公开(公告)号：WO2004079770A1

公开(公告)日：2004-09-16

申请号：PCT/EP2004/002140

申请日：2004-03-03

Applicant: ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  JASINSKI, Thomas

Inventor： JASINSKI, Thomas

IPC: H01J37/06

CPC classification number: H01J3/026 ,  H01J37/065 ,  H01J2237/022

Abstract: The invention provides a charged particle beam device, an emitter module for emitting charged particle beams and a method of operation thereof. Thereby, a charged particle beam emitter (15) emitting charged particles along an optical axis (1) is realized. On the same carrier body (32), a cleaning emitter (16) for emitting charged particles approximately along the optical axis (1) is realized. Thus, an improved cleaning can be provided.

Abstract translation: 本发明提供一种带电粒子束装置，用于发射带电粒子束的发射器模块及其操作方法。 由此，实现了沿光轴（1）发射带电粒子的带电粒子束发射器（15）。 在相同的载体（32）上，实现了用于沿着光轴（1）近似地发射带电粒子的清洁发射器（16）。 因此，可以提供改进的清洁。

公开(公告)号：WO2004055856A3

公开(公告)日：2004-08-12

申请号：PCT/EP0314140

申请日：2003-12-12

Applicant: INTEGRATED CIRCUIT TESTING ,  FROSIEN JUERGEN ,  ADAMEC PAVEL

Inventor： FROSIEN JUERGEN ,  ADAMEC PAVEL

IPC: H01J37/145 ,  H01J37/317

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177

Abstract: The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.

Abstract translation: 本发明提供了用于带电粒子多光束系统的光学系统。 该光学系统包括静电透镜组件和磁性透镜组件。 这些部件用于将多个带电粒子束聚焦在至少多个行进通过光学系统的带电粒子束中的每一个的单独开口中。

公开(公告)号：WO2022184387A2

公开(公告)日：2022-09-09

申请号：PCT/EP2022/052996

申请日：2022-02-08

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH

Inventor： COOK, Benjamin John ,  WÖLLERT, Bernd ,  WINKLER, Dieter

IPC: H01J37/147 ,  H01J2237/1504 ,  H01J2237/1516 ,  H01J2237/1518 ,  H01J2237/1532 ,  H01J2237/2811 ,  H01J37/12 ,  H01J37/1471 ,  H01J37/1477 ,  H01J37/153 ,  H01J37/28

Abstract: A method of influencing a charged particle beam (11) propagating along an optical axis (A) is described. The method includes: guiding the charged particle beam (11) through at least one opening (102) of a multipole device (100, 200) that comprises a first multipole (110, 210) with four or more first electrodes (111, 211) and a second multipole (120, 220) with four or more second electrodes (121, 221) arranged in the same sectional plane, the first electrodes and the second electrodes being arranged alternately around the at least one opening (102); and at least one of exciting the first multipole to provide a first field distribution for influencing the charged particle beam in a first manner, and exciting the second multipole to provide a second field distribution for influencing the charged particle beam in a second manner. Further, a multipole device (100, 200) with a first multipole (110, 210) and a second multipole (120, 220) provided on the same substrate as well as a charged particle beam apparatus (500) with a multipole device (100, 200) are provided.

公开(公告)号：WO2022175000A1

公开(公告)日：2022-08-25

申请号：PCT/EP2022/050900

申请日：2022-01-17

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH

Inventor： ADAMEC, Pavel

IPC: H01J37/09 ,  H01J37/18

Abstract: A charged particle beam apparatus (100) is described. The charged particle beam apparatus includes a first vacuum region (121) in which a charged particle beam emitter (105) for emitting a charged particle beam (102) along an optical axis (A) is arranged, a second vacuum region (122) downstream of the first vacuum region and separated from the first vacuum region by a first gas separation wall (132) with a first differential pumping aperture (131), wherein the first differential pumping aperture (131) is configured as a first beam limiting aperture for the charged particle beam (102); and a third vacuum region (123) downstream of the second vacuum region and separated from the second vacuum region by a second gas separation wall (134) with a second differential pumping aperture (133), wherein the second differential pumping aperture (133) is configured as a second beam limiting aperture for the charged particle beam (102). Further described are a scanning electron microscope and a method of operating a charged particle beam apparatus.

公开(公告)号：WO2005124816A1

公开(公告)日：2005-12-29

申请号：PCT/EP2005/006647

申请日：2005-06-20

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FROSIEN, Jürgen

Inventor： FROSIEN, Jürgen

IPC: H01J37/153

CPC classification number: H01J37/153 ,  H01J49/06 ,  H01J49/288 ,  H01J2237/057 ,  H01J2237/1534

Abstract: The present invention provides an aberration correction device (100). The aberration correction device comprises a Wien filter element (110), a quadrupole element (310) for compensating a focusing property of the Wien filter element (110), and at least one multipole element (410) for spherical aberration correction. The Wien filter element (110) and said quadrupole element (310) are adapted to generate, in combination, an astigmatic image. Furthermore, the at least one multipole element (410) is adapted to act essentially in a plane of sagittal or meridional focus of the astigmatic image. Thereby, chromatic aberration is reduced as well as spherical aberration can be corrected.

