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    ELECTRON SOURCE
    41.
    发明公开
    ELECTRON SOURCE 有权
    电子源

    公开(公告)号：EP2148354A1

    公开(公告)日：2010-01-27

    申请号：EP08752646.3

    申请日：2008-05-13

    Applicant: Denki Kagaku Kogyo Kabushiki Kaisha

    Inventor： TERUI, Yoshinori ,  NONOGAKI, Ryozo

    IPC: H01J1/26 ,  H01J1/20 ,  H01J37/063

    CPC classification number: H01J37/063 ,  H01J1/20 ,  H01J1/26 ,  H01J37/073 ,  H01J37/075 ,  H01J2237/0216 ,  H01J2237/06316

    Abstract: Provided is an electron source which provides a stable electron beam even when vibration is applied from external to a device which uses the electron source. The electron source is provided with a needlelike chip (1) having an electron emitting section at one end; a cup-like component (6) bonded to the other end of the needlelike chip (1); and a filament (3) for heating the cup-like component.(6). The filament (3) is arranged in a gap inside the cup-like component (6), in a noncontact state to the cup-like component (6).

    Abstract translation: 本发明提供一种即使从外部向使用电子源的装置施加振动时也能够提供稳定的电子束的电子源。 电子源设有一端具有电子发射部分的针状芯片（1） 与针状片（1）的另一端结合的杯状部件（6）; 和用于加热杯形部件的丝（3）。 细丝（3）设置在杯状部件（6）内部的间隙中，与杯状部件（6）处于非接触状态。

    CHARGED PARTICLE BEAM EMITTING ASSEMBLY
    43.
    发明授权
    CHARGED PARTICLE BEAM EMITTING ASSEMBLY 有权
    DEVICE FOR放出带电POND RAY

    公开(公告)号：EP1018137B1

    公开(公告)日：2005-06-22

    申请号：EP98944099.5

    申请日：1998-09-24

    Applicant: THE WELDING INSTITUTE

    Inventor： SANDERSON, Allan

    IPC: H01J37/063 ,  H01J37/065 ,  H01J37/075 ,  H01J37/301

    CPC classification number: H01J37/075 ,  H01J37/063 ,  H01J37/065 ,  H01J37/301 ,  H01J2237/3104

    Abstract: A charged particle emitting assembly comprises an emitter member (5) for emitting charged particles of one polarity. A tubular shield electrode (6) circumferentially surrounds the emitter member and is held in use at the same polarity as the charged particles. A tubular accelerating electrode (7) is positioned substantially coaxially with the shield electrode (6) and is held in use at the opposite polarity to the shield electrode. The arrangement is such that charged particles from the emitter member (5) initially spread laterally outwardly and then are focused into a beam which passes through the tubular accelerating electrode (7).

    A PARTICLE BEAM GENERATOR
    44.
    发明公开
    A PARTICLE BEAM GENERATOR 审中-公开
    设备生产带电粒子

    公开(公告)号：EP1532649A2

    公开(公告)日：2005-05-25

    申请号：EP03760078.0

    申请日：2003-06-16

    Applicant: NFAB Limited

    Inventor： Eastham, Derek Anthony

    IPC: H01J37/26 ,  H01J37/317

    CPC classification number: H01J37/063 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/26 ,  H01J37/3174 ,  H01J2237/06375

    Abstract: The source of electrons is a nanotip in a vacuum as used in near field microscopy. The source of ions is a similar nanotip in vacuum supplied with liquid metal (gallium) as in a liquid-metal ion source. Electrons or ions from this nanometre-sized tip are extracted by centralising the tip over an aperture plate and applying a suitable voltage to the tip. The electrons (ions) pass through this plate and are accelerated up to several keV using a nanoscale/microscale accelerating column before being focussed using further microscale (or nanoscale) cylindrical lenses. The final element is an aberration corrected miniature (or sub-miniature) einzel lens which can focus the beam at several millimetres from the end of the instrument.

    Electron beam columns
    45.
    发明公开
    Electron beam columns 审中-公开
    Elektronenstrahlsäule

    公开(公告)号：EP1102303A2

    公开(公告)日：2001-05-23

    申请号：EP00310038.5

    申请日：2000-11-10

    Applicant: Etec Systems, Inc.

    Inventor： Veneklasen, Lee H.

    IPC: H01J37/06 ,  H01J3/02

    CPC classification number: H01J37/063 ,  H01J3/029

    Abstract: A tetrode (four electrode) gun (202) is described which allows the adjustment of both variable high brightness and illumination uniformity in the profile of the electron beam. This is achieved by providing an electrostatic focusing electrode (18) between the cathode (2) and the anode (8) within the electron gun. The focusing electrode is positively biased to a few keV and allows the image of the cathode to be focused at infinity. The addition of a focusing electrode enables both variable brightness and illumination uniformity by adjustment of the bias of a grid (4) which is mounted below the cathode to maintain constant emission, while adjusting the bias of the focusing electrode to obtain the optimal beam cross-sectional uniformity.

