Abstract:
본 발명은 조직공학용 지지체로 사용될 수 있는 그라핀 산화물/생분해성 고분자 나노섬유 복합체 및 이의 제조방법에 관한 것으로, 보다 구체적으로 손상된 조직이나 장기를 치료하기 위해 인체에 주입하여 세포를 배양할 수 있는 조직공학용 지지체로 사용될 수 있는 그라핀 산화물/생분해성 고분자 나노섬유 복합체 및 이의 제조방법에 관한 것이다. 본 발명은 세포의 부착력과 증식력, 생체적합성, 기계적 강도 등의 조직공학용 지지체로 사용되기에 적합한 물성을 갖는 그라핀 산화물/생분해성 고분자 나노섬유 복합체를 제공한다. 그라핀 산화물/생분해성 고분자 나노섬유 복합체, 그라핀, 생분해성 고분자, 조직공학용 지지체, 전기방사법
Abstract:
PURPOSE: An organic pyroelectric functional sensor integrated in a thin film transistor and a manufacturing method thereof are provided to secure high linearity and reliability by introducing a P(VDF-TrFE) layer in an OTFT(Organic Thin-Film Transistor) as a functional gate dielectric layer. CONSTITUTION: An Ni gate electrode(2) is deposited on a film(1) by electroplating. A dielectric layer(3) is formed by coating a P(VDF-TrFE) layer on the Ni gate electrode. A crystalline property is improved by re-crystallizing after dissolving a dielectric layer through annealing. A semiconductor layer(4) is deposited on the dielectric layer. A source and drain electrode(5,6) is deposited on the semiconductor layer.
Abstract:
PURPOSE: A transparent cell based sensor for real-time optical observation of cell capacity, a manufacturing method thereof and a multi-detection sensor chip using the same are provided to optically observe the movement of cell in real time and improve the reliability of detection by detecting signals generated from the transparent cell based sensor with an electro-chemical method. CONSTITUTION: A transparent cell based sensor for real-time optical observation of cell capacity comprises an ion selective field effect transistor type sensor(150,160) and an electro-chemical sensor(140) which are formed in parallel to each other on a transparent substrate. Each sensor comprises a transparent drain electrode, a source electrode, a transparent semiconductor layer, a transparent ion sensitivity insulator detection layer and a reference electrode.
Abstract:
A method of fabricating a gate electrode on an organic substrate using an electroplating process and a Method of fabricating an organic semiconductor device using the same are provided to improve flexibility and electrical property of an organic semiconductor device as a low temperature process by forming an insulating layer and a semiconductor layer as organic materials. A substrate(10) composed of a flexible organic material is provided. An adhesive layer(20) is formed on the substrate. A seed layer(30) for increasing electroplating capability of a gate electrode is formed at the one surface of the adhesive layer. A photoresist is formed on the seed layer. The photoresist is patterned by a mask(50) on which a pattern is formed in advance. A gate electrode is formed on the pattern by using the electroplating or the electroless plating process. The photoresist is removed. The adhesive layer and the seed layer in a region except for gate electrode are removed.
Abstract:
A method for etching a zinc oxide thin film using inductively coupled plasma is provided to improve productivity by processing selective etching for a zinc oxide thin film used as a transparent conductive electrode material based on the inductively coupled plasma. A method for etching a zinc oxide thin film using an inductively coupled plasma includes the steps of: preparing a substrate(28) on which a zinc oxide thin film or a metal-doped zinc oxide thin film is evaporated, and a photoresist for forming a pattern on the zinc oxide thin film is formed; installing the substrate on a side of a chamber which maintains a predetermined pressure; and providing a gas for forming a plasma in the chamber(10) by applying a first RF power to an inductive coil(24) installed on a position confronted with the substrate, and applying a second RF power to the substrate.
Abstract:
The present invention relates to a method of forming a three-dimensional graphene device by forming graphene on a three-dimensional microstructure a method of producing an electronic device, such as chemical/bio sensors by using the combination of a one-dimensional nanomaterial (nanowire and nanotube) and a zero-dimensional nanowire (nanoparticles and quantum dots). The three-dimensional microstructure is produced by a selective exposure technique of a light-sensitive polymer. The formation of the three-dimensional structure by the adsorption of a two-dimensional material including graphene is possible by the formation of an oxide film and the formation of a self-assembled monolayer. Further, the present invention includes a method of producing the zero-dimensional nanomaterial and the one-dimension nanomaterial on the three-dimensional graphene structure.