公开(公告)号：WO2019197128A2

公开(公告)日：2019-10-17

申请号：PCT/EP2019/057050

申请日：2019-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE KERKHOF, Marcus, Adrianus ,  CLOIN, Christian, Gerardus, Norbertus, Hendricus, Marie ,  YAKUNIN, Andrei, Mikhailovich ,  NIKIPELOV, Andrey ,  VAN DUIVENBODE, Jeroen

IPC: G03F7/20 ,  H01L21/683

Abstract: An apparatus comprising an electrostatic clamp for clamping a component, and a mechanism for generating free charges adjacent to the electrostatic clamp. The mechanism for generating free charges is configured to generate free charges adjacent to the electrostatic clamp during a transition from a first energisation state of the electrostatic clamp to a second energisation state of the electrostatic clamp.

公开(公告)号：WO2019015899A1

公开(公告)日：2019-01-24

申请号：PCT/EP2018/066106

申请日：2018-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： GAO, An ,  LALBAHADOERSING, Sanjaysingh ,  NIKIPELOV, Andrey ,  POLYAKOV, Alexey, Olegovich ,  PETERSON, Brennan

IPC: G03F7/20 ,  G03F9/00 ,  H01L23/544

Abstract: The present disclosure describes an apparatus (160) for determining information relating to at least one target alignment mark (114) in a semiconductor device substrate (110). The target alignment mark (114) is initially at least partially obscured by an opaque carbon or metal layer (120) on the substrate (110). The apparatus (160) includes an energy delivery system (140) configured to emit a laser beam (132) for modifying at least one portion (134) of the opaque layer (120) to cause a phase change and/or chemical change in the at least one portion (134) that increases the transparency of the portion (134). An optical signal (136) can propagate through the modified portion (134) to determine information relating to the target alignment mark (114).

公开(公告)号：WO2019001922A1

公开(公告)日：2019-01-03

申请号：PCT/EP2018/065032

申请日：2018-06-07

Applicant: ASML NETHERLANDS B.V.

Inventor： KOEVOETS, Adrianus, Hendrik ,  DE MEIJERE, Cornelis, Adrianus ,  DE RAPPER, Willem, Michiel ,  DONDERS, Sjoerd, Nicolaas, Lambertus ,  GROENEWOLD, Jan ,  LEROUX, Alain, Louis, Claude ,  NASALEVICH, Maxim, Aleksandrovich ,  NIKIPELOV, Andrey ,  PIJNENBURG, Johannes, Adrianus, Cornelis, Maria ,  VAN DER SANDEN, Jacobus, Cornelis, Gerardus

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.

公开(公告)号：WO2014124769A1

公开(公告)日：2014-08-21

申请号：PCT/EP2014/050552

申请日：2014-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： KUZNETSOV, Alexey ,  BOOGAARD, Arjen ,  HUIJBREGTSE, Jeroen ,  NIKIPELOV, Andrey ,  VAN KAMPEN, Maarten

IPC: G21K1/06 ,  H05G2/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  C23C28/34 ,  G03F1/24 ,  G03F7/70033 ,  G21K2201/067 ,  H05G2/008

Abstract: A method of manufacturing a multi-layer mirror (500) comprising a multi-layer stack of pairs of alternating layers of a first material (510) and silicon (520), the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer (540) of the first material with a dopant material.

Abstract translation: 一种制造多层反射镜（500）的方法，所述多层反射镜（500）包括第一材料（510）和硅（520）的交替层对的多层堆叠，所述方法包括沉积第一 材料和硅层，所述堆叠由衬底支撑并且用掺杂剂材料掺杂所述第一材料的至少第一层（540）。

公开(公告)号：WO2014072149A3

公开(公告)日：2014-05-15

申请号：PCT/EP2013/071141

申请日：2013-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： LOOPSTRA, Erik ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  NIKIPELOV, Andrey ,  OSORIO OLIVEROS, Edgar ,  STRUYCKEN, Alexander ,  VAN DRIEËNHUIZEN, Bert ,  VAN SCHOOT, Jan

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06 ,  G02B27/09 ,  H01S3/10 ,  H01S3/067 ,  H01S3/23 ,  H04J14/00

Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous- wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.

公开(公告)号：WO2023011849A1

公开(公告)日：2023-02-09

申请号：PCT/EP2022/069063

申请日：2022-07-08

Applicant: ASML NETHERLANDS B.V.

