公开(公告)号：US20170233891A1

公开(公告)日：2017-08-17

申请号：US15519220

申请日：2015-10-15

Applicant: The University of Melbourne

Inventor： Afaq Habib Piracha ,  Steven Prawer ,  Kumaravelu Ganesan ,  Snjezana Tomljenovic-Hanic ,  Desmond Lau

IPC: C30B25/20 ,  B23K26/00 ,  C23C16/27 ,  C23C16/04 ,  C23C16/44 ,  B81C3/00 ,  C25F3/02 ,  C30B29/04 ,  C30B25/04 ,  C30B33/10 ,  C30B33/12 ,  B23K26/362 ,  C23C16/56

CPC classification number: C30B25/20 ,  B23K26/0006 ,  B23K26/362 ,  B23K2103/50 ,  B81C3/001 ,  B81C2201/0143 ,  B81C2201/0146 ,  B81C2201/0187 ,  B81C2201/0198 ,  C23C16/042 ,  C23C16/274 ,  C23C16/279 ,  C23C16/4408 ,  C23C16/56 ,  C25F3/02 ,  C30B25/04 ,  C30B25/18 ,  C30B29/04 ,  C30B33/10 ,  C30B33/12

Abstract: The present disclosure provides a method of fabricating a diamond membrane. The method comprises providing a substrate and a support structure. The substrate comprises a diamond material having a first surface and the substrate further comprises a sub-surface layer that is positioned below the first surface and has a crystallographic structure that is different to that of the diamond material. The sub-surface layer is positioned to divide the diamond material into first and second regions wherein the first region is positioned between the first surface and the sub-surface layer. The support structure also comprises a diamond material and is connected to, and covers a portion of, the first surface of the substrate. The method further comprises selectively removing the second region of the diamond material from the substrate by etching away at least a portion of the sub-surface layer of the substrate.

公开(公告)号：US09466464B1

公开(公告)日：2016-10-11

申请号：US14694710

申请日：2015-04-23

Applicant: Multibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Michael C. Smayling ,  Theodore A. Prescop

IPC: H01J37/30 ,  H01J37/305 ,  H01J37/22 ,  H01J37/05 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01L21/3065 ,  B81C1/00373 ,  B81C2201/0143 ,  B81C2201/0188 ,  C23C14/48 ,  C23C16/047 ,  C23C16/48 ,  C23C16/486 ,  C23C16/487 ,  H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/0635 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31708 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/26 ,  H01L21/308 ,  H01L21/3085 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: Methods, devices and systems for patterning of substrates using charged particle beams without photomasks and without a resist layer. Material can be removed from a substrate, as directed by a design layout database, localized to positions targeted by multiple, matched charged particle beams. Reducing the number of process steps, and eliminating lithography steps, in localized material removal has the dual benefit of reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Furthermore, highly localized, precision material removal allows for controlled variation of removal rate and enables creation of 3D structures or profiles. Local gas injectors and detectors, and local photon injectors and detectors, are local to corresponding ones of the columns, and can be used to facilitate rapid, accurate, targeted substrate processing.

Abstract translation: 用于使用没有光掩模并且没有抗蚀剂层的带电粒子束来图案化衬底的方法，装置和系统。 材料可以从设计布局数据库指导的基板上移除，该设计布局数据库被定位到由多个匹配的带电粒子束瞄准的位置。 在局部材料去除中减少工艺步骤的数量和消除光刻步骤具有减少制造周期时间并通过降低缺陷引入概率来提高产量的双重优点。 此外，高度局部化的精密材料去除允许控制的去除速率的变化，并且能够创建3D结构或轮廓。 本地气体注入器和检测器以及本地光子注入器和检测器对应于相应的列是局部的，并且可以用于促进快速，准确的靶向基板处理。

公开(公告)号：US20160279944A1

公开(公告)日：2016-09-29

申请号：US15174275

申请日：2016-06-06

Applicant: OCE-TECHNOLOGIES B.V.

