公开(公告)号：MY158269A

公开(公告)日：2016-09-30

申请号：MYPI20082348

申请日：2006-12-08

Applicant: LAM RES CORP

Inventor： JOHN PARKS ,  REDEKER FRED C ,  MIKHAIL KOROLIK ,  KATRINA MIKHAYLICHENKO ,  CLINT THOMAS ,  FREER ERIK M ,  DE LARIOS JOHN M ,  RAVKIN MICHAEL

IPC: B08B7/00

Abstract: 39 METHOD AND APPARATUS FOR REMOVING CONTAMINATION FROM SUBSTRATE ABSTRACT A CLEANING MATERIAL IS DISPOSED OVER A SUBSTRATE. THE CLEANING MATERIAL INCLUDES SOLID COMPONENTS DISPERSED WITHIN A LIQUID MEDIUM. A FORCE IS APPLIED TO THE SOLID 5 COMPONENTS WITHIN THE LIQUID MEDIUM TO BRING THE SOLID COMPONENTS WITHIN PROXIMITY TO CONTAMINANTS PRESENT ON THE SUBSTRATE. THE FORCE APPLIED TO THE SOLID COMPONENTS CAN BE EXERTED BY AN IMMISCIBLE COMPONENT WITHIN THE LIQUID MEDIUM. WHEN THE SOLID COMPONENTS ARE BROUGHT WITHIN SUFFICIENT PROXIMITY TO THE CONTAMINANTS, AN INTERACTION IS ESTABLISHED BETWEEN THE SOLID COMPONENTS AND THE CONTAMINANTS. THEN, THE SOLID 10 COMPONENTS ARE MOVED AWAY FROM THE SUBSTRATE SUCH THAT THE CONTAMINANTS HAVING INTERACTED WITH THE SOLID COMPONENTS ARE REMOVED FROM THE SUBSTRATE.

公开(公告)号：MY149895A

公开(公告)日：2013-10-31

申请号：MYPI20082420

申请日：2006-12-18

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  DELARIOS JOHN M ,  KATRINA MIKHAYLICHENKO ,  MICHAEL RAVKIN ,  MIKHAIL KOROLIK ,  REDEKER FRITZ C

IPC: B08B3/00

Abstract: A METHOD AND SYSTEM (10) FOR CLEANING A SURFACE, HAVING PARTICULATE MATTER THEREON, OF A SUBSTRATE FEATURES IMPINGING UPON THE SURFACE OF A JET (108) OF A LIQUID HAVING COUPLING ELEMENTS (94) ENTRAINED THEREIN. A SUFFICIENT DRAG FORCE IS IMPARTED UPON THE COUPLING ELEMENTS TO HAVE THE SAME MOVE WITH RESPECT TO THE LIQUID AND CAUSE THE PARTICULATE MATTER TO MOVE WITH RESPECT TO THE SUBSTRATE.

公开(公告)号：SG133541A1

公开(公告)日：2007-07-30

申请号：SG2006087407

申请日：2006-12-15

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  LARIOS JOHN M DE ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C

Abstract: Methods for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causing the particle to be removed along with the tri-state body.

公开(公告)号：SG154438A1

公开(公告)日：2009-08-28

申请号：SG2009044637

申请日：2006-11-29

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  LARIOS JOHN M DE ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C

Abstract: A cleaning compound is provided. The cleaning compound includes about 0.1 weight percent to about 10 weight percent of a fatty acid dispersed in water. The cleaning compound includes an amount of a base sufficient to bring a pH of the fatty acid water solution to about a level where above about 50% of the dispersed fatty acid is ionized. A method for cleaning a substrate, a system for cleaning a substrate, and a cleaning solution prepared by a process are also provided.

公开(公告)号：SG133543A1

公开(公告)日：2007-07-30

申请号：SG2006087423

申请日：2006-12-15

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  LARIOS JOHN M DE ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C ,  THOMAS CLINT ,  PARKS JOHN

Abstract: An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.

公开(公告)号：SG133499A1

公开(公告)日：2007-07-30

申请号：SG2006083448

申请日：2006-11-29

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  LARIOS JOHN M DE ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C

Abstract: A cleaning compound is provided. The cleaning compound includes about 0.1 weight percent to about 10 weight percent of a fatty acid dispersed in water. The cleaning compound includes an amount of a base sufficient to bring a pH of the fatty acid water solution to about a level where above about 50% of the dispersed fatty acid is ionized. A method for cleaning a substrate, a system for cleaning a substrate, and a cleaning solution prepared by a process are also provided.

公开(公告)号：SG133491A1

公开(公告)日：2007-07-30

申请号：SG2006080493

申请日：2006-11-20

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  LARIOS JOHN M DE ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C

Abstract: A method is provided for removing contamination from a substrate. The method includes applying a cleaning solution having a dispersed phase, a continuous phase and particles dispersed within the continuous phase to a surface of the substrate. The method includes forcing one of the particles dispersed within the continuous phase proximate to one of the surface contaminants. The forcing is sufficient to overcome any repulsive forces between the particles and the surface contaminants so that the one of the particles and the one of the surface contaminants are engaged. The method also includes removing the engaged particle and surface contaminant from the surface of the substrate. A process to manufacture the cleaning material is also provided.