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公开(公告)号：JP2007013150A
公开(公告)日：2007-01-18
申请号：JP2006176023
申请日：2006-06-27
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： GRAAF ROELOF FREDERICK DE , LAMBERTUS DONDERS SJOERD NICOL , HOOGENDAM CHRISTIAAN A , JANSEN HANS , LEENDERS MARTINUS HENDRIKUS AN , LIEBREGTS PAULUS MARTINUS MARI , MERTENS JEROEN JOHANNES SOPHIA , STREEFKERK BOB , VAN DER TOORN JAN-GERARD C , RIEPEN MICHEL
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus preventing the existence of bubbles in a liquid through which an emitted projection beam is passed, or taking countermeasures to reduce them.
SOLUTION: This is performed, for example, by ensuring that a gap between a substrate and a substrate table is filled with an immersion liquid, or by inducing a local flow from an optical axis toward a radially outward side in the vicinity of the edge of the substrate.
COPYRIGHT: (C)2007,JPO&INPITAbstract translation: 要解决的问题：提供一种光刻投影装置，其防止在发射的投射光束通过的液体中存在气泡，或采取对策来减少它们。 解决方案：例如，这通过确保衬底和衬底台之间的间隙被浸没液体填充，或者通过引起局部从光轴朝向径向向外的侧面 衬底的边缘。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2006128682A
公开(公告)日：2006-05-18
申请号：JP2005310028
申请日：2005-10-25
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： OTTENS JOOST JEROEN , MERTENS JEROEN JOHANNES SOPHIA , DE JONG FREDERIK EDUARD , GOORMAN KOEN , MENCHTCHIKOV BORIS , VAN GOMPEL EDWIN AUGUSTINUS MA
IPC: H01L21/027 , G03F7/20
CPC classification number: H01L21/67109 , G03F7/70341 , G03F7/707 , G03F7/70783 , G03F7/70875
Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment and a device manufacturing method.
SOLUTION: Lithography equipment has a substrate support formed such that it supports a substrate, and a projection system formed such that it projects a patterned radiation beam to a target part of the substrate. The substrate support is operated such that the substrate is moved along a specified path of the target part as the next target of the substrate. The substrate support has a duct fabric for thermally stabilizing the substrate. This duct fabric supplies a thermal stabilization medium to the substrate through the duct, and removes the thermal stabilization medium virtually using the duct from a portion of the substrate support that supports the target part via the substrate support part that supports the target part preceding the substrate, thereby maintaining the target part as a next target thermally stably.
COPYRIGHT: (C)2006,JPO&NCIPIAbstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：平版印刷设备具有形成为支撑基板的基板支撑件和形成为使得其将图案化的辐射束投影到基板的目标部分的投影系统。 操作基板支撑件，使得基板沿着目标部件的指定路径移动，作为基板的下一个目标。 衬底支撑件具有用于热稳定衬底的管道织物。 这种管道织物通过管道向基底提供热稳定介质，并且通过经由基板支撑部分支撑目标部分的衬底支撑部分，基本上使用来自支撑目标部分的基板支撑件的管道的热稳定介质， 从而热稳定地将目标部分保持为下一个目标。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2006121078A
公开(公告)日：2006-05-11
申请号：JP2005301607
申请日：2005-10-17
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： MERTENS JEROEN JOHANNES SOPHIA , DONDERS SJOERD NICOLAAS L , DE GRAAF ROELOF FREDERIK , HOOGENDAM CHRISTIAAN ALEXANDER , VAN DER NET ANTONIUS J , TEUNISSEN FRANCISCUS JOHANNES , TINNEMANS PATRICIUS ALOYSIUS J , VERHAGEN MARTINUS CORNELIS MAR , VERSPAY JACOBUS JOHANNUS LEONA , VAN GOMPEL EDWIN AUGUSTINUS MA
