22.
    发明专利
    未知

    公开(公告)号:DE19926767A1

    公开(公告)日:2000-12-21

    申请号:DE19926767

    申请日:1999-06-11

    Abstract: Two source/drain regions (12, 22, 32) between which a channel region is arranged are provided for in a semiconductor substrate (11, 21, 31). A gate dielectric comprising a dielectric intermediate layer (13, 23, 33) and a dielectric structure (14, 24, 34) is positioned on the surface of the channel region. The dielectric structure (14, 24, 34) borders on the dielectric intermediate layer (12, 22, 32) on at least one side which is directed towards one of the source/drain regions (12, 22, 32), whereby the thickness of the gate dielectric above the edge of the source/drain region is greater than the thickness of the dielectric intermediate layer.

    23.
    发明专利
    未知

    公开(公告)号:DE19926766A1

    公开(公告)日:2000-12-21

    申请号:DE19926766

    申请日:1999-06-11

    Abstract: According to the invention, two source/drain regions (121, 122) between which a channel region is arranged are provided for on a semiconductor substrate. On the surface of the channel region a gate dielectric (13) is positioned. Above the gate dielectric (13) a ferroelectric layer (14) and a gate electrode (15) are arranged. The ferroelectric layer (14) overlaps one of the source/drain regions (121). To change the polarization of the ferroelectric layer (14) a voltage can be applied between the gate electrode (15) and the overlapped source/drain region (121).

    24.
    发明专利
    未知

    公开(公告)号:DE50305038D1

    公开(公告)日:2006-10-26

    申请号:DE50305038

    申请日:2003-03-28

    Abstract: Device having a flat macroporous support material made of silicon and having surfaces, a plurality of pores each having a diameter in a range of from 500 nm to 100 mum distributed over at least one surface region of the support material and extending from one surface through to the opposite surface of the support material, at least one region having one or more pores with SiO2 pore walls, and a frame of walls with a silicon core surrounding the at least one region and arranged essentially parallel to longitudinal axes of the pores and open towards the surfaces, wherein the silicon core merges into silicon dioxide over a cross section towards an outer side of the walls forming the frame.

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