公开(公告)号：WO2005006385A3

公开(公告)日：2005-04-14

申请号：PCT/EP2004005288

申请日：2004-05-17

Applicant: INTEGRATED CIRCUIT TESTING ,  FEUERBAUM HANS-PETER ,  FROSIEN JUERGEN ,  HOFFMANN ULI ,  WINKLER DIETER ,  ADAMEC PAVEL

Inventor： FEUERBAUM HANS-PETER ,  FROSIEN JUERGEN ,  HOFFMANN ULI ,  WINKLER DIETER ,  ADAMEC PAVEL

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/30

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/047 ,  H01J2237/0635

Abstract: The present invention provides a charged particle beam device. The device comprises an emitter array (22) for emitting a plurality of charged particle beams (8). The plurality of charged particle beams are imaged with a lens (12). An electrode unit (14) is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit (11) and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.

Abstract translation: 本发明提供一种带电粒子束装置。 该装置包括用于发射多个带电粒子束（8）的发射极阵列（22）。 多个带电粒子束用透镜（12）成像。 设置有用于加速多个带电粒子束的电极单元（14）。 第一控制单元（11）和第二控制单元控制发射极阵列的第一电位，电极单元的第二电位和试样的第三电位之间的电位差。 因此，第二电位能够相对于第一电位加速多个带电粒子束，并且第三电位能够使多个带电粒子束相对于第二电位减速。

公开(公告)号：WO2004086452A3

公开(公告)日：2005-02-17

申请号：PCT/EP2004002841

申请日：2004-03-18

Applicant: INTEGRATED CIRCUIT TESTING ,  FROSIEN JUERGEN

Inventor： FROSIEN JUERGEN

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/317

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/28 ,  H01J37/3174

Abstract: The invention provides a charged particle beam device and a method of operation thereof. An emitter (2) emits a primary charged particle beam (12). Depending on the action of a deflection system, which comprises at least three deflection stages (14), it can be switched between at least two detection units (16, 44). Further, beam shaping means (15, 41) is provided and a lens for focusing at the primary charged particle beam on a specimen.

Abstract translation: 本发明提供一种带电粒子束装置及其操作方法。 发射器（2）发射初级带电粒子束（12）。 根据包括至少三个偏转级（14）的偏转系统的动作，它可以在至少两个检测单元（16,44）之间切换。 此外，提供光束成形装置（15,41）和用于在初级带电粒子束聚焦在样本上的透镜。

公开(公告)号：WO2004054352A3

公开(公告)日：2004-10-28

申请号：PCT/EP0314141

申请日：2003-12-12

Applicant: INTEGRATED CIRCUIT TESTING ,  LANIO STEFAN

Inventor： LANIO STEFAN

IPC: A01J20060101 ,  H01J37/141 ,  H01J37/145

CPC classification number: H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1405

Abstract: The invention provides a lens system for a plurality of charged particle beams. Therein, at least one common excitation coil for at least two lens modules is provided. The lens modules comprise a first pole piece, a second pole piece and at least one opening for a charged particle beam. The lens modules constitute a component and share the excitation coil. Thereby, raw material availability, processing of work pieces and symmetry conditions for the lens fields are improved.

Abstract translation: 本发明提供一种用于多个带电粒子束的透镜系统。 其中，提供至少一个用于至少两个透镜模块的公共激励线圈。 透镜模块包括第一极靴，第二极靴和用于带电粒子束的至少一个开口。 透镜模块构成一个部件并共享励磁线圈。 从而提高了原材料的可利用性，工件的加工和透镜领域的对称条件。

公开(公告)号：WO2004055856A2

公开(公告)日：2004-07-01

申请号：PCT/EP2003/014140

申请日：2003-12-12

Applicant: ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FROSIEN, Jürgen ,  ADAMEC, Pavel

Inventor： FROSIEN, Jürgen ,  ADAMEC, Pavel

IPC: H01J37/145

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177

Abstract: The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.

Abstract translation: 本发明提供了一种用于带电粒子多光束系统的光学系统。 光学系统包括静电透镜部件和磁性透镜部件。 这些部件用于将多个带电粒子束聚焦在分开的开口中，用于至少多个穿过光学系统的带电粒子束中的每一个。

公开(公告)号：WO2004054352A2

公开(公告)日：2004-07-01

申请号：PCT/EP2003/014141

申请日：2003-12-12

Applicant: ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  LANIO, Stefan

Inventor： LANIO, Stefan

IPC: A01J

CPC classification number: H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1405

Abstract: The invention provides a lens system for a plurality of charged particle beams. Therein, at least one common excitation coil for at least two lens modules is provided. The lens modules comprise a first pole piece, a second pole piece and at least one opening for a charged particle beam. The lens modules constitute a component and share the excitation coil. Thereby, raw material availability, processing of work pieces and symmetry conditions for the lens fields are improved.

