公开(公告)号：JPH0748785B2

公开(公告)日：1995-05-24

申请号：JP15626286

申请日：1986-07-04

Applicant: CANON KK

Inventor： HATANAKA KATSUNORI ,  ABE NAOTO ,  SAKAMOTO EIJI ,  SAIGA TOSHIHIRO

IPC: H04N1/19 ,  H04N1/028 ,  H04N1/193 ,  H04N1/40 ,  H04N5/335 ,  H04N5/341 ,  H04N5/353 ,  H04N5/369 ,  H04N5/374

公开(公告)号：JPH05335200A

公开(公告)日：1993-12-17

申请号：JP16533492

申请日：1992-06-01

Applicant: CANON KK

Inventor： HARA SHINICHI ,  SAKAMOTO EIJI ,  WATANABE YUTAKA

IPC: G21K5/08 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  H01L21/683

Abstract: PURPOSE:To prevent a wafer stage from being deformed by a method wherein thermal deformation generated in a plate-like Peltier element is canceled each other. CONSTITUTION:A wafer stage 101 is composed of a suction block 101a where a wafer W is placed, a first plate-like Peltier element 102a, a cooling block 103 equipped with a cooling water path 103a, a second plate-like Peltier element 102b, and an auxiliary block 111 of the same material and size with the suction block 101a, where the component parts are laminated and connected into an integral structure. Temperature data outputted from the 104 of the suction block 101a and the temperature sensor 104b of the auxiliary block 111 are processed through a computer 106, and the first and the second plate-like Peltier element, 102a and 102b, are controlled by the control device 107.

公开(公告)号：JPH04142727A

公开(公告)日：1992-05-15

申请号：JP26593590

申请日：1990-10-03

Applicant: CANON KK

Inventor： ORII SEIJI ,  YONEKAWA MASAMI ,  SAKAMOTO EIJI

IPC: G03F7/207 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To air-cool multiple lenses effectively without wakening the lens tube structure by a method wherein the adjacent spaces out of the lens speces formed in a projection optical system are made to communicate with each other to be connected to an airconditioner through the intermediary of a vent hole made in the lens tube. CONSTITUTION:The multiple lenses (L1-L5) of a projection optical system 1 held by respective holding members 1a and press rings 1e are contained in a lens tube 1b forming multiple lens spaces. At this time, at least one opening 1c is formed on a part of the holding member 1a or a part out of the effective regions such as the end parts, etc., of the lenses so as to communicate the two adjacent lens spaces with each other. Furthermore, respective opening parts to be formed in the multiple holding members are juxtaposed around the holding members 1a e.g. at the same intervals. On the other hand, a vent hole 1d is made in a part of the lens tube 1b to be connected to an airconditioner 9 comprising a suction pump, etc. In such a constitution, air is sucked in from a part of the lens spaces so that external air may be zigzag fed to respective lens spaces. Through these procedures, the temperature size due to the heat absorption of exposed light of respective lenses can be avoided.

公开(公告)号：JPH0378601B2

公开(公告)日：1991-12-16

申请号：JP24699985

申请日：1985-11-06

Applicant: CANON KK

Inventor： MURATA TATSUO ,  KAMIO MASARU ,  TAKAO HIDEAKI ,  MOTOI YASUKO ,  SAKAMOTO EIJI ,  SEKIMURA NOBUYUKI

IPC: G02B5/20 ,  G03F7/00 ,  G03F9/00 ,  H01L27/14

公开(公告)号：JPH0391916A

公开(公告)日：1991-04-17

申请号：JP23003289

申请日：1989-09-04

Applicant: CANON KK

Inventor： MORI MAKIKO ,  OZAWA KUNITAKA ,  UDA KOJI ,  SAKAMOTO EIJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make it possible to conduct a printing operation in a highly precise manner by a method wherein an exposure quiescent time is provided in the midway of an exposing work, and an X-ray exposure is conducted for a long hours while the temperature of a mask and a wafer is being maintained in the range of appropriate temperature. CONSTITUTION:When a one-shot exposing operation is conducted, temperature- monitoring mechanisms 5 and 6, with which the temperature of a mask 1 and a wafer 2 will not exceed the exposure temperature range which is controlled by the printing line width and the like of pattern, are provided or a timing is obtained in advance using a method with which the relation between the period of exposure and the variation of temperature is made to known. The above-mentioned exposure is controlled by driving a shutter, with which exposure energy is shut off, or by conducting an ON/OFF operation and the like on an exposure energy source 7. To be more precise, the heat accumulated on the mask 1 and the wafer 2 is released by providing an exposure quiescent time in the midway of exposure operation, and after the heat has been released, exposure is started again. As a result, the distortion of the mask 1 and the wafer 2 due to thermal expansion and the like can be prevented, and the improvement in printing accuracy of pattern on the wafer 2 can be achieved.

公开(公告)号：JPH0344913A

公开(公告)日：1991-02-26

申请号：JP17916789

申请日：1989-07-13

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  HARA SHINICHI ,  SAKAMOTO EIJI

IPC: H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  H01L21/683

Abstract: PURPOSE:To suppress temperature rise of a substrate and to normally process the substrate by providing means for controlling pressure in a pressure reducing hole so that a contact thermal resistance between the substrate and a holding base shows a predetermined value. CONSTITUTION:A wafer chuck 6 is provided with a pressure reducing hole 11, which is connected to a pressure gauge 13 through a suction port 12, and also connected to a pump 17 and a gas cylinder 16a through gas regulating valves 15a, 15b. A signal of the gauge 13a is sent to a controller 14a through a CPU 20 to control the pressure of the hole 11. When a wafer 5 is exposed, gas in the hole 11 is sucked, and the wafer 5 is held by the chuck 6. Pressure in the hole 11 is controlled so that contact thermal resistance between the wafer 5 and the chuck 6 shows a predetermined value. Thus, the temperature rise of the wafer can be suppressed.

