公开(公告)号：NL2011762A

公开(公告)日：2014-01-13

申请号：NL2011762

申请日：2013-11-08

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  EURLINGS MARKUS ,  KREUWEL HERMANUS

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009352A

公开(公告)日：2013-03-25

申请号：NL2009352

申请日：2012-08-23

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  BANINE VADIM ,  YAKUNIN ANDREI ,  KREUWEL HERMANUS ,  MOORS JOHANNES ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  SWINKELS GERARDUS ,  STAMM UWE ,  VANDERHALLEN IVO

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009372A

公开(公告)日：2013-04-02

申请号：NL2009372

申请日：2012-08-28

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  GREEVENBROEK HENDRIKUS ,  IVANOV VLADIMIR ,  YAKUNIN ANDREI ,  KREUWEL HERMANUS

IPC: G03F7/20

Abstract: EUV exposure dose in a lithographic apparatus is controlled pulse to pulse by varying a conversion efficiency with which a pulse of EUV radiation is generated from an excitation of a fuel material by a corresponding pulse of excitation laser radiation. Conversion efficiency can be varied in several different ways, by varying the proportion of a fuel material that intersects a laser beam, and/or by varying a quality of the interaction. Mechanisms to vary the conversion efficiency can be based on variation of a laser pulse timing, variation of pre-pulse energy, and/or variable displacement of a main laser beam in one or more directions. Steps to maintain symmetry of the generated EUV radiation can be included.

公开(公告)号：NL2005691A

公开(公告)日：2011-01-06

申请号：NL2005691

申请日：2010-11-15

Applicant: ASML NETHERLANDS BV

Inventor： BUURMAN ERIK ,  ASTEN NICOLAAS ,  KREUWEL HERMANUS

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：SG11201407262VA

公开(公告)日：2014-12-30

申请号：SG11201407262V

申请日：2013-04-29

Applicant: ASML NETHERLANDS BV

Inventor： VAN SCHOOT JAN ,  KEMPEN ANTONIUS ,  KREUWEL HERMANUS ,  YAKUNIN ANDREI MIKHAILOVICH

IPC: H05G2/00

公开(公告)号：NL2008963A

公开(公告)日：2012-07-10

申请号：NL2008963

申请日：2012-06-08

Applicant: ASML NETHERLANDS BV

Inventor： KREUWEL HERMANUS

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2006644A

公开(公告)日：2011-06-09

申请号：NL2006644

申请日：2011-04-20

Applicant: ASML NETHERLANDS BV

Inventor： KLAASSEN MICHEL ,  KREUWEL HERMANUS

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2004429A

公开(公告)日：2011-02-28

申请号：NL2004429

申请日：2010-03-18

Applicant: ASML NETHERLANDS BV

Inventor： VRIES GOSSE ,  BUIS EDWIN ,  DAM MARINUS ,  SCHOOT JAN ,  BOON FIDELUS ,  KREUWEL HERMANUS

IPC: G03F7/20