公开(公告)号：NL2009979A

公开(公告)日：2013-07-15

申请号：NL2009979

申请日：2012-12-13

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  HOEKS MARTINUS

IPC: G03F7/20

公开(公告)号：NL2008500A

公开(公告)日：2012-10-23

申请号：NL2008500

申请日：2012-03-16

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  HOEKS MARTINUS ,  CADEE THEODORUS

IPC: G03F7/20

Abstract: A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.

公开(公告)号：NL2010242A

公开(公告)日：2013-10-01

申请号：NL2010242

申请日：2013-02-05

Applicant: ASML NETHERLANDS BV

Inventor： HOEKS MARTINUS ,  BLEEKER ARNO

IPC: G03F7/20

公开(公告)号：NL2009902A

公开(公告)日：2013-07-01

申请号：NL2009902

申请日：2012-11-29

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  BLEEKER ARNO ,  HENNUS PIETER ,  HOEKS MARTINUS ,  HOL SVEN ANTOIN JOHAN ,  SCHOOT HARMEN ,  SLAGHEKKE BERNARDUS ,  TINNEMANS PATRICIUS ,  WIJST MARC ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA ,  BEERENS RUUD ,  FISCHER OLOF ,  AANGENENT WOUTER ,  BOSCH NIELS JOHANNES MARIA

IPC: G03F7/20