公开(公告)号：WO2020141140A1

公开(公告)日：2020-07-09

申请号：PCT/EP2019/087015

申请日：2019-12-24

Applicant: ASML NETHERLANDS B.V.

Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  NOOT, Marc, Johannes ,  BHATTACHARYYA, Kaustuve ,  DEN BOEF, Arie, Jeffrey ,  GRZELA, Grzegorz ,  DAVIS, Timothy, Dugan ,  ZWIER, Olger, Victor ,  HUIJGEN, Ralph, Timotheus ,  ENGBLOM, Peter, David ,  GEMMINK, Jan-Willem

IPC: G03F7/20 ,  G06T5/00 ,  G06T5/50

Abstract: A method provides the steps of receiving an image from a metrology tool, determining individual units of said image and discriminating the units which provide accurate metrology values. The images are obtained by measuring the metrology target at multiple wavelengths. The discrimination between the units, when these units are pixels in said image, is based on calculating a degree of similarity between said units.

公开(公告)号：WO2019002003A1

公开(公告)日：2019-01-03

申请号：PCT/EP2018/066117

申请日：2018-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： BHATTACHARYYA, Kaustuve ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  NOOT, Marc, Johannes ,  DEN BOEF, Arie, Jeffrey ,  HAJIAHMADI, Mohammadreza ,  FARHADZADEH, Farzad

IPC: G03F7/20

Abstract: A method including: for a metrology target, having a first biased target structure and a second differently biased target structure, created using a patterning process, obtaining metrology data including signal data for the first target structure versus signal data for the second target structure, the metrology data being obtained for a plurality of different metrology recipes and each metrology recipe specifying a different parameter of measurement; determining a statistic, fitted curve or fitted function through the metrology data for the plurality of different metrology recipes as a reference; and identifying at least two different metrology recipes that have a variation of the collective metrology data of the at least two different metrology recipes from a parameter of the reference that crosses or meets a certain threshold.

公开(公告)号：WO2018153609A1

公开(公告)日：2018-08-30

申请号：PCT/EP2018/051843

申请日：2018-01-25

Applicant: ASML NETHERLANDS B.V.

Inventor： ROOBOL, Sander, Bas ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  BÄUMER, Stefan, Michael, Bruno

IPC: G03F7/20 ,  G01B11/00 ,  G02B5/18 ,  G11B7/1353

Abstract: A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning (558) the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized (552) to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (p IR ) and a second periodic structure with a second pitch (p SXR ). After alignment, the vacuum system is pumped down (562) and in operation the SXR operating beam is generated (564) by a high harmonic generation (HHG) optical source pumped by the IR alignment beam' optical source.

公开(公告)号：WO2018050350A1

公开(公告)日：2018-03-22

申请号：PCT/EP2017/069506

申请日：2017-08-02

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN VOORST, Peter, Danny ,  LIN, Nan ,  ROOBOL, Sander, Bas ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  VAN DER POST, Sietse, Thijmen

IPC: G01N21/95 ,  G03F7/20

Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

Abstract translation: 公开了一种用于测量基板上的目标结构的检查设备和相关联的方法。 检查设备包括用于产生测量辐射的照明源; 用于将测量辐射聚焦到所述目标结构上的光学装置; 和补偿光学装置。 补偿光学装置可以包括SLM，SLM可操作用于空间调制测量辐射的波前，以补偿所述光学装置中的不均匀制造缺陷。 在替代实施例中，补偿光学装置可以位于测量辐射束中，或位于用于在HHG源中产生高次谐波辐射的泵浦辐射束中。 在位于泵浦辐射光束中的情况下，补偿光学装置可以用于校正指向误差，或者在测量辐射光束中赋予期望的轮廓或变化的照明图案。

公开(公告)号：WO2017178133A1

公开(公告)日：2017-10-19

申请号：PCT/EP2017/053293

申请日：2017-02-14

Applicant: ASML NETHERLANDS B.V.

Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  GOOSEN, Maikel, Robert

IPC: G03F9/00

CPC classification number: G03F9/7046 ,  G01B11/272 ,  G03F9/7069 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: A method of determining positions of marks on a substrate, the marks comprising structures arranged periodically in at least a first direction, at least some of the structures comprising periodic sub-structures, the sub-structures having a smaller period than the structures, the marks being formed with positional offsets between the sub-structures and the structures, the positional offsets being caused by a combination of both known and unknown components, the method comprising illuminating a plurality of the marks with radiation beams having different characteristics and detecting radiation diffracted by the marks using one or more detectors which produce output signals processing the signals, wherein the processing comprises discriminating between constituent parts of the signals, the discriminating being based on a variation of the signals as a function of spatial positions of the marks on the substrate, selecting at least one of the constituent parts of the signals, and using the at least one selected constituent part of the signals, and information relating to differences between the known components, to calculate a corrected position of at least one mark.

Abstract translation: 一种确定衬底上的标记位置的方法，所述标记包括在至少第一方向上周期性排列的结构，至少一些所述结构包括周期性子结构，所述子结构具有 所述标记由所述子结构和所述结构之间的位置偏移形成，所述位置偏移由已知和未知分量的组合引起，所述方法包括用辐射束照射多个标记，所述辐射束具有 使用一个或多个产生处理信号的输出信号的检测器检测由标记衍射的不同特性和辐射，其中所述处理包括区分信号的组成部分，所述区分基于作为空间位置的函数的信号的变化 选择信号的组成部分中的至少一个，a nd使用信号的至少一个选择的组成部分和与已知组分之间的差异有关的信息来计算至少一个标记的校正位置。

公开(公告)号：WO2017036833A1

公开(公告)日：2017-03-09

申请号：PCT/EP2016/069776

申请日：2016-08-22

Applicant: STICHTING VU ,  UNIVERSITEIT VAN AMSTERDAM ,  STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE ,  ASML NETHERLANDS B.V.

Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  DEN BOEF, Arie, Jeffrey ,  PANDEY, Nitesh ,  TINNEMANS, Patricius, Aloysius, Jacobus ,  WITTE, Stefan, Michiel ,  EIKEMA, Kjeld, Sijbrand, Eduard

IPC: G03F9/00

CPC classification number: G03F9/7088 ,  G03F9/7046 ,  G03F9/7092

Abstract: A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.

Abstract translation: 光刻设备包括：衬底台，用于保持衬底; 以及传感器，其被配置为感测设置在由所述基板台保持的所述基板上的对准标记的位置。 传感器包括被配置为用辐射束照射对准标记的辐射源，检测器被配置为检测与对准标记相互作用的辐射束，作为失焦光学图案，以及数据处理系统。 数据处理系统被配置为接收表示失焦光学图案的图像数据，并处理用于确定对准信息的图像数据，包括将无镜头成像算法应用于失焦光学图案。

公开(公告)号：WO2016192865A1

公开(公告)日：2016-12-08

申请号：PCT/EP2016/055388

申请日：2016-03-14

Applicant: ASML NETHERLANDS B.V.

Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  DEN BOEF, Arie, Jeffrey ,  POLO, Alessandro ,  TINNEMANS, Patricius, Aloysius, Jacobus ,  SCHELLEKENS, Adrianus, Johannes, Hendrikus ,  YEGANEGI DASTGERDI, Elahe ,  COENE, Willem, Marie, Julia, Marcel ,  BOGAART, Erik, Willem ,  HUISMAN, Simon, Reinald

IPC: G03F9/00

CPC classification number: G03F9/7088 ,  G03F7/70141

Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.

Abstract translation: 提供了一种用于确定对准标记的位置的对准系统，方法和光刻设备，所述对准系统包括被配置为产生相对于彼此旋转大约180度的对准标记的两个重叠图像的第一系统，以及 第二系统，被配置为根据两个重叠图像的强度的空间分布来确定对准标记的位置。

公开(公告)号：WO2015062854A1

公开(公告)日：2015-05-07

申请号：PCT/EP2014/071910

申请日：2014-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  HUNSCHE, Stefan ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria

IPC: G03F7/20

CPC classification number: G03F7/70683 ,  G03F7/213 ,  G03F7/22 ,  G03F7/70466 ,  G03F7/70616 ,  G03F7/70633

Abstract: Disclosed is an inspection apparatus for use in lithography. It comprises a support for a substrate carrying a plurality of metrology targets; an optical system for illuminating the targets under predetermined illumination conditions and for detecting predetermined portions of radiation diffracted by the targets under the illumination conditions; a processor arranged to calculate from said detected portions of diffracted radiation a measurement of asymmetry for a specific target; and a controller for causing the optical system and processor to measure asymmetry in at least two of said targets which have different known components of positional offset between structures and smaller sub-structures within a layer on the substrate and calculate from the results of said asymmetry measurements a measurement of a performance parameter of the lithographic process for structures of said smaller size. Also disclosed are substrates provided with a plurality of novel metrology targets formed by a lithographic process.

