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    CHARGED PARTICLE BEAM MODULATOR
    45.
    发明公开
    CHARGED PARTICLE BEAM MODULATOR 有权
    调制器带电粒子

    公开(公告)号：EP2638559A1

    公开(公告)日：2013-09-18

    申请号：EP11784637.8

    申请日：2011-11-14

    Applicant: Mapper Lithography IP B.V.

    Inventor： WIELAND, Marco Jan-Jaco ,  JAGER, Remco ,  VAN VEEN, Alexander Hendrik Vincent ,  STEENBRINK, Stijn Willem Herman Karel ,  VAN DE PEUT, Teunis ,  DERKS, Henk

    IPC: H01J37/04 ,  H01J37/22 ,  H01J37/317 ,  H01J37/09 ,  H01J37/24

    CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/241 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/2482

    Abstract: The invention relates to a charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator, a beam stop array and a modulation device. The beam generator is arranged for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column. The beam stop array has a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. The modulation device comprises a plurality of apertures with associated modulators; and a plurality of light sensitive elements, both arranged in arrays. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for suitably powering elements within the modulation device. The power interface area being located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.

    Dual mode gas field ion source
    47.
    发明公开
    Dual mode gas field ion source 有权
    Verwendung einer Doppelmodus-Gasfeldionenquelle

    公开(公告)号：EP2088613A1

    公开(公告)日：2009-08-12

    申请号：EP08101447.4

    申请日：2008-02-08

    Applicant: ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh

    Inventor： Frosien, Jürgen

    IPC: H01J37/08 ,  H01J27/26 ,  H01J49/16

    CPC classification number: H01J37/08 ,  H01J27/26 ,  H01J37/241 ,  H01J37/243 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0807 ,  H01J2237/0827 ,  H01J2237/28 ,  H01J2237/317

    Abstract: A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure (14,17) for housing a gas field ion source emitter (12,13) with an emitter area for generating ions, an electrode (18) for extracting ions from the gas field ion source emitter, one or more gas inlets (110,112) adapted to introduce a first gas and a second gas to the emitter area, an objective lens (20) for focusing the ion beam generated from the first gas or the second gas, a voltage supply (72) for providing a voltage between the electrode and the gas field ion source emitter, and a controller (172,472) for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.

    Abstract translation: 描述了聚焦离子束装置。 聚焦离子束装置包括离子束柱，其包括用于容纳具有用于产生离子的发射极区域的气体场离子源发射器（12,13）的外壳（14,17），用于从气体中提取离子的电极（18） 场离子源发射器，适于将第一气体和第二气体引入发射极区域的一个或多个气体入口（110,112），用于聚焦从第一气体或第二气体产生的离子束的物镜， 用于在电极和气体离子源发射器之间提供电压的电压源（72）和用于在电压源的第一电压和第二电压之间切换的控制器（172,472），用于产生第一 气体或第二气体的离子离子束。

    Electron beam apparatus having electron energy analyzer and method of controlling lenses
    48.
    发明公开
    Electron beam apparatus having electron energy analyzer and method of controlling lenses 有权
    用电子能量分析仪和方法，用于控制透镜的电子束装置

    公开(公告)号：EP1441382A3

    公开(公告)日：2009-07-29

    申请号：EP04250358.1

    申请日：2004-01-23

    Applicant: JEOL Ltd.

    Inventor： Kaneyama, Toshikatsu

    IPC: H01J37/26 ,  H01J37/24

    CPC classification number: H01J37/05 ,  H01J37/241 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/24485

    Abstract: An electron beam apparatus having an electron analyzer (28) is achieved which can control the illumination lens system (22) by feedback without adversely affecting the imaging action even if a specimen (23) is positioned within the magnetic field of the objective lens. The apparatus has an energy shift control module (37) for controlling energy shift. On receiving instructions about setting of energy shift from the CPU (36), the control module (37) issues an instruction for shifting the accelerating voltage to a specified value to an accelerating-voltage control module (33) . The control module also sends information about the energy shift to an energy shift feedback control module (38), which calculates the feedback value and supplies information about corrections of lenses and deflection coils to a TEM optics control module (34) . The feedback value is multiplied by a corrective coefficient that can be calibrated.

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