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    DEVICE AND METHOD FOR OPTIMIZING DIFFUSION SECTION OF ELECTRON BEAM
    34.
    发明申请
    DEVICE AND METHOD FOR OPTIMIZING DIFFUSION SECTION OF ELECTRON BEAM 有权
    用于优化电子束扩散部分的装置和方法

    公开(公告)号：US20160189914A1

    公开(公告)日：2016-06-30

    申请号：US14895708

    申请日：2014-10-17

    Applicant: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY

    Inventor： Jiang HUANG ,  Mingwu FAN ,  Tiaoqin YU ,  Lige ZHANG ,  Chen ZUO ,  Jun YANG ,  Yongqian XIONG ,  Kaifeng LIU ,  Gerald F. WU ,  Lei CAO

    IPC: H01J37/143

    CPC classification number: H01J37/143 ,  G21K1/093 ,  G21K5/04 ,  H01J3/12 ,  H01J33/00 ,  H01J37/3178 ,  H01J2237/0835 ,  H01J2237/1405 ,  H01J2237/152

    Abstract: Provided is a device for optimizing a diffusion section of an electron beam, comprising two groups of permanent magnets, a magnetic field formed by the four magnetic poles extending the electron beam in a longitudinal direction, and compressing the electron beam in a transverse direction, so that the electron beam becomes an approximate ellipse; another magnetic field formed by the eight magnetic poles optimizing an edge of a dispersed electron-beam bunch into an approximate rectangle; by controlling the four longitudinal connection mechanisms so that the upper magnetic yoke and the lower magnetic yoke of the first group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate ellipse, and the upper magnetic yoke and the lower magnetic yoke of the second group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate rectangle, and the process of longitudinal compression is repeated until a longitudinal size of the electron-beam bunch is reduced to 80 mm. The invention is capable of reasonably compressing a longitudinal size of an electron-beam bunch after diffusion to approximately 80 mm, which ensures optimum irradiation uniformity and efficiency, and enables the longitudinal size to be within the range of a conventional titanium window,

    Abstract translation: 本发明提供一种用于优化电子束的扩散部分的装置，包括两组永久磁体，由四个磁极形成的磁场，该四个磁极沿纵向方向延伸电子束，并且沿横向压缩电子束，因此 电子束变成近似椭圆; 由八个磁极形成的另一个磁场将分散的电子束束的边缘优化成近似矩形; 通过控制四个纵向连接机构，使得第一组永磁体的上磁轭和下磁轭同步向其中心移动，从而纵向压缩近似椭圆形的电子束，并且上磁轭 并且第二组永磁体的下磁轭朝向其中心同步移动，从而纵向压缩大致矩形的电子束，并且重复纵向压缩的过程，直到电子束束的纵向尺寸 减至80毫米。 本发明能够将扩散后的电子束束的纵向尺寸合理地压缩至大约80mm，这确保了最佳的照射均匀性和效率，并且使纵向尺寸在常规的钛合金窗口的范围内，

    Charged particle lithography system with a long shape illumination beam
    35.
    发明授权
    Charged particle lithography system with a long shape illumination beam 有权
    具有长形照明光束的带电粒子光刻系统

    公开(公告)号：US09202662B2

    公开(公告)日：2015-12-01

    申请号：US13756178

    申请日：2013-01-31

    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

    Inventor： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

    IPC: G21K5/04 ,  H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/30 ,  H01J37/317

    CPC classification number: H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

    Abstract: A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the mirror array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

    Abstract translation: 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接镜阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。

    Spherical Aberration Corrector, Method of Spherical Aberration Correction, and Charged Particle Beam Instrument
    36.
    发明申请
    Spherical Aberration Corrector, Method of Spherical Aberration Correction, and Charged Particle Beam Instrument 有权
    球面畸变校正器，球面畸变校正方法和带电粒子束仪器

    公开(公告)号：US20150029593A1

    公开(公告)日：2015-01-29

    申请号：US14338542

    申请日：2014-07-23

    Applicant: JEOL Ltd.

    Inventor： Hidetaka Sawada ,  Yu Jimbo

    IPC: G02B27/00

    CPC classification number: G02B27/0037 ,  G01N23/20 ,  G02B27/42 ,  G02B27/4205 ,  G21K1/08 ,  H01J3/04 ,  H01J3/12 ,  H01J3/26 ,  H01J37/05 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534

    Abstract: A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector (100) is for use with a charged particle beam instrument (1) for obtaining the image and the diffraction pattern and has a hexapole field generating portion (110) for producing plural stages of hexapole fields, an octopole field superimposing portion (120) for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion (130) for deflecting a charged particle beam.

    Abstract translation: 提供了一种球面像差校正器，其允许校正图像和衍射图案中的至少一个的圆度的偏差和单独进行的轴上像差校正。 球面像差校正器（100）用于带电粒子束仪器（1），用于获得图像和衍射图案，并具有用于产生多级六极场的六极场产生部分（110），八极场叠加部分 （120），用于将至少一个六极场中的至少一个叠加八极杆，以校正图像和衍射图案中的至少一个的圆度的偏差，以及用于偏转带电粒子束的偏转部分（130）。

    Charged particle optical system, drawing apparatus, and method of manufacturing article
    37.
    发明授权
    Charged particle optical system, drawing apparatus, and method of manufacturing article 失效
    带电粒子光学系统，拉丝装置和制造方法

    公开(公告)号：US08716672B2

    公开(公告)日：2014-05-06

    申请号：US13835154

    申请日：2013-03-15

    Applicant: Canon Kabushiki Kaisha

    Inventor： Kentaro Sano ,  Masato Muraki ,  Akira Miyake ,  Yoshikiyo Yui

    IPC: H01J3/14 ,  H01J3/12 ,  H01J1/46

    CPC classification number: H01J3/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/121

    Abstract: The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface.

    Abstract translation: 本发明提供了一种发射带电粒子束的带电粒子光学系统，该系统包括静电透镜，以及沿着静电透镜的光轴与静电透镜相对的栅格电极，并配置为在合成中形成静电场 其中所述栅极与所述静电透镜相对的所述电极表面与所述静电透镜在所述光轴方向上具有距所述静电透镜的距离随着所述静电透镜的位置而变化的距离 电极表面。

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