apparatus. The masking device comprising a blade assembly (250.1, 250.2) configured to limit a width (260) of a cross-section (270) of a radiation beam in a direction substantially perpendicular to a scanning direction. The blade assembly is further configured to adjust, during exposure of a target portion comprising a substrate edge, the width of the cross-section of the radiation beam, thereby reducing a radiation dose of the substrate edge to a value less than a nominal radiation dose of the target portion.

Abstract translation: 一种用于浸没式光刻设备的掩模装置（200）。 该遮蔽装置包括一个叶片组件（250.1,250.2），该叶片组件被配置为限制辐射束在基本上垂直于扫描方向的方向上的横截面（270）的宽度（260）。 刀片组件还被配置为在曝光包括衬底边缘的靶部分期间调整辐射束的横截面的宽度，从而将衬底边缘的辐射剂量减小到小于额定辐射剂量的值 的目标部分。

公开(公告)号：WO2013160082A1

公开(公告)日：2013-10-31

申请号：PCT/EP2013/057155

申请日：2013-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70191 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/70825

Abstract: A lithographic apparatus includes a patterning device support constructed to support a patterning device (5), the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the patterning device support including a moveable structure (3) movably arranged with respect to an object, a patterning device holder (4) movably arranged with respect to the movable structure and configured to hold the patterning device, an actuator (8) configured to move the movable structure (3) with respect to the object, and an ultra short stroke actuator (9) configured to move the patterning device holder (4) with respect to the movable structure (3); a substrate support (WT) constructed to hold a substrate (W); and a projection system (PS) configured to project the patterned radiation beam onto a target portion (C) of the substrate, a position measurement system (IF) for measuring a substrate positional error (e WS ) which is a difference between a desired position (SP WS ) of the substrate relative to a reference object and an actual position of the substrate relative to the reference object; and a controller (100, 200) configured to move the actuator (8) and the ultra short stroke actuator (9) at least partly on the basis of the substrate positional error (e WS ).

Abstract translation: 光刻设备包括构造成支撑图案形成装置（5）的图案形成装置支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，所述图案形成装置支撑件包括可移动 相对于物体可移动地布置的结构（3）;相对于可移动结构可移动地布置并构造成保持图案形成装置的图案形成装置保持器（4），构造成使可移动结构（3）与 以及超短行程致动器（9），其构造成相对于所述可移动结构（3）移动所述图案形成装置保持器（4）; 构造成保持衬底（W）的衬底支撑件（WT）; 以及投影系统（PS），其被配置为将所述图案化的辐射束投影到所述基板的目标部分（C）上;位置测量系统（IF），用于测量基板位置误差（eWS），所述位置误差是期望位置 SPWS）和基板相对于参考物体的实际位置; 以及被配置为至少部分地基于所述基板位置误差（eWS）移动所述致动器（8）和所述超短行程致动器（9）的控制器（100,200）。

公开(公告)号：WO2022144156A1

公开(公告)日：2022-07-07

申请号：PCT/EP2021/085051

申请日：2021-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： BOSCH, Niels, Johannes, Maria ,  WANG, Xu ,  HEMPENIUS, Peter, Paul ,  WANG, Yongqiang ,  BUTLER, Hans ,  WANG, Youjin ,  GRASMAN, Jasper, Hendrik ,  SUI, Jianzi ,  CHEN, Tianming ,  WU, Aimin

IPC: H01J37/21 ,  H01J37/28

Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.

公开(公告)号：WO2020160852A1

公开(公告)日：2020-08-13

申请号：PCT/EP2020/050051

申请日：2020-01-03

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  JANSEN, Bas ,  DE HOON, Cornelius, Adrianus, Lambertus

IPC: G01P15/09 ,  G01P21/00 ,  G03F7/20 ,  G01D3/032

Abstract: The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: a) a damping circuit configured to: - receive an acceleration signal from the piezoelectric element; - electronically dampen an amplitude of the first mechanical resonance frequency; and - generate a damped acceleration signal, b) an extender configured to: - receive the damped acceleration signal; - extend the frequency response; and - output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.

公开(公告)号：WO2019134775A1

公开(公告)日：2019-07-11

申请号：PCT/EP2018/082982

申请日：2018-11-29

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans

IPC: G03F7/20

Abstract: A lithographic apparatus comprises a projection system comprising position sensors to measure a position of optical elements of the projection system. The positions sensors are referenced to a sensor frame. Damping actuators damp vibrations of the sensor frame. A control device drives the actuators and is configured to derive sensor frame damping force signals from at least one of the acceleration signals and the sensor frame position signals, derive an estimated line of sight error from the position signals, determine actuator drive signals from the sensor frame damping force signals and the estimated line of sight error, drive the actuators using the actuator drive signals to dampen the sensor frame and to at least partly compensate the estimated line of sight error.