Inventor： Hans REINTEN ,  Hendrik J. STOLK ,  Alex N. WESTLAND

IPC: B41J2/14 ,  B81C1/00

CPC classification number: B41J2/14201 ,  B41J2/14233 ,  B41J2/161 ,  B41J2/1623 ,  B41J2002/14362 ,  B81C1/00269 ,  B81C2201/0143 ,  B81C2203/032 ,  H01L24/03

Abstract: A MEMS chip having at least two chip components bonded together by means of an adhesive layer that is applied to at least one of two mating bonding surfaces of the two components, wherein a pattern of finely distributed micro-cavities is formed in at least one of the two mating bonding surfaces, said micro-cavities being arranged to accommodate a major part of the adhesive.

Abstract translation: 一种具有至少两个芯片部件的MEMS芯片，其通过粘合剂层粘合在一起，所述粘合剂层被施加到两个部件的两个匹配粘合表面中的至少一个上，其中精细分布的微型腔的图案形成在 所述两个配合结合表面，所述微腔被布置成容纳粘合剂的主要部分。

公开(公告)号：US09453281B1

公开(公告)日：2016-09-27

申请号：US14745463

申请日：2015-06-21

Applicant: Multibeam Corporation

Inventor： Theodore A. Prescop ,  Kevin M. Monahan ,  David K. Lam ,  Michael C. Smayling

IPC: C23C16/48 ,  H01J37/08 ,  H01J37/30 ,  H01J37/244 ,  H01J37/06

CPC classification number: H01L21/3065 ,  B81C1/00373 ,  B81C2201/0143 ,  B81C2201/0188 ,  C23C14/48 ,  C23C16/047 ,  C23C16/48 ,  C23C16/486 ,  C23C16/487 ,  H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/0635 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31708 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/26 ,  H01L21/308 ,  H01L21/3085 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: Methods, devices and systems for patterning of substrates using charged particle beams without photomasks and without a resist layer. Material can be deposited onto a substrate, as directed by a design layout database, localized to positions targeted by multiple, matched charged particle beam columns. Reducing the number of process steps, and eliminating lithography steps, in localized material addition has the dual benefit of reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Furthermore, highly localized, precision material deposition allows for controlled variation of deposition rate and enables creation of 3D structures. Local gas injectors and detectors, and local photon injectors and detectors, are local to corresponding ones of the columns, and can be used to facilitate rapid, accurate, targeted, highly configurable substrate processing, advantageously using large arrays of said beam columns.

Abstract translation: 用于使用没有光掩模并且没有抗蚀剂层的带电粒子束来图案化衬底的方法，装置和系统。 材料可以沉积到衬底上，如设计布局数据库所指示的那样，被定位到由多个匹配的带电粒子束柱靶向的位置上。 减少工艺步骤的数量和消除光刻步骤在局部化材料添加中具有减少制造周期时间并通过降低缺陷引入概率来提高产量的双重优点。 此外，高度局部化的精密材料沉积允许沉积速率的受控变化并且能够创建3D结构。 局部气体注入器和检测器以及本地光子注入器和检测器对于相应的列是局部的，并且可以用于促进快速，准确，有针对性的高度可配置的衬底处理，有利地使用所述束柱的大阵列。

公开(公告)号：US20160088414A1

公开(公告)日：2016-03-24

申请号：US14849582

申请日：2015-09-09

Applicant: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION

Inventor： CHAO ZHENG ,  WEIGANG LI

IPC: H04R31/00 ,  H04R19/00 ,  H04R19/04 ,  B81C1/00

CPC classification number: H04R31/00 ,  B81B2201/0257 ,  B81C1/00801 ,  B81C2201/014 ,  B81C2201/0143 ,  H04R19/005 ,  H04R19/04 ,  H04R2201/003

Abstract: A method of fabricating a micro electrical-mechanical system (MEMS) microphone on a substrate includes forming a sacrificial layer on a front surface of the substrate, forming a membrane within the sacrificial layer, forming a fixed plate on the sacrificial layer at a location corresponding to a location of the membrane, performing a laser cutting on the back surface of the substrate at a location corresponding to an edge region of the fixed plate until a surface of the sacrificial layer is expose to form an opening, forming a patterned photoresist layer on the back surface exposing a region within the boundary of the opening, removing a portion of the back surface using the patterned photoresist layer as a mask to form a cavity, and removing a portion of the sacrificial layer above and below the membrane to form an air gap between the membrane and the fixed plate.