公开(公告)号：JPH0296812A

公开(公告)日：1990-04-09

申请号：JP24749388

申请日：1988-10-03

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  KARIYA TAKUO ,  MIZUSAWA NOBUTOSHI ,  UDA KOJI ,  SAKAMOTO EIJI

IPC: G05D23/00 ,  G03F7/20 ,  G05D23/19 ,  H01L21/027

Abstract: PURPOSE:To simultaneously and precisely temperature-control plural subjects to be temperature controlled in different places by providing a temperature control means controlling the temperatures of a precision constant temperature liquid medium supply device, a distributor and the liquid medium of respective channels which the distributor has distributed. CONSTITUTION:The means supplying the prescribed constant temperature liquid medium, the distribution means 18 distributing the liquid medium from the supply means into plural channels and the means controlling the temperatures of the respective constant temperature liquid mediums which have been distributed are provided. Namely, temperature control means (the control of current values of heaters in heat converters 15-16) are respectively provided for the constant temperature liquid mediums of plural channels 9-11 which have been distributed in correspondence with plural objects which are temperature- controlled 3-5. The variance of the liquid medium temperatures due to the pressure loss energy of the liquid medium channels 9-11 of the objects to be temperature-controlled 3-5 is corrected in the temperature control means. Thus, plural objects to be temperature-controlled 3-5 in the different places can precisely be temperature-controlled with simple constitution.

公开(公告)号：JPS62108203A

公开(公告)日：1987-05-19

申请号：JP24699685

申请日：1985-11-06

Applicant: CANON KK

Inventor： TAKAO HIDEAKI ,  MOTOI YASUKO ,  KAMIO MASARU ,  SAKAMOTO EIJI ,  MURATA TATSUO ,  SEKIMURA NOBUYUKI

IPC: G02B5/20 ,  G02B5/22 ,  H01L27/14 ,  H04N9/04

Abstract: PURPOSE:To obtain the titled filter having a deposited red coloring layer which has excellent properties of thermal resistance, solvent resistance, adhesion against a substrate, and spectral characteristics by forming the layer contg. a red coloring matter deposited a specific anthraquinone type coloring matter on a substrate CONSTITUTION:The resist is coated on the substrate 1 and then a prescribed resist pattern 21 is formed by irradiating light or an electron beam to it to form a mask. The coloring matter layer 3 is formed by depositing the coloring matter contg. the anthraquinone derivative shown by formula I using said mask. The layer 4 contg. the red coloring matter of the stripe pattern type is formed by removing the resist pattern 2 and the layer 3 thereon, by dipping said substrate in a solvent which does not dissolve the coloring matter to obtain the titled filter. The titled filter may be provided with a protective layer.

公开(公告)号：JPS62108202A

公开(公告)日：1987-05-19

申请号：JP24699585

申请日：1985-11-06

Applicant: CANON KK

Inventor： TAKAO HIDEAKI ,  MOTOI YASUKO ,  KAMIO MASARU ,  SAKAMOTO EIJI ,  MURATA TATSUO ,  SEKIMURA NOBUYUKI

IPC: G02B5/20 ,  G02B5/22 ,  H01L27/14 ,  H04N9/04

Abstract: PURPOSE:To obtain the titled filter having a deposited red coloring layer which has excellent properties of thermal resistance solvent resistance, adhesion against a substrate, and spectral characteristics by forming the layer contg. a red coloring matter deposited a specific perinone type coloring matter on a substrate. CONSTITUTION:The positive type resist is coated on the substrate 1 and then a prescribed resist pattern 2 is formed by irradiating light or an electron beam to it to form a mask. The coloring matter layer 3 is formed by depositing the coloring matter contg. perinone or its derivative shown by formula I or II using said mask. The layer 4 contg. the red coloring matter of the stripe pattern type is formed by removing the resist pattern 2 and the layer 3 thereon, by dipping said substrate in a solvent which does not dissolve the coloring matter to obtain the titled filter. The titled filter may be provided with a protective layer.

公开(公告)号：JPS62106404A

公开(公告)日：1987-05-16

申请号：JP24529585

申请日：1985-11-02

Applicant: CANON KK

Inventor： SAKAMOTO EIJI ,  KAMIO MASARU ,  MOTOI YASUKO ,  TAKAO HIDEAKI ,  MURATA TATSUO ,  SEKIMURA NOBUYUKI

IPC: G02B5/20 ,  H01L27/14 ,  H04N9/04

Abstract: PURPOSE:To provide a titled filter which has excellent resistance to heat and light and obviates image deterioration by diagonal incident light by closely disposing light shielding layers having the film thickness larger than the film thickness of dye layers between the respectively adjacent dye layers. CONSTITUTION:This filter is constituted by closely disposing the light shielding layers having the film thickness larger than the film thickness of the dye layers between the respective adjacent dye layers. More specifically, the light shielding layers 5 are formed to the thickness larger than the thickness of the dye layer which has the largest film thickness among various kinds of the dye layers. Any materials which have non-transparency of light and permit the removal of desired parts by a method for etching, etc., after lamination, i.e., materials which can be patterned are usable for the layers 5. For example, metallic materials including Al, Cr, Mo, etc., or high-polymer materials subjected to substantial coloring to shield light, for example, PVA, polyimide, resist or inorg. and org. pigments, etc. are usable.