Inventor： HEIJMANS, Lucas, Christiaan, Johan ,  DEHNER, Imre, Rudolf, Richard ,  LAFARRE, Raymond, Wilhelmus, Louis ,  OTTENS, Cornelis, Christiaan ,  VAN DE KERKHOF, Marcus, Adrianus ,  NIKIPELOV, Andrey ,  VANOTTERDIJK, Dennis ,  SMULDERS, Edwin, Johannes, Theodorus ,  YAKUNIN, Andrei, Mikhailovich ,  SALMASO, Guido ,  VOORDECKERS, Luc ,  ANDE, Chaitanya Krishna ,  COENEN, Martinus, Jacobus, Johannes

IPC: G03F1/82 ,  G03F7/20 ,  B08B7/00

Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus comprising at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules comprise a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms comprise: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.

公开(公告)号：WO2022161771A1

公开(公告)日：2022-08-04

申请号：PCT/EP2022/050555

申请日：2022-01-12

Applicant: ASML NETHERLANDS B.V.

Inventor： NIKIPELOV, Andrey ,  VAN DER WOORD, Ties, Wouter

IPC: G03F7/20 ,  G03F1/82 ,  B08B7/00

Abstract: An apparatus for removing a contaminant from an optical element of a lithography apparatus, said apparats including a chamber for receiving the optical element, a gas supply configured to provide a gas, and a plasma generator and/or an electron/ion source to generate plasma or ions from the gas, wherein the gas comprises from about 0.01 vol% to about 10 vol% of one or more hydrocarbons and/or from about 0.01 vol% to about 50 vol% of one or more of He, Ne, and Ar, with the balance being hydrogen. Also described is a method for removing a contaminant from an optical element of a lithographic apparatus.

公开(公告)号：WO2022144179A1

公开(公告)日：2022-07-07

申请号：PCT/EP2021/086063

申请日：2021-12-16

Applicant: ASML NETHERLANDS B.V.

Inventor： NIKIPELOV, Andrey ,  FAROKHIPOOR, Saeedeh ,  VAN KAMPEN, Maarten

IPC: G02B5/08 ,  G02B1/14

Abstract: A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., mirrors of a VUV) of a wafer inspection system is disclosed. The cleaning system ionizes or disassociates the hydrogen gas in VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+), which remove water or hydrocarbons from the surface of the mirrors. The VUV mirrors may comprise a reflective material, such as aluminum. The VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may comprise a noble metal.

公开(公告)号：WO2021037662A1

公开(公告)日：2021-03-04

申请号：PCT/EP2020/073323

申请日：2020-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： NIKIPELOV, Andrey ,  BALTUSSEN, Sander ,  BANINE, Vadim, Yevgenyevich ,  DOLGOV, Alexandr ,  DONMEZ NOYAN, Inci ,  HOUWELING, Zomer, Silvester ,  NOTENBOOM, Arnoud, Willem ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER WOORD, Ties, Wouter ,  VERMEULEN, Paul, Alexander ,  VLES, David, Ferdinand ,  VORONINA, Victoria ,  YEGEN, Halil, Gökay

IPC: G03F1/62 ,  G03F7/20 ,  C01B32/158 ,  D01F9/12 ,  D01F11/12

Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.

公开(公告)号：WO2021037472A1

公开(公告)日：2021-03-04

申请号：PCT/EP2020/071424

申请日：2020-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： UEBEL, Patrick, Sebastian ,  BAUERSCHMIDT, Sebastian, Thomas ,  GÖTZ, Peter, Maximilian ,  NIKIPELOV, Andrey ,  ABDOLVAND, Amir ,  UZUNBAJAKAVA, Natallia, Eduardauna

IPC: G02F1/3501 ,  G02F1/365

Abstract: A system and method for providing a light source is disclosed. In one arrangement, the light source comprises a gas cell having a window, an optical fiber that is hollow and has an axial direction, an end thereof being enclosed within the gas cell and optically coupled to the window via an optical path, and a surface, disposed around the end of the optical fiber, and extending past the end of the optical fiber in the axial direction towards the window so as to limit one or more of: the exchange of gas between the optical path and the remainder of the gas cell; ingress of plasma towards or into the optical fiber; and radical flux towards etch-susceptible surfaces.