Abstract translation: 本发明提供一种像差校正装置（100）。 像差校正装置包括维恩滤波器元件（110），用于补偿维恩滤波器元件（110）的聚焦特性的四极元件（310）和用于球面像差校正的至少一个多极元件（410）。 维恩滤波器元件（110）和所述四极杆元件（310）适于组合地产生像散图像。 此外，至少一个多极元件（410）适于基本上在像散图像的矢状或子午焦点的平面中起作用。 从而，可以减小色差，并且可以校正球面像差。

公开(公告)号：WO2005122208A2

公开(公告)日：2005-12-22

申请号：PCT/EP2005/006247

申请日：2005-06-10

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  DEGENHARDT, Ralf ,  FEUERBAUM, Hans-Peter ,  HAMBACH, Dirk ,  KÖGLER, Walter ,  MUNACK, Harry ,  SALVESEN, Carlo

Inventor： DEGENHARDT, Ralf ,  FEUERBAUM, Hans-Peter ,  HAMBACH, Dirk ,  KÖGLER, Walter ,  MUNACK, Harry ,  SALVESEN, Carlo

IPC: H01J37/00

CPC classification number: H01J37/244 ,  G01R31/305 ,  H01J2237/24485 ,  H01J2237/24585

Abstract: The invention provides a charged particle beam device (100) to inspect or structure a specimen (102) with a primary charged particle beam (104) propagating along an optical axis (108); a beam tube element (130) having a tube voltage (VT); and a retarding field analyzer (1, 50) in the vicinity of the beam tube element (130) to detect secondary charged particles (2,105) generated by the primary charged particle beam (104) on the specimen (102). According to the invention, the retarding field analyzer (1, 50) thereby comprises an entrance grid electrode (10) at a second voltage (V2); at least one filter grid electrode (4) at a first voltage (V1); a charged particle detector (8) to detect the secondary charged particles (2,105); and at least one further electrode element (122, 122a, 122b, 152, 152a, 152b, 170, 170a, 170b) arranged between the entrance grid electrode (10) and the at least one filter grid electrode (4). The at least one further electrode element (122, 122a, 122b, 152, 152a, 152b, 170, 170a, 170b, 180) reduces the size of the stray fields regions (41) in the retarding electric field region (20) to improve the energy resolution of the retarding field analyzer (1, 50). The improvement of the energy resolution is significant, in particular when the beam tube element (130) is part of a high voltage beam tube.

Abstract translation: 本发明提供一种带电粒子束装置（100），用于利用沿着光轴（108）传播的初级带电粒子束（104）检查或构造样本（102）。 具有管电压（VT）的束管元件（130）; 以及在所述束管元件（130）附近的延迟场分析器（1,50），以检测由所述样本（102）上的所述初级带电粒子束（104）产生的二次带电粒子（2,105）。 根据本发明，延迟场分析器（1,50）由此包括处于第二电压（V2）的入口栅极（10）; 至少一个第一电压（V1）的滤波栅极（4）; 带电粒子检测器（8），用于检测二次带电粒子（2,105）; 以及布置在入射栅电极（10）和至少一个滤光栅格电极（4）之间的至少一个另外的电极元件（122,122a，122b，152,152a，152b，170,170a，170b）。 所述至少一个另外的电极元件（122,122a，122b，152,152a，152b，170,170a，170b，180）减小所述延迟电场区域（20）中的杂散场区域（41）的尺寸，以改善 延迟场分析仪（1,50）的能量分辨率。 能量分辨率的提高是显着的，特别是当束管元件（130）是高压束管的一部分时。

公开(公告)号：WO2005096343A1

公开(公告)日：2005-10-13

申请号：PCT/EP2005/001637

申请日：2005-02-17

Applicant: ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK mbH ,  FROSIEN, Jürgen

Inventor： FROSIEN, Jürgen

IPC: H01J37/09

CPC classification number: H01J37/09 ,  H01J2237/0453 ,  H01J2237/153

Abstract: The present invention relates to charged particle beam devices. The devices comprise an emitter (12) for emitting charged particles; an aperture arrangement (26; 86) with at least two apertures (36) for separating the emitted charged particles into at least two independent charged particle beams; and an objective lens (18) for focusing the at least two independent charged particle beams, whereby the independent charged particle beams are focused onto the same location within the focal plane.

