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    DOUBLE STAGE CHARGED PARTICLE BEAM ENERGY WIDTH REDUCTION SYSTEM FOR CHARGED PARTICLE BEAM SYSTEM
    1.
    发明申请
    DOUBLE STAGE CHARGED PARTICLE BEAM ENERGY WIDTH REDUCTION SYSTEM FOR CHARGED PARTICLE BEAM SYSTEM 审中-公开
    带电粒子束系统的双级带电粒子束能量宽度减小系统

    公开(公告)号：WO2005024888A3

    公开(公告)日：2005-04-28

    申请号：PCT/EP2004009801

    申请日：2004-09-02

    Applicant: INTEGRATED CIRCUIT TESTING ,  FROSIEN JUERGEN ,  DEGENHARDT RALF ,  LANIO STEFAN

    Inventor： FROSIEN JUERGEN ,  DEGENHARDT RALF ,  LANIO STEFAN

    IPC: H01J37/05 ,  H01J37/153 ,  H01J37/28 ,  H01J49/28 ,  H01J49/46 ,  H01J49/48

    CPC classification number: H01J37/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/05 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

    Abstract: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

    Abstract translation: 本发明涉及例如 具有沿着光轴的z轴以及第一和第二平面的带电粒子束的带电粒子束能量宽度减小系统，包括：以聚焦和色散方式作用的第一元件（110），第二元件（ 112）以聚焦和散射方式作用，第一四极元件（410）被定位成使得在操作中第一四极元件的场与第一元件的聚焦和散射方式的场重叠，第二 四极元件（412）被定位成使得在操作中，第二四极元件的场与以聚焦和色散方式作用的第二元件的场重叠，第一带电粒子选择元件（618）以束 在第一元件以聚焦和色散方式作用之前，以及第二带电粒子选择元件（616; 716）在光束方向上定位在第一元件作用于聚焦和分散方式之后 d分散的方式。 由此，可以实现没有固有色散限制的虚拟色散源位置。

    CHARGED PARTICLE BEAM ENERGY WIDTH REDUCTION SYSTEM FOR CHARGED PARTICLE BEAM SYSTEM
    2.
    发明申请
    CHARGED PARTICLE BEAM ENERGY WIDTH REDUCTION SYSTEM FOR CHARGED PARTICLE BEAM SYSTEM 审中-公开
    充电粒子束能量减少系统的充电粒子束系统

    公开(公告)号：WO2005024890A1

    公开(公告)日：2005-03-17

    申请号：PCT/EP2004/009802

    申请日：2004-09-02

    Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FROSIEN, Jürgen ,  DEGENHARDT, Ralf ,  LANIO, Stefan

    Inventor： FROSIEN, Jürgen ,  DEGENHARDT, Ralf ,  LANIO, Stefan

    IPC: H01J37/153

    CPC classification number: H01J37/05 ,  H01J37/153 ,  H01J2237/057 ,  H01J2237/1534

    Abstract: The present invention provides a charged particle beam energy width reduction system. The system comprises a first element (110) acting in a focusing and dispersive manner in an x-z-plane; a second element (112) acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element (116; 116a; 116b) positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element (114; 314, 712; 714) positioned between the first and the second element acting in a focusing and dispersive manner.

    Abstract translation: 本发明提供一种带电粒子束能量减少系统。 该系统包括以x-z平面聚焦和分散的方式起作用的第一元件（110） 在x-z平面中以聚焦和分散方式起作用的第二元件（112）; 位于第一和第二元件之间的带电粒子选择元件（116; 116a; 116b）以聚焦和分散方式起作用; 以及位于第一和第二元件之间的以聚焦和分散方式起作用的聚焦元件（114; 314,712; 714）。

    MULTI-AXIS LENS, BEAM SYSTEM MAKING USE OF THE COMPOUND LENS, AND METHOD OF MANUFACTURING THE COMPOUND LENS
    3.
    发明申请
    MULTI-AXIS LENS, BEAM SYSTEM MAKING USE OF THE COMPOUND LENS, AND METHOD OF MANUFACTURING THE COMPOUND LENS 审中-公开
    多轴透镜，使用该化合物镜头的光束系统及其制造方法

    公开(公告)号：WO2004054352A3

    公开(公告)日：2004-10-28

    申请号：PCT/EP0314141

    申请日：2003-12-12

    Applicant: INTEGRATED CIRCUIT TESTING ,  LANIO STEFAN

    Inventor： LANIO STEFAN

    IPC: A01J20060101 ,  H01J37/141 ,  H01J37/145

    CPC classification number: H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1405

    Abstract: The invention provides a lens system for a plurality of charged particle beams. Therein, at least one common excitation coil for at least two lens modules is provided. The lens modules comprise a first pole piece, a second pole piece and at least one opening for a charged particle beam. The lens modules constitute a component and share the excitation coil. Thereby, raw material availability, processing of work pieces and symmetry conditions for the lens fields are improved.