Abstract translation: 公开了一种用于光刻的检查装置。 它包括用于承载多个计量目标的基板的支撑件; 光学系统，用于在预定的照明条件下照射所述目标，并用于在所述照明条件下检测由所述目标衍射的辐射的预定部分; 处理器，被布置成从所述检测到的衍射辐射部分计算特定目标的不对称度; 以及控制器，用于使所述光学系统和处理器测量所述目标中的至少两个中的不对称性，所述对象在所述基底上的层内的结构之间的位置偏移和较小子结构之间具有不同的已知分量，并且根据所述不对称测量的结果 用于所述较小尺寸结构的光刻工艺的性能参数的测量。 还公开了提供有通过光刻工艺形成的多个新颖度量目标的基板。

公开(公告)号：WO2014053334A1

公开(公告)日：2014-04-10

申请号：PCT/EP2013/069540

申请日：2013-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： DEN BOEF, Arie ,  KREUZER, Justin ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  NIJMEIJER, Gerrit, Johannes ,  SWINDAL, J. Christian ,  TINNEMANS, Patricius Aloysius Jacobus ,  VAN HAREN, Richard

IPC: G03F9/00

CPC classification number: G01B11/002 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7088 ,  H01L22/12

Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.

Abstract translation: 一种用于测量标记位置的装置，该装置包括使用由照明装置提供的辐射将辐射引导到标记上的物镜; 接收由标记衍射并被镜面反射的辐射的光学装置，其中所述光学装置被配置为提供第一图像和第二图像，所述第一图像通过相干地添加镜面反射辐射和正衍射级辐射而形成，并且所述第二图像 通过相干地加入镜面反射辐射和负衍射级辐射形成; 以及检测装置，用于检测第一和第二图像的辐射强度的变化，并计算标记在测量方向上的位置。

公开(公告)号：WO2014026819A2

公开(公告)日：2014-02-20

申请号：PCT/EP2013/065069

申请日：2013-07-17

Applicant: ASML NETHERLANDS B.V.

Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  BOGAART, Erik, Willem ,  TINNEMANS, Patricius Aloysius Jacobus ,  DEN BOEF, Arie, Jeffrey

IPC: G03F9/00

CPC classification number: G01B11/14 ,  G01B9/02 ,  G01B11/27 ,  G03F7/70058 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7069 ,  G03F9/7088

Abstract: A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of an alignment target comprising a periodic structure. An illumination optical system for focusing radiation into a spot on said structure. An asymmetry detection optical system receives a share of positive and negative orders of radiation diffracted by the periodic structure, and forms first and second images of said spot on first and second detectors respectively, wherein said negative order radiation is used to form the first image and said positive order radiation is used to form the second image. A processor for processing together signals from said first and second detectors representing intensities of said positive and negative orders to produce a measurement of asymmetry in the periodic structure. The asymmetry measurement can be used to improve accuracy of the position read by the alignment sensor.

Abstract translation: 光刻设备包括对准传感器，其包括用于读取包括周期性结构的对准目标位置的自参考干涉仪。 一种照明光学系统，用于将辐射聚焦到所述结构上的光斑中。 不对称检测光学系统接收通过周期性结构衍射的辐射的正数和负数的共享，并分别在第一和第二检测器上形成所述光斑的第一和第二图像，其中所述负序辐射用于形成第一图像， 所述正阶辐射用于形成第二图像。 用于处理来自所述第一和第二检测器的信号的处理器，其表示所述正序和负序的强度，以产生周期性结构中的不对称性的测量。 可以使用不对称测量来提高由对准传感器读取的位置的精度。