Abstract translation: 在衬底上制造微电子机械系统（MEMS）麦克风的方法包括在衬底的前表面上形成牺牲层，在牺牲层内形成膜，在牺牲层上形成固定板，位于对应的位置 到所述膜的位置，在对应于所述固定板的边缘区域的位置处在所述基板的所述背面上进行激光切割，直到所述牺牲层的表面暴露以形成开口，以形成图案化的光致抗蚀剂层 后表面露出开口边界内的区域，使用图案化的光致抗蚀剂层作为掩模去除背面的一部分以形成空腔，以及去除膜上方和下方的牺牲层的一部分以形成空气 膜与固定板之间的间隙。

公开(公告)号：US20150077744A1

公开(公告)日：2015-03-19

申请号：US14385750

申请日：2012-03-23

Applicant: Valery K. Smirnov ,  Dmitry S. Kibalov

Inventor： Valery K. Smirnov ,  Dmitry S. Kibalov

IPC: G01N21/65 ,  C23C14/34

CPC classification number: G01N21/658 ,  B81C1/00031 ,  B81C2201/0143 ,  B82Y15/00 ,  B82Y40/00 ,  C23C14/3442 ,  G01N2201/06113 ,  Y10S977/81

Abstract: A nanostructured arrangement includes a substrate having a surface and comprising a metal and a nanostructured layer formed on the substrate surface by an ion beam. The nanostructured layer includes a plurality of hollow metal nanospheres. Each of the plurality of nanospheres includes a chemical compound formed from the metal of the substrate by the ion beam. An example of a nanostructured arrangement is a surface enhanced Raman scattering (SERS) sensor.

Abstract translation: 纳米结构布置包括具有表面并且包括通过离子束在衬底表面上形成的金属和纳米结构层的衬底。 纳米结构层包括多个中空金属纳米球。 多个纳米球中的每一个包括通过离子束从衬底的金属形成的化合物。 纳米结构布置的示例是表面增强拉曼散射（SERS）传感器。

公开(公告)号：US08979247B2

公开(公告)日：2015-03-17

申请号：US13146513

申请日：2010-01-20

Applicant: Paul A. Hoisington ,  Marc A. Torrey

Inventor： Paul A. Hoisington ,  Marc A. Torrey

IPC: B41J2/14 ,  H01L21/62 ,  B41J2/45 ,  B81C1/00

CPC classification number: B81C1/00904 ,  B81B2201/058 ,  B81C1/00119 ,  B81C2201/0143 ,  B81C2201/019

Abstract: A MEMS device is described that has a body with a component bonded to the body. The body has a main surface and a side surface adjacent to the main surface and smaller than the main surface. The body is formed of a material and the side surface is formed of the material and the body is in a crystalline structure different from the side surface. The body includes an outlet in the side surface and the component includes an aperture in fluid connection with the outlet.

Abstract translation: 描述了具有结合到身体的部件的主体的MEMS装置。 主体具有与主表面相邻并且小于主表面的主表面和侧表面。 主体由材料形成，侧表面由材料形成，并且主体是与侧面不同的晶体结构。 主体包括侧表面中的出口，并且部件包括与出口流体连接的孔。

公开(公告)号：US20150036346A1

公开(公告)日：2015-02-05

申请号：US14367803

申请日：2012-12-20

Applicant: The Swatch Group Research and Development Ltd

Inventor： Thierry Hessler ,  Silvio Dalla Piazza

IPC: H03H9/19 ,  H01L41/332 ,  H03H9/215 ,  F21V17/02 ,  H01L41/047

CPC classification number: H03H9/19 ,  B23K26/53 ,  B81B2201/0271 ,  B81B2203/0118 ,  B81C1/00595 ,  B81C2201/0143 ,  F21V17/02 ,  G04B17/066 ,  G04B17/345 ,  G04C3/12 ,  G04F5/063 ,  G04G17/02 ,  H01L41/0475 ,  H01L41/332 ,  H03H9/215

Abstract: The present invention concerns a method for manufacturing a resonator in a substrate characterized in that it includes the following steps: a) modifying the structure of at least one region of the substrate in order to make said at least one region more selective; b) etching said at least one region in order to selectively manufacture said resonator.

