Abstract:
A phase change memory cell with a heat blocking layer and a method for manufacturing the same are provided to significantly suppress transfer of heat in a selected phase change material pattern to a non-selected phase change material pattern. A phase change memory cell includes an interlayer dielectric(53), phase change material patterns(59a,59b), and heat blocking material patterns(57a,57b). The interlayer dielectric is formed on the semiconductor substrate. The phase change material patterns are formed in the interlayer dielectric. The heat blocking material patterns are formed between sidewalls of the phase change material patterns and the interlayer dielectric. The heat blocking material patterns have a lattice structure different from that of the phase change material patterns and the interlayer dielectric.
Abstract:
A method and apparatus for isolating a nucleic acid from cells or viruses by using carbon nanotubes and silica beads are provided to minimize the size of apparatus by performing cell destruction, nucleic acid extraction and nucleic acid amplification in one chamber, and reduce the time for separating nucleic acids. A method for isolating a nucleic acid from cells or viruses comprises the steps of: adding carbon nanotubes and silica beads having size of 50 nm to 1000 mum into solution containing cells or viruses; irradiating laser to the solution containing carbon nanotubes and silica beads to destroy the cells or viruses and bind nucleic acids discharged from the destroyed cells or viruses to the silica beads; and adding elution solution into the nucleic acid-bound silica beads to separate the nucleic acids. The method further comprises a step of amplifying the separated nucleic acids.
Abstract:
PURPOSE: A non-volatile memory device is provided to increase the stability of a data storage layer by forming a reaction preventive layer between the data story layer and electrodes. CONSTITUTION: At least one vertical electrode(20) is arranged to cross at least one horizontal electrode(10). At least one data storage layer(30) is interposed in the area where the vertical electrode and the horizontal electrode cross each other. The data storage layer stores changes in resistance. At least one reaction preventive layer(40) is interposed in the area where the vertical electrode and the horizontal electrode cross each other. The reaction preventive layer includes a first reaction preventive layer(40a) and a second reaction preventive layer(40b). The first reaction preventive layer is interposed between the horizontal electrode and the data storage layer. The second reaction preventive layer is interposed between the vertical electrode and the data storage layer.
Abstract:
본 발명에 따른 비휘발성 메모리 소자는, 수평 방향으로는 길이로 연장되고 수직 방향으로는 복수의 층들로 적층되어 있고 서로 평행하게 배치된 복수의 수평 전극들; 상기 수평 전극들과 교차되도록 배치되고 수직 방향으로는 길이로 연장되고 서로 평행하게 배치된 복수의 수직 전극들; 상기 수평 전극들 및 수직 전극들 사이에 형성되고 저항 변화를 저장할 수 있는 복수의 데이터 저장층들; 및 상기 수평 전극들 및 상기 수직 전극들의 교차 영역에 개재된 복수의 반응 방지층들을 포함한다. 비휘발성 메모리, 저항 변화, 반응 방지층, 실리사이드 반응
Abstract:
A resistive memory including nanoparticle and formation method of the same are provided to control location and density of the conductive pathway changing the resistance of the dielectric layer by controlling the size, location and density of conductive nano particles. The resistivity memory comprises the switching element and storage cell. The storage cell is the lower electrode(110). The dielectric layer(120) including a plurality of conductivity nano particles(122) is formed on the lower electrode, and stores the information according to the change of the resistive state. The upper electrode(130) is formed on the dielectric layer. A plurality of conductivity nano particles is formed in an interface between the upper electrode and the dielectric layer and between the lower electrode and dielectric layer. The dielectric layer comprises the transition metal oxide. A plurality of conductivity nano particles has the size of 10Š ~ 200Š.
Abstract:
A phase change layer having a different crystal lattice structure in a single layer is provided to prevent or reduce diffusion of titanium from a titanium-including adhesion layer formed on a phase change layer to the phase change layer by including a diffusion preventing layer in the phase change layer itself or between the phase change layer and its upper structure. A phase change material layer is made of a single layer divided into an upper layer(34b) and a lower layer(34a). The upper layer and the lower layer have different crystal lattices. The lower layer can be a chalcogenide material layer doped with impurities. The upper layer can be made of an undoped chalcogenide material layer.
Abstract:
A method of forming a ferroelectric thin film for suppressing the formation of a-domain and providing a sufficient layer coverage may be provided. The method includes immersing a substrate having the miscut surface into a reaction solution including a precursor compound for perovskite-type ferroelectric and water, and implementing a hydrothermal reaction in the reaction solution at a temperature lower than the phase transition temperature of the perovskite-type ferroelectric, thereby forming a perovskite-type ferroelectric thin film on the miscut surface of the substrate.
Abstract:
A phase-change memory device and a manufacturing method thereof are provided to improve a retention characteristic by using a phase-change material comprising Sb of 22.2 or more. A phase-change material is formed between a bottom electrode(110) and a top electrode(130). The phase-change material comprises Sb of 22,2 at.% or more in a phase diagram of a ternary system containing Ge, Sb and Te. The phase-change material comprises Ge of 16.6 to 22.2 at.%, Sb of 22.2 to 41.6 at.% and Te of 41.6 to 55.5 at.%. The phase-change material contains at least one selected from the group consisting of B, C, N and O.
Abstract:
A semiconductor electrode including phosphate is provided to restrain reverse reaction and easily transfer electrodes by forming a metal oxide layer having introduced phosphate on a conductive transparent electrode. A transparent electrode on which a conductive material is coated is formed on a substrate. A metal oxide layer including phosphate is formed on the transparent electrode. The phosphate can be a type of PO2 or PO3. The metal oxide layer can include a metal oxide, a binder solution composed of a solvent and a binder, and a paste composition including a compound containing a phosphate group.