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    Light patterning device using tilting mirror in superpixel form
    31.
    发明专利
    Light patterning device using tilting mirror in superpixel form 有权
    使用倾斜反射镜在超级形式中的光图案设备

    公开(公告)号：JP2006309243A

    公开(公告)日：2006-11-09

    申请号：JP2006123340

    申请日：2006-04-27

    Applicant: Asml Holdings Nv ,  Asml Netherlands Bv ,  エイエスエムエル ホールディング ナムローゼ フエンノートシャップ ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BABA-ALI NABILA ,  BLEEKER ARNO JAN ,  TROOST KARS ZEGER

    IPC: G02B26/08 ,  B81B3/00 ,  B81B7/04 ,  G03F7/20 ,  H01L21/027 ,  H04N1/113

    CPC classification number: G03F7/70291 ,  G02B26/0833 ,  G03F7/70283 ,  G03F7/70308 ,  G09G3/346 ,  H04N5/7458

    Abstract: PROBLEM TO BE SOLVED: To provide an optical patterning device and its method that improves luminance and phase modulation characteristics of an individually controllable element array. SOLUTION: A light patterning system comprises an illumination system that supplies a beam of radiation having a certain wavelength λ. An array of reflective pixels patterns the beam, wherein the array includes pixels having at least a first tilting mirror that is logically coupled to a second tilting mirror. In an embodiment, the first and second tilting mirrors are (i) substantially adjacent to each other, and (ii) offset in height from each other by a first mirror displacement. A projection system is included that projects the patterned beam onto a target. In alternate embodiment, the array of reflective pixels includes pixels having first through fourth tilting mirrors that are logically coupled to each other. The first through fourth tilting mirrors are (i) respectively offset in height from a reference plane by first through fourth mirror displacements, and (ii) are respectively arranged clockwise in a substantially square pattern. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种改善单独可控元件阵列的亮度和相位调制特性的光学图案形成装置及其方法。 解决方案：光图案化系统包括提供具有一定波长λ的辐射束的照明系统。 反射像素阵列对光束进行图案化，其中阵列包括至少具有逻辑耦合到第二倾斜镜的第一倾斜镜的像素。 在一个实施例中，第一和第二倾斜镜是（i）基本上彼此相邻，以及（ii）通过第一反射镜位移使高度彼此偏移。 包括将图案化的光束投影到目标上的投影系统。 在替代实施例中，反射像素阵列包括具有彼此逻辑耦合的第一至第四倾斜镜的像素。 第一至第四倾斜镜（i）分别通过第一到第四镜面位移而偏离参考平面，并且（ii）分别以基本上正方形的图案顺时针地布置。 版权所有（C）2007，JPO＆INPIT

    Lithography apparatus and method of manufacturing device
    33.
    发明专利
    Lithography apparatus and method of manufacturing device 有权
    平面设备及其制造方法

    公开(公告)号：JP2006135312A

    公开(公告)日：2006-05-25

    申请号：JP2005301440

    申请日：2005-10-17

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： TROOST KARS ZEGER ,  BLEEKER ARNO JAN

    IPC: H01L21/027 ,  G02B26/08 ,  G02B26/10 ,  G03F7/20

    CPC classification number: G03F7/70516 ,  G03F7/70291 ,  G03F7/70425

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus constituted high in reliability of accuracy and a quality of generating image which can reduce pattern inspection time after exposure, and/or re-working amount. SOLUTION: In the lithography apparatus using an array of element possible to be controlled independently, the quality of the generating image is inspected by converting a fraction (portion) of strength of radiation beam patternized by the array of the element, into an image sensor. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种高精度可靠性和产生图像质量的光刻设备，其可以减少曝光后的图案检查时间和/或再次加工量。 解决方案：在使用可独立控制的元件阵列的光刻设备中，通过将由元件的阵列图案化的辐射束的强度的一部分（部分）转换为 图像传感器。 版权所有（C）2006，JPO＆NCIPI