Abstract translation: 本发明提供了用于多个带电粒子束的透镜系统。 其中，提供了用于至少两个镜头模块的至少一个共同的励磁线圈。 透镜模块包括第一极片，第二极片和用于带电粒子束的至少一个开口。 镜头模块构成一个组件并共享励磁线圈。 因此，原材料可用性，工件加工和镜片领域的对称条件得到改善。

公开(公告)号：WO2023061651A1

公开(公告)日：2023-04-20

申请号：PCT/EP2022/073953

申请日：2022-08-29

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH

Inventor： EHBERGER, Dominik ,  BREUER, John ,  FIRNKES, Matthias

IPC: H01J37/153 ,  H01J37/28

Abstract: A method of determining aberrations of a charged particle beam (11) focused by a focusing lens (120) toward a sample (10) in a charged particle beam system is described. The method includes: (a) taking one or more images of the sample at one or more defocus settings to provide one or more taken images (h1...N); (b) simulating one or more images of the sample taken at the one or more defocus settings based on a set of beam aberration coefficients (iC) and a focus image of the sample to provide one or more simulated images; (c) comparing the one or more taken images and the one or more simulated images for determining a magnitude (Ri) of a difference therebetween; and (d) varying the set of beam aberration coefficients (*C) to provide an updated set of beam aberration coefficients (i+1C) and repeating (b) and (c) using the updated set of beam aberration coefficients (i+1C) in an iterative process for minimizing said magnitude (Ri). Alternatively, in (b), one or more beam cross sections may be simulated, and, in (c) the simulated beam cross sections may be compared with one or more retrieved beam cross sections retrieved from the one or more taken images for determining a magnitude (Ri) of a difference therebetween. Further, a charged particle beam system for imaging and/or inspecting a sample that is configured for any of such methods is provided.

公开(公告)号：WO2005071709A3

公开(公告)日：2005-12-15

申请号：PCT/EP2004014180

申请日：2004-12-13

Applicant: INTEGRATED CIRCUIT TESTING ,  FROSIEN JUERGEN

Inventor： FROSIEN JUERGEN

IPC: H01J37/12 ,  H01J37/14 ,  H01J37/15 ,  H01J37/10

CPC classification number: H01J37/14 ,  H01J37/12 ,  H01J37/15 ,  H01J2237/1501

Abstract: The present invention relates to a beam optical component including a charged particle lens (1; 1000) for focusing a charged particle beam (3), the charged particle lens (1; 1000) comprising a first element (5; 1005) having a first opening (7) for focusing the charged particle beam (3); a second element (9; 1009) having a second opening (11) for focusing the charged particle beam (3); and first driving means (13) connected with at least one of the first element (5; 1005) and the second element (9; 1009) for aligning the first opening (7) with respect to the second opening (11). With the first driving means, the first opening (7) and the second opening (11) can be aligned with respect to each other during beam operation to provide a superior alignment of the beam optical component for a better beam focussing. The present invention also relates to a charged particle beam device that uses said beam optical component for focussing the charged particle beam (3), and a method to align first opening (7) and second opening (11) with respect to each other.

Abstract translation: 本发明涉及包括用于聚焦带电粒子束（3）的带电粒子透镜（1; 1000）的束光学组件，带电粒子透镜（1; 1000）包括具有第一元件（5; 1005） 用于聚焦带电粒子束（3）的开口（7）; 具有用于聚焦所述带电粒子束（3）的第二开口（11）的第二元件（9; 1009）; 和与第一元件（5; 1005）和第二元件（9; 1009）中的至少一个连接的第一驱动装置（13），用于使第一开口（7）相对于第二开口（11）对准。 利用第一驱动装置，在光束操作期间，第一开口（7）和第二开口（11）可以相对于彼此对准，以提供光束光学部件的优良对准以实现更好的光束聚焦。 本发明还涉及一种使用所述光束光学部件来聚焦带电粒子束（3）的带电粒子束装置以及一种使第一开口（7）和第二开口（11）相对于彼此对准的方法。

公开(公告)号：WO2005024888A3

公开(公告)日：2005-04-28

申请号：PCT/EP2004009801

申请日：2004-09-02

Applicant: INTEGRATED CIRCUIT TESTING ,  FROSIEN JUERGEN ,  DEGENHARDT RALF ,  LANIO STEFAN

Inventor： FROSIEN JUERGEN ,  DEGENHARDT RALF ,  LANIO STEFAN

IPC: H01J37/05 ,  H01J37/153 ,  H01J37/28 ,  H01J49/28 ,  H01J49/46 ,  H01J49/48

CPC classification number: H01J37/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/05 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