Abstract translation: 本发明涉及带电粒子束装置。 这些装置包括用于发射带电粒子的发射器（12） 具有至少两个孔（36）的孔布置（26; 86），用于将发射的带电粒子分离成至少两个独立的带电粒子束; 以及用于聚焦至少两个独立带电粒子束的物镜（18），由此独立带电粒子束聚焦到焦平面内的相同位置。

公开(公告)号：WO2005043579A1

公开(公告)日：2005-05-12

申请号：PCT/EP2004/012502

申请日：2004-11-04

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FROSIEN, Juergen

Inventor： FROSIEN, Juergen

IPC: H01J37/02

CPC classification number: H01J9/18 ,  H01J37/02 ,  H01J37/10 ,  H01J2237/036

Abstract: The present invention relates to a beam optical component (1, 201) for acting on a charged particle beam (63) including a first element (3; 203) having a first opening (9; 209) for acting on the charged particle beam (63), at least a second element (5; 205) for acting on the charged particle beam (63); at least one distance piece (20a, 20b, 20c) positioned between the first element (3; 203) and the second element (5; 205) to define a minimum distance between the first element (3; 203) and the second element (5; 205); and a first holding piece (30a; 30b; 30c) for abutting the first element (3) to the at least one distance piece (20a, 20b, 20c), whereby the first holding piece (30a; 30b; 30c) is attached to the at least one distance piece (20a, 20b, 20c). First and second elements (3; 203; 5; 205) are preferably electrodes or pole pieces to act on the charged particle beam by an electrostatic or magnetic force. With the first holding piece (30a; 30b; 30c) attached to the at least one distance piece, distorting mechanical forces on the first and second elements (3, 5) are reduced which improves the performance of the respective beam optical components ( l ; 201).

Abstract translation: 本发明涉及一种用于作用在带电粒子束（63）上的束光学部件（1,201），其包括具有用于作用在带电粒子束上的第一开口（9; 209）的第一元件（3; 203） 至少一个用于作用在带电粒子束（63）上的第二元件（5; 205）; 位于第一元件（3; 203）和第二元件（5; 205）之间的至少一个距离件（20a，20b，20c），以限定第一元件（3; 203）和第二元件 5; 205）; 以及用于将所述第一元件（3）抵接到所述至少一个距离片（20a，20b，20c）的第一保持片（30a; 30b; 30c），由此所述第一保持片（30a; 30b; 30c） 所述至少一个距离件（20a，20b，20c）。 第一和第二元件（3; 203; 5; 205）优选地是通过静电或磁力作用在带电粒子束上的电极或极片。 在第一保持件（30a; 30b; 30c）附接到至少一个距离件上的情况下，使第一和第二元件（3,5）上的机械力变形减小，这改善了各个光束组件（1; 201）。

公开(公告)号：WO2005006385A2

公开(公告)日：2005-01-20

申请号：PCT/EP2004/005288

申请日：2004-05-17

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FEUERBAUM, Hans-Peter ,  FROSIEN, Juergen ,  HOFFMANN, Uli ,  WINKLER, Dieter ,  ADAMEC, Pavel

Inventor： FEUERBAUM, Hans-Peter ,  FROSIEN, Juergen ,  HOFFMANN, Uli ,  WINKLER, Dieter ,  ADAMEC, Pavel

IPC: H01J37/317

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/047 ,  H01J2237/0635

Abstract: The present invention provides a charged particle beam device. The device comprises an emitter array (22) for emitting a plurality of charged particle beams (8). The plurality of charged particle beams are imaged with a lens (12). An electrode unit (14) is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit (11) and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.

Abstract translation: 本发明提供一种带电粒子束装置。 该装置包括用于发射多个带电粒子束（8）的发射极阵列（22）。 多个带电粒子束用透镜（12）成像。 设置有用于加速多个带电粒子束的电极单元（14）。 第一控制单元（11）和第二控制单元控制发射极阵列的第一电位，电极单元的第二电位和试样的第三电位之间的电势差。 因此，第二电位能够相对于第一电位加速多个带电粒子束，并且第三电位能够使多个带电粒子束相对于第二电位减速。

公开(公告)号：WO2004086452A2

公开(公告)日：2004-10-07

申请号：PCT/EP2004/002841

申请日：2004-03-18

Applicant: ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FROSIEN, Juergen

Inventor： FROSIEN, Juergen

IPC: H01J37/147

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/28 ,  H01J37/3174

Abstract: The invention provides a charged particle beam device and a method of operation thereof. An emitter (2) emits a primary charged particle beam (12). Depending on the action of a deflection system, which comprises at least three deflection stages (14), it can be switched between at least two detection units (16, 44). Further, beam shaping means (15; 41) is provided and a lens for focusing at the primary charged particle beam on a specimen.

Abstract translation: 本发明提供了带电粒子束装置及其操作方法。 发射器（2）发射初级带电粒子束（12）。 根据包括至少三个偏转级（14）的偏转系统的动作，它可以在至少两个检测单元（16,44）之间切换。 此外，提供光束成形装置（15; 41）和用于在原始带电粒子束上聚焦在样本上的透镜。