    Lithography apparatus and manufacturing method of device
    34.
    发明专利
    Lithography apparatus and manufacturing method of device 审中-公开
    设备的平面设备和制造方法

    公开(公告)号：JP2006054451A

    公开(公告)日：2006-02-23

    申请号：JP2005214086

    申请日：2005-07-25

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： BLEEKER ARNO JAN ,  TEL WIM TJIBBO

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70525 ,  G03F7/70291

    Abstract: PROBLEM TO BE SOLVED: To provide apparatus and a method of lithography used for exposing a pattern on a substrate, the pattern having improved uniformity of a critical dimension.
    SOLUTION: The lithography apparatus forms a pattern of radiation beams using an array of elements which are independently controllable. Pattern data provided to the array of independently controllable elements are adjusted to correct change in processing. Consequently, uniformity of a critical dimension of a substrate on which the pattern is formed is improved by using the apparatus.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：为了提供用于将衬底上的图案曝光的设备和方法，该图案具有改善的临界尺寸的均匀性。 解决方案：光刻设备使用可独立控制的元件阵列形成辐射束的图案。 调整提供给独立可控元件阵列的图案数据，以纠正处理中的变化。 因此，通过使用该装置，提高了其上形成图案的基板的临界尺寸的均匀性。 版权所有（C）2006，JPO＆NCIPI

    Lithographic device and method of manufacturing device
    36.
    发明专利
    Lithographic device and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2005012226A

    公开(公告)日：2005-01-13

    申请号：JP2004180513

    申请日：2004-06-18

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： BLEEKER ARNO JAN

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70066 ,  G03F7/70291 ,  G03F7/70425

    Abstract: PROBLEM TO BE SOLVED: To obtain a lithographic device capable of easily providing data to individually controllable array-like elements, regardless of the size change of repeating unit of patterns exposed on a substrate.
    SOLUTION: The proportion of programmable patternization means used for the patternization of the substrate is restricted so as to allow the size of the repeating pattern, exposed to the substrate to be an integral number of times the size of the pattern exposed on the substrate by patternizing beams.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：为了获得能够容易地向独立可控的阵列状元件提供数据的光刻设备，而不管暴露在基板上的图案的重复单元的尺寸变化。 解决方案：用于衬底图案化的可编程图案化装置的比例受到限制，以便允许暴露于衬底的重复图案的尺寸是暴露在衬底上的图案的尺寸的整数倍 基板通过图案化梁。 版权所有（C）2005，JPO＆NCIPI

    IMAGING APPARATUS
    38.
    发明专利
    IMAGING APPARATUS 审中-公开

    公开(公告)号：JP2003100626A

    公开(公告)日：2003-04-04

    申请号：JP2002245963

    申请日：2002-07-23

    Applicant: ASML NETHERLANDS BV

    Inventor： BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  HINTERSTEINER JASON DOUGLAS ,  KRUIZINGA BORGERT ,  MCCARTHY MATTHEW EUGENE ,  OSKOTSKY MARK ,  RYZHIKOV LEV ,  SAKIN LEV ,  SMIRNOV STANISLAV ,  SNIJDERS BART ,  VAN DER MAST KAREL DIEDERICK ,  VISSER HUIBERT

    IPC: G03F7/20 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide an imaging apparatus capable of using for the manufacture of an integrated circuit and other (semiconductor) devices as a commercially charming alternative plan instead of using a conventional lithographic projector (a method using a mask). SOLUTION: The imaging apparatus comprises a radiant ray system for supplying a projection beam of radiant ray, a supporting structure for supporting a pattern forming means effecting a pattern formation in accordance with the desired pattern, a substrate table for retaining a substrate, and a projection system for projecting a beam formed through the pattern formation on the target part of the substrate. The pattern formation means comprises a plurality of individual pattern formation subelements to produce subbeams formed through pattern formation, by using respective subelements. The imaging apparatus comprises a combining means for combining a plurality of subbeams formed through the pattern formation, to a single image formed through the pattern formation.

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