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide an upgraded system as well as a method that discharges a mixture of liquid and gas from a component of lithography equipment. SOLUTION: This is lithography equipment including a liquid supply system for immersing, in liquid, a space between a projection system and a substrate, an outlet for eliminating a mixture of liquid and and gas that passes a gap between a liquid sealing structure of the liquid supply system and the substrate, and a discharge system for taking out the mixture through the outlet, wherein the discharge system includes a separator tank for separating the liquid from the gas in the mixture, and a separator tank pressure controller connected to a non-liquid immersion area of the separator tank and maintaining stable pressure in the non-liquid immersion area. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 要解决的问题：提供升级系统以及从光刻设备的部件排出液体和气体的混合物的方法。 解决方案：这是一种光刻设备，其包括用于在液体中浸入投影系统和基板之间的空间的液体供应系统，用于消除液体和气体混合物的出口，该出口通过液体密封结构 的液体供给系统和基板，以及用于通过出口取出混合物的排出系统，其中排出系统包括用于将液体与混合物中的气体分离的分离罐，以及分离罐压力控制器，其连接到 分离罐的非液浸区域，并且在非液浸区域保持稳定的压力。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2006054468A
公开(公告)日：2006-02-23
申请号：JP2005233909
申请日：2005-08-12
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： CADEE THEODORUS PETRUS MARIA , JACOBS JOHANNES HENRICUS WILHE , KATE NICOLAAS TEN , LOOPSTRA ERIK ROELOF , VAN MEER ASCHWIN LODEWIJK HEND , MERTENS JEROEN JOHANNES SOPHIA , DE MOL CHRISTIANUS GERARDUS MA , MUITJENS MARCEL JOHANNUS ELISA , VAN DER NET ANTONIUS J , OTTENS JOOST JEROEN , QUAEDACKERS JOHANNES ANNA , REUHMAN-HUISKEN MARIA ELISABET , STAVENGA MARCO KOERT , TINNEMANS PATRICIUS ALOYSIUS J , VERHAGEN MARTINUS CORNELIS MAR , VERSPAIJ JACOBUS JOHANNUS LEON , DE JONG FREDERIK EDUARD , GOORMAN KOEN , MENCHTCHIKOV BORIS , BOOM HERMAN , NIHTIANOV STOYAN , MOERMAN RICHARD , SMEETS MARTIN FRANS PIERRE , SCHOONDERMARK BART LEONARD PET , JANSSEN FRANCISCUS JOHANNES JO , RIEPEN MICHEL
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing lithographic errors caused by immersion liquid. SOLUTION: A lithography apparatus comprises an illumination system so constituted as to control a radiation beam, a support so constituted as to support a pattern forming device which imparts patterns on a crosssection of the radiation beam to form a patternized radiation beam, a substrate table so constituted as to hold a substrate, a projection system so constituted as to project the patternized radiation beam on the target of the substrate, a liquid supply system so constituted as to fill at least part of a space between a final element of the projection system and the substrate with the liquid, a sealing member so disposed as to substantially enclose the liquid inside the space between the final element of the projection system and the substrate, and an element for controlling and/or compensate evaporation of the immersion liquid from the substrate. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 要解决的问题：提供一种减少浸没液引起的平版印刷误差的系统。 解决方案：光刻设备包括照明系统，其被构造成控制辐射束，支撑件被构造成支撑图案形成装置，其在辐射束的横截面上施加图案以形成图案化的辐射束， 衬底台，其被构造成保持衬底;投影系统，其被构造成将图案化的辐射束投射到衬底的靶上;液体供应系统，其被构造成填充所述衬底的最终元件之间的至少一部分空间; 投影系统和具有液体的基板，密封构件，其被设置为基本上将液体包围在投影系统的最终元件和基板之间的空间内，以及用于控制和/或补偿浸没液体的蒸发的元件 底物。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2005340815A
公开(公告)日：2005-12-08
申请号：JP2005147548
申请日：2005-05-20
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： STREEFKERK BOB , COX HENRIKUS HERMAN MARIE , CHRISTIAAN ALEXANDER HOOGENDAM , MERTENS JEROEN JOHANNES SOPHIA , ZAAL KOEN JACOBUS JOHANNES MAR , CUPERUS MINNE
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70341 , G03F7/70641 , G03F7/70783
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method of manufacturing a device configured to introduce an immersion liquid and a liquid supply system associated therewith into the lithographic apparatus so as to solve the problem of causing degradation in the accuracy of focus at the substrate and in the precision with which other parameters critical to imaging are controlled.
