公开(公告)号：MY150857A

公开(公告)日：2014-03-14

申请号：MYPI20064607

申请日：2006-11-30

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  LARIOS JOHN M DE ,  MIKHAYLINCHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C

IPC: C11D11/00

Abstract: A METHOD IS PROVIDED FOR REMOVING CONTAMINATION FROM A SUBSTRATE. THE METHOD INCLUDES APPLYING A CLEANING SOLUTION HAVING A DISPERSED PHASE, A CONTINUOUS PHASE AND PARTICLES DISPERSED WITHIN THE CONTINUOUS PHASE TO A SURFACE OF THE SUBSTRATE. THE METHOD INCLUDES FORCING ONE OF THE PARTICLES DISPERSED WITHIN THE CONTINUOUS PHASE PROXIMATE TO ONE OF THE SURFACE CONTAMINANTS. THE FORCING IS SUFFICIENT TO OVERCOME ANY REPULSIVE FORCES BETWEEN THE PARTICLES AND THE SURFACE CONTAMINANTS SO THAT THE ONE OF THE PARTICLES AND THE ONE OF THE SURFACE CONTAMINANTS ARE ENGAGED. THE METHOD ALSO INCLUDES REMOVING THE ENGAGED PARTICLE AND SURFACE CONTAMINANT FROM THE SURFACE OF THE SUBSTRATE. A PROCESS TO MANUFACTURE THE CLEANING MATERIAL IS ALSO PROVIDED.

公开(公告)号：DE602005021010D1

公开(公告)日：2010-06-17

申请号：DE602005021010

申请日：2005-03-29

Applicant: LAM RES CORP

Inventor： DE LARIOS JOHN M ,  KOROLIK MIKHAIL ,  RAVKIN MIKE ,  FARBER JEFFREY

IPC: H01L21/00 ,  H01L21/304 ,  B08B3/04

公开(公告)号：MY141193A

公开(公告)日：2010-03-31

申请号：MYPI20064606

申请日：2006-11-30

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  LARIOS JOHN M DE ,  MIKHAYLINCHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C

IPC: B08B3/02

Abstract: A CLEANING COMPOUND IS PROVIDED. THE CLEANING COMPOUND INCLUDES ABOUT 0.1 WEIGHT PERCENT TO ABOUT 10 WEIGHT PERCENT OF A FATTY ACID DISPERSED IN WATER. THE CLEANING COMPOUND INCLUDES AN AMOUNT OF A BASE SUFFICIENT TO BRING A PH OF THE FATTY ACID WATER SOLUTION TO ABOUT A LEVEL WHERE ABOVE ABOUT 50% OF THE DISPERSED FATTY ACID IS IONIZED. A METHOD FOR CLEANING A SUBSTRATE, A SYSTEM FOR CLEANING A SUBSTRATE, AND A CLEANING SOLUTION PREPARED BY A PROCESS ARE ALSO PROVIDED.

公开(公告)号：MY152543A

公开(公告)日：2014-10-31

申请号：MYPI20064619

申请日：2006-12-04

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  LARIOS JOHN M DE ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C ,  THOMAS CLINT ,  PARKS JOHN

IPC: B08B3/00

Abstract: METHODS FOR CLEANING USING A TRI-STATE BODY (110) ARE DISCLOSED. A SUBSTRATE (112) HAVING A PARTICLE (102) DEPOSITED THEREON IS PROVIDED. A TRI-STATE BODY THAT HAS A SOLID PORTION (108), LIQUID PORTION (106) AND A GAS PORTION (104) IS GENERATED. A FORCE IS APPLIED OVER THE TRI-STATE BODY TO PROMULGATE AN INTERACTION BETWEEN THE SOLID PORTION AND THE PARTICLE. THE TRI-STATE BODY IS REMOVED ALONG WITH THE PARTICLE FROM THE SURFACE OF THE SUBSTRATE. THE INTERACTION BETWEEN THE SOLID PORTION AND THE PARTICLE CAUSING THE PARTICLE TO BE REMOVED ALONG WITH THE TRI-STATE BODY.

公开(公告)号：SG176462A1

公开(公告)日：2011-12-29

申请号：SG2011081833

申请日：2008-02-22

Applicant: LAM RES CORP

Inventor： RAVKIN MICHAEL ,  DE LARIOS JOHN M ,  REDEKER FRED C ,  KOROLIK MIKHAIL ,  FREER ERIK M

Abstract: A proximity head including a head surface. The head surface including a first flat region and a plurality of first conduits. Each one of the plurality of first conduits being defined by corresponding one of a plurality of first discrete holes. The plurality of first discrete holes residing in the head surface and extending through the first flat region. The head surface also including a second flat region and a plurality of second conduits. The plurality of second conduits being defined by a corresponding plurality of second discrete holes that reside in the head surface and extend through the second flat region. The head surface also including a third flat region disposed between and adjacent to the first flat region and the second flat region and a plurality of third conduits. The plurality of third conduits being defined by a corresponding plurality of third discrete holes that reside in the head surface and extend through the third flat region. The third conduits being formed at a first angle relative to the third flat region. The first angle being between 30 and 60 degrees. A system and method for processing a substrate with a proximity head is also described.(Fig. 2A)

