BRIGHT AND DURABLE FIELD EMISSION SOURCE DERIVED FROM REFRACTORY TAYLOR CONES
    72.
    发明公开
    BRIGHT AND DURABLE FIELD EMISSION SOURCE DERIVED FROM REFRACTORY TAYLOR CONES 审中-公开
    HELLE UND DAUERHAFTE FELDEMISSIONSQUELLE AUS FEUERFESTEN TAYLOR-KEGELN

    公开(公告)号:EP3066680A4

    公开(公告)日:2017-07-05

    申请号:EP14860789

    申请日:2014-11-07

    Applicant: HIRSCH GREGORY

    Inventor: HIRSCH GREGORY

    Abstract: A method of producing field emitters having improved brightness and durability relying on the creation of a liquid Taylor cone from electrically conductive materials having high melting points. The method calls for melting the end of a wire substrate with a focused laser beam, while imposing a high positive potential on the material. The resulting molten Taylor cone is subsequently rapidly quenched by cessation of the laser power. Rapid quenching is facilitated in large part by radiative cooling, resulting in structures having characteristics closely matching that of the original liquid Taylor cone. Frozen Taylor cones thus obtained yield desirable tip end forms for field emission sources in electron beam applications. Regeneration of the frozen Taylor cones in-situ is readily accomplished by repeating the initial formation procedures. The high temperature liquid Taylor cones can also be employed as bright ion sources with chemical elements previously considered impractical to implement.

    Abstract translation: 一种制造具有改进的亮度和耐久性的场致发射体的方法依赖于由具有高熔点的导电材料形成液体泰勒锥体。 该方法要求用聚焦激光束熔化线基底的端部,同时在材料上施加高的正电位。 随后通过停止激光功率使得到的熔融泰勒锥体迅速淬火。 快速淬火在很大程度上通过辐射冷却促进,导致具有与原始液体泰勒锥相匹配的特征的结构。 由此获得的冷冻泰勒锥体在电子束应用中产生用于场发射源的期望的尖端形式。 通过重复最初的形成程序可以容易地实现冷冻泰勒锥原位再生。 高温液体泰勒锥也可以用作先前被认为不切实际实施的化学元素的明亮离子源。

    Method to produce a field-emitter array with controlled apex sharpness
    75.
    发明公开
    Method to produce a field-emitter array with controlled apex sharpness 审中-公开
    Verfahren zur Herstellung einer Feldsenderanordnung mit gesteuerterSpitzenschärfe

    公开(公告)号:EP2139019A1

    公开(公告)日:2009-12-30

    申请号:EP08011691.6

    申请日:2008-06-27

    CPC classification number: H01J9/025 H01J1/3044 H01J2201/30411 H01J2209/0223

    Abstract: A method of uniformly controlling the apex sharpness of field-emitter arrays fabricated by a molding technique are described. The method utilizes the repeated oxidation and etching of the mold substrate (101,102,104,105) consisting of single-crystal semiconductor mold wafers, where the mold holes (110,111,112,113) for individual emitters are fabricated by utilizing the crystal orientation dependence of the etching rate.

    Abstract translation: 描述了通过模制技术制造的均匀控制场致发射极阵列的顶尖锐度的方法。 该方法利用由单晶半导体模具晶片组成的模具基板(101,102,104,105)的重复氧化和蚀刻,其中通过利用蚀刻速率的晶体取向依赖性来制造各个发光体的模具孔(110,111,112,113)。

    Diamond electron source and its manufacturing method
    78.
    发明专利
    Diamond electron source and its manufacturing method 有权
    金刚石电子源及其制造方法

    公开(公告)号:JP2008210775A

    公开(公告)日:2008-09-11

    申请号:JP2007236851

    申请日:2007-09-12

    Abstract: PROBLEM TO BE SOLVED: To provide a diamond electron source and its manufacturing method wherein one sharp-pointed section as an electron emission point for use in an electron beam device such as an electron microscope is formed at one end of a columnar diamond single crystal having a size where resist coating is difficult in a microfabrication process. SOLUTION: One end of the columnar diamond single crystal 10 is polished to form a smooth flat surface 11, and a ceramic layer 12 is formed on the smooth flat surface 11. After a thin film layer 14 having a predetermined shape is deposited on the ceramic layer 12 by using a focused ion beam system, the ceramic layer 12 is patterned by etching using the thin film layer 14 as a mask. One sharp-pointed section is formed at the one end of the columnar diamond single crystal 10 by dry etching using the formed ceramic mask. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种金刚石电子源及其制造方法,其中在柱状金刚石的一端形成作为用于诸如电子显微镜的电子束装置中的电子发射点的尖锐部分 具有在微细加工过程中难以进行抗蚀剂涂层的尺寸的单晶。

    解决方案:抛光柱状金刚石单晶10的一端以形成光滑的平坦表面11,并且在光滑的平坦表面11上形成陶瓷层12.在沉积具有预定形状的薄膜层14之后 通过使用聚焦离子束系统在陶瓷层12上,通过使用薄膜层14作为掩模的蚀刻来对陶瓷层12进行图案化。 通过使用形成的陶瓷掩模的干蚀刻,在柱状金刚石单晶10的一端形成一个尖锐部分。 版权所有(C)2008,JPO&INPIT

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