SOLUTION: The immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
COPYRIGHT: (C)2006,JPO&NCIPIAbstract translation: 要解决的问题：提供一种光刻设备和一种制造器件的方法，该器件被配置为将与其相关联的浸没液体和液体供应系统引入到光刻设备中，以解决导致其精度降低的问题 在基板上的焦点和控制成像关键的其他参数的精度。 浸没式光刻设备包括液体供应系统构件，其配置为在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应 系统构件和衬底台。 版权所有（C）2006，JPO＆NCIPI
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Patent Agency Ranking
公开(公告)号：JP2005005707A
公开(公告)日：2005-01-06
申请号：JP2004169275
申请日：2004-06-08
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , BIJLAART ERIK THEODORUS MARIA , CHRISTIAAN ALEXANDER HOOGENDAM , VAN SANTEN HELMAR , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , MERTENS JEROEN JOHANNES SOPHIA
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The highlights of this invention are that the lithography apparatus is equipped with a radiation system Ex to provide the projection beams PB of radiation including a radioactive source LA, a primary object table (mask table) MT connected to a primary positioning means to correctly position a mask against IL and a member PL, a secondary object table (substrate table) WT connected to a secondary positioning means to correctly position a substrate against the member PL, and a projection system PL to form an image of the irradiated part of the mask MA on the target part of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：本发明的亮点在于，光刻设备配备有辐射系统Ex以提供包括放射源LA的辐射投影束PB，连接到主要定位的主要物体台（掩模台）MT 用于将掩模正确地定位在IL和构件PL上的装置，连接到二次定位装置以将衬底正确地定位在构件PL上的第二对象台（衬底台）WT，以及用于形成照射的图像的投影系统PL 在基板W的目标部分上的掩模MA的一部分。版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：JP2004289127A
公开(公告)日：2004-10-14
申请号：JP2003417260
申请日：2003-11-11
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： LOF JOERI , BIJLAART ERIK THEODORUS MARIA , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , SCHAIK FRANK VAN , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
Abstract: PROBLEM TO BE SOLVED: To disclose a lithography projector in which a space between the final element of a projection system and a substrate is filled with liquid. SOLUTION: Hermetic edge sealing members 17 and 117 surround a substrate W on a substrate table WT or another object at least partially thus preventing the catastrophic loss of the liquid when the edge part of the substrate is imaged or illuminated. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract translation: 要解决的问题：公开一种其中投影系统的最终元件和基板之间的空间被液体填充的光刻投影仪。 解决方案：密封边缘密封构件17和117围绕基板台WT或另一物体上的基板W，至少部分地防止当基板的边缘部分成像或照明时液体的灾难性损失。 版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：NL1036709A1
公开(公告)日：2009-10-27
申请号：NL1036709
申请日：2009-03-13
Applicant: ASML NETHERLANDS BV
Inventor： WATSO ROBERT DOUGLAS , DOMMELEN YOURI JOHANNES LAURENTIUS MARIA VAN , JACOBS JOHANNES HENRICUS WILHELMUS , JANSEN HANS , LEENDERS MARTINUS HENDRIKUS ANTONIUS , MERTENS JEROEN JOHANNES SOPHIA , STEIJAERT PETER PAUL , JONG ANTHONIUS MARTINUS CORNELIS PETRUS DE , WINKEL JIMMY MATHEUS WILHELMUS , SENA JOAO PAULO DA PAZ , LEE MAURICE MARTINUS JOHANNES , LIER HENRICUS MARTINUS DOROTHE , TANASA GHEORGHE
IPC: G03F7/20
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公开(公告)号：DE60321842D1
公开(公告)日：2008-08-14
申请号：DE60321842
申请日：2003-01-30
Applicant: ASML NETHERLANDS BV
Inventor： MERTENS JEROEN JOHANNES SOPHIA
IPC: G03F7/20 , H01L21/027
Abstract: In a lithographic projection apparatus, ingress of contaminants to a component is prevented by providing a first flow of purge gas through the inside of a first compartment encapsulating the component and a second flow of purge gas to an external surface of the compartment.
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公开(公告)号：SG138618A1
公开(公告)日：2008-01-28
申请号：SG2007189939
申请日：2005-06-20
Applicant: ASML NETHERLANDS BV
Inventor： LOF JOERI , MULKENS JOHANNES CATHARINUS HU , MERTENS JEROEN JOHANNES SOPHIA , VAN DER NET ANTONIUS JOHANNES , VAN DER HAM RONALD , LALLEMANT NICOLAS , BECKERS MARCEL
IPC: G03F7/20
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