公开(公告)号：MY142184A

公开(公告)日：2010-10-15

申请号：MYPI20062783

申请日：2006-06-13

Applicant: LAM RES CORP

Inventor： LARIOS JOHN M DE ,  RAVKIN MIKE ,  PARKS JOHN ,  KOROLIK MIKHAIL ,  REDEKER FRED C

IPC: B65G51/16

Abstract: A METHOD FOR TRANSPORTING A SUBSTRATE IS PROVIDED. IN THIS METHOD, A NON-NEWTONIAN FLUID (210) IS PROVIDED AND THE SUBSTRATE (212) IS SUSPENDED IN THE NON-NEWTONIAN FLUID. THE NON-NEWTONIAN FLUID IS CAPABLE OF SUPPORTING THE SUBSTRATE. THEREAFTER, A SUPPLY FORCE IS APPLIED ON THE NON-NEWTONIAN FLUID TO CAUSE THE NON-NEWTONIAN FLUID TO FLOW, WHEREBY THE FLOW IS CAPABLE OF MOVING THE SUBSTRATE ALONG A DIRECTION OF THE FLOW. APPARATUSES AND SYSTEMS FOR TRANSPORTING THE SUBSTRATE USING THE NON-NEWTONIAN FLUID ALSO ARE DESCRIBED.

公开(公告)号：DE602004026725D1

公开(公告)日：2010-06-02

申请号：DE602004026725

申请日：2004-06-23

Applicant: LAM RES CORP

Inventor： HEMKER DAVID ,  REDEKER FRED C ,  BOYD JOHN ,  DE LARIOS JOHN M ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL

IPC: G03F7/20

Abstract: A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.

公开(公告)号：AT465435T

公开(公告)日：2010-05-15

申请号：AT04756062

申请日：2004-06-23

Applicant: LAM RES CORP

Inventor： HEMKER DAVID ,  REDEKER FRED ,  BOYD JOHN ,  DE LARIOS JOHN ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL

IPC: G03F7/20

Abstract: A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.

公开(公告)号：MY140370A

公开(公告)日：2009-12-31

申请号：MYPI20045251

申请日：2004-12-20

Applicant: LAM RES CORP

Inventor： LARIOS JOHN M DE ,  RAVKIN MIKE ,  FARBER JEFFREY ,  KOROLIK MIKHAIL ,  REDEKER FRITZ ,  OWCZARZ ALEKSANDER

IPC: B08B3/00 ,  H01L21/00

Abstract: An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The semiconductor wafer is supported either on a stiff support (or a layer of foam) and foam is provided on the opposite surface of the semiconductor wafer while the semiconductor wafer is supported. The foam contacting the semiconductor wafer is pressurized using a form to produce a jammed foam. Relative movement between the form and the semiconductor wafer. such as oscillation parallel and/or perpendicular to the top surface of the semiconductor wafer. is then induced while the jammed foam is in contact with the semiconductor wafer to remove the undesired contaminants and/or otherwise chemically treat the surface of the semiconductor wafer using the foam.

公开(公告)号：MY139627A

公开(公告)日：2009-10-30

申请号：MYPI20051481

申请日：2005-04-01

Applicant: LAM RES CORP

Inventor： RAVKIN MICHAEL ,  SMITH MICHAEL G R ,  LARIOS JOHN M DE ,  REDEKER FRITZ ,  KOROLIK MIKHAIL ,  DIPIETRO CHRISTIAN

IPC: B08B3/00 ,  B08B3/04 ,  C25D5/08 ,  C25D5/22 ,  C25D7/12 ,  C25D17/00 ,  H01L21/00 ,  H01L21/304 ,  H01L21/306

Abstract: AMONG THE MANY EMBODIMENT, IN ONE EMBODIMENT, A METHOD FOR PROCESSING A SUBSTRATE (108) IS DISCLOSED WHICH INCLUDES GENERATING A FLUID LAYER ON A SURFACE OF THE SUBSTRATE (108), THE FLUID LAYER DEFINING A FLUID MENISCUS (116). THE GENERATING INCLUDES MOVING A HEAD (106) IN PROXIMITY TO THE SURFACE, APPLYING A FLUID FROM THE HEAD (106) TO THE SURFACE WHILE THE HEAD (106) IS IN PROXIMITY TO THE SURFACE OF THE SUBSTRATE (108) TO DEFINE THE FLUID LAYER, AND REMOVING THE FLUID FROM THE SURFACE THROUGH THE PROXIMITY HEAD BY A VACUUM (312). THE FLUID TRAVELS ALONG THE FLUID LAYER BETWEEN THE HEAD (106) AND THE SUBSTRATE (108) AT A VELOCITY THAT INCREASES AS THE HEAD (106) IS IN CLOSER PROXIMITY TO THE SURFACE.