公开(公告)号：SG193240A1

公开(公告)日：2013-10-30

申请号：SG2013065149

申请日：2012-02-22

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS FELIX ,  BENSCHOP JOZEF ,  RENKENS MICHAEL ,  VAN BAARS GREGOR ,  DEKKERS JEROEN

Abstract: A radiation spot measurement system for a lithographic apparatus, the system having a target (40) onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target (42). The system further includes a radiation detector (41) to detect radiation from one of the spots, and a controller (46) to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.

公开(公告)号：NL2011772A

公开(公告)日：2014-01-13

申请号：NL2011772

申请日：2013-11-08

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BENSCHOP JOZEF ,  MOORS JOHANNES

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2004807A

公开(公告)日：2011-01-04

申请号：NL2004807

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  BENSCHOP JOZEF ,  KATE NICOLAAS ,  ROSET NIEK ,  KUSTERS GERARDUS ,  ZDRAVKOV ALEXANDER ,  PATEL HRISHIKESH ,  OPSTAL SANDER

IPC: G03F7/20

公开(公告)号：NL2008329A

公开(公告)日：2012-10-02

申请号：NL2008329

申请日：2012-02-22

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS FELIX ,  BENSCHOP JOZEF ,  RENKENS MICHAEL ,  BAARS GREGOR ,  DEKKERS JEROEN

IPC: G03F7/20

公开(公告)号：NL2006458A

公开(公告)日：2011-11-08

申请号：NL2006458

申请日：2011-03-23

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS ,  BENSCHOP JOZEF ,  PADIY ALEXANDRE VIKTOROVYCH ,  CHEN TAO

IPC: G03F7/20