    Abstract translation: 描述了四极（四电极）枪（202），其允许调整电子束轮廓中的可变高亮度和照明均匀性两者。 这通过在电子枪内的阴极（2）和阳极（8）之间设置静电聚焦电极（18）来实现。 聚焦电极被正偏压到几keV，并允许阴极的图像被无限远地聚焦。 通过调整安装在阴极下方的栅极（4）的偏置来保持恒定的发射，同时调节聚焦电极的偏压以获得最佳的光束横截面，添加聚焦电极使得能够实现可变亮度和照明均匀性， 截面均匀性。

    Aperture imaging electron gun
    47.
    发明公开
    Aperture imaging electron gun 失效
    Elektronenkanone mit charakteristischer Blende zur Strahlerzeugung。

    公开(公告)号：EP0132657A1

    公开(公告)日：1985-02-13

    申请号：EP84107904.9

    申请日：1984-07-06

    Applicant: THE PERKIN-ELMER CORPORATION

    Inventor： Devore, William J. ,  Veneklasen, Lee ,  Howard, Glen E.

    IPC: H01J37/06

    CPC classification number: H01J37/063

    Abstract: Disclosed is an electron gun in which the beam shaping aperture, smaller than the source crossover, becomes the object forthe succeeding imaging system in an electron beam column of scanning electron microscopes, electron beam lithography machines and the like. The beam forming aperture is located in or near the plane of the anode so that the source crossover alone illuminates the beam forming aperture.

    Abstract translation: 公开了一种电子枪，其中小于源极交叉的光束成形孔成为扫描电子显微镜，电子束光刻机等的电子束列中的后续成像系统的目的。 光束形成孔位于阳极平面中或附近，使得源极交叉单独照射光束形成孔。

    電子槍,電子束曝光裝置以及曝光方法 ELECTRON GUN, ELECTRON BEAM EXPOSURE APPARATUS, AND EXPOSURE METHOD
    48.
    发明专利
    電子槍,電子束曝光裝置以及曝光方法 ELECTRON GUN, ELECTRON BEAM EXPOSURE APPARATUS, AND EXPOSURE METHOD 审中-公开
    电子枪,电子束曝光设备以及曝光方法 ELECTRON GUN, ELECTRON BEAM EXPOSURE APPARATUS, AND EXPOSURE METHOD

    公开(公告)号：TW200849306A

    公开(公告)日：2008-12-16

    申请号：TW097105718

    申请日：2008-02-19

    Applicant: 愛德萬測試股份有限公司 ADVANTEST CORPORATION

    Inventor： 安田洋 YASUDA, HIROSHI ,  原口岳士 HARAGUCHI, TAKESHI

    IPC: H01J ,  H01L

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/02 ,  H01J29/48 ,  H01J37/063 ,  H01J37/075 ,  H01J2237/06316

    Abstract: 一具有一發射電子的電子源之電子槍係包括:一加速電極,其配置為面對電子源的一電子排放表面,且其使電子加速;一抽取電極,其配置於電子發射表面與加速電極之間,其具有一使中心位於光軸上且面對電子發射表面之球型凹形表面,且其自電子發射表面抽取一電子;及一抑制器電極,其相對於電子發射表面配置在與抽取電極相對之側上,且其抑制來自電子源的一側表面之電子發射。電子槍中,電場被施加至電子發射表面同時電子源在一不造成電子源的一材料昇華之範圍中被保持在一低溫度,以造成電子源發射一熱埸發射電子。

    Abstract in simplified Chinese: 一具有一发射电子的电子源之电子枪系包括:一加速电极,其配置为面对电子源的一电子排放表面,且其使电子加速;一抽取电极,其配置于电子发射表面与加速电极之间,其具有一使中心位于光轴上且面对电子发射表面之球型凹形表面,且其自电子发射表面抽取一电子;及一抑制器电极,其相对于电子发射表面配置在与抽取电极相对之侧上,且其抑制来自电子源的一侧表面之电子发射。电子枪中,电场被施加至电子发射表面同时电子源在一不造成电子源的一材料升华之范围中被保持在一低温度,以造成电子源发射一热埸发射电子。

    针状带电粒子束发射体及制作方法
    49.
    发明申请
    针状带电粒子束发射体及制作方法 审中-公开

    公开(公告)号：WO2015058588A1

    公开(公告)日：2015-04-30

    申请号：PCT/CN2014/085644

    申请日：2014-08-31

    Applicant: 严建新

    Inventor： 严建新

    IPC: H01J37/065 ,  H01J35/06 ,  H01J9/02

    CPC classification number: H01J37/065 ,  H01J1/3044 ,  H01J9/025 ,  H01J37/063 ,  H01J37/073

    Abstract: 一种带电粒子束的发射体，该发射体为针状，且针顶端部分（200）至少包含两个组分，组分一是具有至少朝针顶指向方向开口的洞状组分（202），组分二是设置于组分一空洞中的针尖组分（204），电子至少从组分二的针尖顶点发射出。该发射体的特点是发射所需施加电压低并且发射带电粒子束的发射面积小，发散角小。

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