Abstract: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

Abstract translation: 本发明涉及例如 具有沿着光轴的z轴以及第一和第二平面的带电粒子束的带电粒子束能量宽度减小系统，包括：以聚焦和色散方式作用的第一元件（110），第二元件（ 112）以聚焦和散射方式作用，第一四极元件（410）被定位成使得在操作中第一四极元件的场与第一元件的聚焦和散射方式的场重叠，第二 四极元件（412）被定位成使得在操作中，第二四极元件的场与以聚焦和色散方式作用的第二元件的场重叠，第一带电粒子选择元件（618）以束 在第一元件以聚焦和色散方式作用之前，以及第二带电粒子选择元件（616; 716）在光束方向上定位在第一元件作用于聚焦和分散方式之后 d分散的方式。 由此，可以实现没有固有色散限制的虚拟色散源位置。

公开(公告)号：WO2005024890A1

公开(公告)日：2005-03-17

申请号：PCT/EP2004/009802

申请日：2004-09-02

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FROSIEN, Jürgen ,  DEGENHARDT, Ralf ,  LANIO, Stefan

Inventor： FROSIEN, Jürgen ,  DEGENHARDT, Ralf ,  LANIO, Stefan

IPC: H01J37/153

CPC classification number: H01J37/05 ,  H01J37/153 ,  H01J2237/057 ,  H01J2237/1534

Abstract: The present invention provides a charged particle beam energy width reduction system. The system comprises a first element (110) acting in a focusing and dispersive manner in an x-z-plane; a second element (112) acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element (116; 116a; 116b) positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element (114; 314, 712; 714) positioned between the first and the second element acting in a focusing and dispersive manner.

Abstract translation: 本发明提供一种带电粒子束能量减少系统。 该系统包括以x-z平面聚焦和分散的方式起作用的第一元件（110） 在x-z平面中以聚焦和分散方式起作用的第二元件（112）; 位于第一和第二元件之间的带电粒子选择元件（116; 116a; 116b）以聚焦和分散方式起作用; 以及位于第一和第二元件之间的以聚焦和分散方式起作用的聚焦元件（114; 314,712; 714）。

公开(公告)号：WO2004097378A1

公开(公告)日：2004-11-11

申请号：PCT/EP2004/004402

申请日：2004-04-26

Applicant: ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FEUERBAUM, Hans-Peter

Inventor： FEUERBAUM, Hans-Peter

IPC: G01N1/32

CPC classification number: G01N1/32 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/20 ,  H01J2237/31745

Abstract: The invention refers to an apparatus (10) for inspecting a sample (12) of a specimen (14) by means of an electron beam (34) comprising a vacuum chamber (18); an ion beam device (20) for generating an ion beam (22) used for etching a sample (12) from the specimen (14) within said vacuum chamber (18); an electron beam device (30) having a scanning unit (32) for scanning the electron beam (34) across said specimen (14) within said vacuum chamber (18); said electron beam device (30) having a first detector (36) positioned to detect electrons (38) that are released from the specimen (14) in a backward direction with respect to the direction of the electron beam (34); and said electron beam device (30) having a second detector (40) positioned to detect electrons (42) that are released from the sample (12) of the specimen (14) in a forward direction with respect to the direction of the electron beam (34); and separation means (50; 52) within said vacuum chamber (18) to separate the sample (12) from the specimen (14) for the inspection of the sample (12) by means of the second detector (40). With the apparatus according to the invention, it is possible to perfom a transmission inspection of a sample of a specimen, e.g. a thin slice of a semiconductor wafer, at a high throughput at comparably low costs.

Abstract translation: 本发明涉及一种用于通过包括真空室（18）的电子束（34）检查试样（14）的样品（12）的装置（10）。 用于产生用于在所述真空室（18）内从样品（14）蚀刻样品（12）的离子束（22）的离子束装置（20）; 具有扫描单元（32）的电子束装置（30），用于在所述真空室（18）内扫过所述试样（14）上的电子束（34）。 所述电子束装置（30）具有第一检测器（36），所述第一检测器（36）定位成检测相对于所述电子束（34）的方向在从所述样本（14）向后方释放的电子（38） 并且所述电子束装置（30）具有第二检测器（40），所述第二检测器（40）定位成检测相对于电子束的方向从样品（14）的样品（12）向前方释放的电子（42） （34）; 以及在所述真空室（18）内的分离装置（50; 52），以将样品（12）与样品（14）分离，以便通过第二检测器（40）检查样品（12）。 利用根据本发明的装置，可以对试样的样品进行透射检查，例如， 半导体晶片的薄片，在相当低的成本下处于高产量。