Abstract translation: 本发明涉及一种用于在衬底中制造谐振器的方法，其特征在于其包括以下步骤：a）修改衬底的至少一个区域的结构，以便使所述至少一个区域更具选择性; b）蚀刻所述至少一个区域以选择性地制造所述谐振器。

公开(公告)号：US08851442B2

公开(公告)日：2014-10-07

申请号：US12017944

申请日：2008-01-22

Applicant: Robert J. Carlson

Inventor： Robert J. Carlson

IPC: B29C33/56 ,  B81C1/00 ,  B81C99/00

CPC classification number: B29C33/3842 ,  B29C41/00 ,  B29C59/14 ,  B29C59/16 ,  B29K2909/00 ,  B29K2995/0037 ,  B81B7/00 ,  B81B2201/05 ,  B81B2201/058 ,  B81B2203/0127 ,  B81C99/009 ,  B81C2201/0132 ,  B81C2201/0143 ,  B81C2201/034 ,  C23F1/02 ,  H01L21/30604 ,  Y10T428/24496

Abstract: The invention is directed to a patterned aerogel-based layer that serves as a mold for at least part of a microelectromechanical feature. The density of an aerogel is less than that of typical materials used in MEMS fabrication, such as poly-silicon, silicon oxide, single-crystal silicon, metals, metal alloys, and the like. Therefore, one may form structural features in an aerogel-based layer at rates significantly higher than the rates at which structural features can be formed in denser materials. The invention further includes a method of patterning an aerogel-based layer to produce such an aerogel-based mold. The invention further includes a method of fabricating a microelectromechanical feature using an aerogel-based mold. This method includes depositing a dense material layer directly onto the outline of at least part of a microelectromechanical feature that has been formed in the aerogel-based layer.

Abstract translation: 本发明涉及用作至少部分微机电特征的模具的图案化气凝胶基层。 气凝胶的密度小于MEMS制造中使用的典型材料的密度，例如多晶硅，氧化硅，单晶硅，金属，金属合金等。 因此，可以以明显高于在较致密的材料中形成结构特征的速率的速率在气凝胶层中形成结构特征。 本发明还包括一种图案化气凝胶层以产生这种基于气凝胶的模具的方法。 本发明还包括使用基于气凝胶的模具制造微机电特征的方法。 该方法包括将致密材料层直接沉积在已经形成在气凝胶层中的微机电特征的至少一部分的轮廓上。

公开(公告)号：US08652419B2

公开(公告)日：2014-02-18

申请号：US13758450

申请日：2013-02-04

Applicant: Fujikura Ltd.

Inventor： Satoshi Yamamoto ,  Tatsuo Suemasu

IPC: B05D3/06 ,  B05D3/10

CPC classification number: B05D3/06 ,  B01L3/502707 ,  B01L3/502715 ,  B01L2300/0654 ,  B01L2300/0816 ,  B01L2300/0851 ,  B01L2300/0877 ,  B01L2300/168 ,  B01L2400/086 ,  B05D3/10 ,  B81B2201/058 ,  B81B2203/033 ,  B81B2203/0361 ,  B81B2207/056 ,  B81C1/00063 ,  B81C1/00515 ,  B81C2201/0143 ,  G01N21/554 ,  G01N21/6452 ,  G01N21/648

Abstract: A method of manufacturing a microfluidic chip includes: irradiating, with a laser light, an area to be provided with a valley for storing a fluid on a surface of a substrate so as to form a modified region having a periodic pattern formed in a self-organizing manner in a light-collecting area of the laser light, the laser light having a pulse width for which the pulse duration is on the order of picoseconds or less; carrying out an etching treatment on the substrate in which the modified region is formed, removing at least some of the modified portion so as to provide the valley, and forming a periodic structure having a plurality of groove portions along one direction which have a surface profile based on the periodic pattern on at least a bottom surface of the valley; and forming a metal layer that covers the periodic structure of the bottom surface.

Abstract translation: 一种微流体芯片的制造方法，其特征在于，具备：激光照射在基板表面上设置有用于存储流体的谷部的区域，形成具有形成于所述自流体的周期性图案的改质区域， 在激光的聚光区域中组织的方式，具有脉冲宽度大约为皮秒或更小的脉冲宽度的激光; 对其中形成有改质区域的基板进行蚀刻处理，除去至少一部分改性部分以提供谷部，并形成沿着一个方向具有多个凹槽部分的周期性结构，其具有表面轮廓 基于谷的至少底表面上的周期性图案; 并形成覆盖底面的周期性结构的金属层。