    Abstract translation: 本发明提供一种用于多个带电粒子束的透镜系统。 其中，提供至少一个用于至少两个透镜模块的公共激励线圈。 透镜模块包括第一极靴，第二极靴和用于带电粒子束的至少一个开口。 透镜模块构成一个部件并共享励磁线圈。 从而提高了原材料的可利用性，工件的加工和透镜领域的对称条件。

    CHARGED PARTICLE BEAM DEVICE WITH APERTURE
    5.
    发明申请
    CHARGED PARTICLE BEAM DEVICE WITH APERTURE 审中-公开
    带孔的充电颗粒光束装置

    公开(公告)号：WO2005041242A1

    公开(公告)日：2005-05-06

    申请号：PCT/EP2004/011825

    申请日：2004-10-19

    Applicant: ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FROSIEN, Juergen ,  LANIO, Stefan ,  BANZHOF, Helmut

    Inventor： FROSIEN, Juergen ,  LANIO, Stefan ,  BANZHOF, Helmut

    IPC: H01J37/09

    CPC classification number: H01J37/09 ,  H01J2237/0455

    Abstract: The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charge particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.

    Abstract translation: 本发明涉及一种用于检查或构造包括带电粒子束源（5）以产生带电粒子束（7）的样本（3）的带电粒子束装置（1），聚焦透镜（9） 带电粒子束（7）到样品（3）上，以及孔径系统（13），用于限定带电粒子束（7）的孔（6）。 孔径系统（13）包括阻挡带电粒子束源（5）和聚焦透镜（9）之间的带电粒子束（7）的第一部分（7a）的第一构件（20），第二构件 30）阻挡带电粒子束源（5）和聚焦透镜（9）之间的电荷粒子束（7）的第二部分（7b），第一装置（24）用于移动第一构件（20）以调整 带电粒子束（7）的阻挡的第一部分（7a）的尺寸以及用于独立于第一部分（7b）移动第二部件（30）的第二装置（34）。 利用这种孔径系统（13），可以在操作期间自由地调整孔径（6）的尺寸并将其对准光轴（8）。

    DOUBLE STAGE CHARGED PARTICLE BEAM ENERGY WIDTH REDUCTION SYSTEM FOR CHARGED PARTICLE BEAM SYSTEM
    7.
    发明申请
    DOUBLE STAGE CHARGED PARTICLE BEAM ENERGY WIDTH REDUCTION SYSTEM FOR CHARGED PARTICLE BEAM SYSTEM 审中-公开
    双级充电粒子束能量减少系统用于充电粒子束系统

    公开(公告)号：WO2005024888A2

    公开(公告)日：2005-03-17

    申请号：PCT/EP2004/009801

    申请日：2004-09-02

    Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FROSIEN, Jürgen ,  DEGENHARDT, Ralf ,  LANIO, Stefan

    Inventor： FROSIEN, Jürgen ,  DEGENHARDT, Ralf ,  LANIO, Stefan

    IPC: H01J37/00

    CPC classification number: H01J37/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/05 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

    Abstract: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

    Abstract translation: 本发明涉及例如 用于沿着光轴具有z轴的带电粒子束的带电粒子束能量宽度减小系统以及包括以聚焦和分散方式起作用的第一元件（110）的第一和第二平面，第二元件（ 112），第一四极元件（410）被定位成使得在操作中，第一四极元件的场与以聚焦和分散方式作用的第一元件的场重叠，第二四极元件 四极元件（412）被定位成使得在操作中，第二四极元件的场与以聚焦和分散方式作用的第二元件的场重叠，第一带电粒子选择元件（618）被定位成束 方向，在第一元件以聚焦和分散方式作用之前，第二带电粒子选择元件（616; 716）在光束方向上位于第一元件作用于聚焦 分散的方式。 因此，可以实现没有固有分散限制的虚拟色散源状位置。

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