公开(公告)号：JP2011159986A

公开(公告)日：2011-08-18

申请号：JP2011065516

申请日：2011-03-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  VAN DER DONCK JACQUES COR JOHAN ,  VAN DEN BOGAARD FREDERICK JOHANNES ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a method of removing contamination from an immersion hood and/or an immersion fluid in an immersion lithography device.
SOLUTION: A cleaning substrate CW1 having a rigid support layer and a deformable layer provided on the rigid support layer is loaded in the device, the deformable layer 2 of the cleaning substrate CW1 is brought into contact with a surface of the device from which the contamination is removed, and a relative movement between the deformable layer 2 and the surface of the device from which the contamination is removed is introduced to remove the contamination separated from an immersion hood surface.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在浸没式光刻装置中去除浸没罩和/或浸液的污染物的方法。 解决方案：具有刚性支撑层和设置在刚性支撑层上的可变形层的清洁基板CW1装载在该装置中，清洁基板CW1的可变形层2与装置的表面接触 污染物被去除，并且引入可变形层2和去除污染物的装置的表面之间的相对运动，以去除与浸没罩表面分离的污染物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009016838A

公开(公告)日：2009-01-22

申请号：JP2008173127

申请日：2008-07-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOO ,  VAN DER DONCK JACQUES COR JOHA ,  VAN DEN BOGAARD FREDERICK JOHA ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a method for removing contamination from a device used for lithography as an immersion liquid may be contaminated by resist separated from a substrate or the layer deposited on the substrate or particles or flakes of other materials and such contamination, and can make it difficult or impossible to correctly project a (patterned) beam of radiation on the substrate via the immersion liquid. SOLUTION: The method comprises mounting the substrate on a device, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the device from which the contamination is removed, and introducing a relative motion between the deformable layer and the surface of the device from which the contamination is removed, thereby separating the contamination from the surface for removal, taking and removing the separated contamination. Other embodiments are described and claimed. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种从用于平版印刷的装置中去除污染物的方法作为浸没液体可能被从基底或沉积在基底上的层或其它材料的颗粒或薄片等分离的抗蚀剂污染 污染，并且可能使得难以或不可能通过浸没液体将（图案化的）辐射束正确投影到基底上。 解决方案：该方法包括将衬底安装在器件上，衬底包括刚性支撑层和设置在刚性支撑层上的可变形层，使得衬底的可变形层与器件的表面接触， 污染被去除，并且在可变形层和去除污染物的装置的表面之间引入相对运动，从而将污染物与表面分离，以除去，取出和除去分离的污染物。 描述和要求保护其他实施例。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：SG148971A1

公开(公告)日：2009-01-29

申请号：SG2008048233

申请日：2008-06-25

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  VAN DER DONCK JACQUES COR JOHAN ,  VAN DEN BOGAARD FREDERIK JOHANNES ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

Abstract: Substrates and Methods of Using Those Substrates A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.

公开(公告)号：NL2013493A

公开(公告)日：2015-04-20

申请号：NL2013493

申请日：2014-09-18

Applicant: ASML NETHERLANDS BV

Inventor： BRULS RICHARD ,  ZHAO CHUANGXIN ,  BALTUSSEN SANDER ,  BROMAN PAR ,  CRAUS CRISTIAN ,  GROENEWOLD JAN ,  LABETSKI DZMITRY ,  NADIR KERIM ,  SCHIMMEL HENDRIKUS ,  WÃ HLISCH CHRISTIAN

IPC: G03F7/20 ,  H05G2/00