公开(公告)号：CA3149349A1

公开(公告)日：2021-03-04

申请号：CA3149349

申请日：2020-08-20

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  BALTUSSEN SANDER ,  BANINE VADIM YEVGENYEVICH ,  DOLGOV ALEXANDR ,  DONMEZ NOYAN INCI ,  HOUWELING ZOMER SILVESTER ,  NOTENBOOM ARNOUD WILLEM ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER ,  VLES DAVID FERDINAND ,  VORONINA VICTORIA ,  YEGEN HALIL GOKAY

IPC: G03F1/62 ,  C01B32/158 ,  D01F9/12 ,  D01F11/12 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.

公开(公告)号：CA3116145A1

公开(公告)日：2020-04-23

申请号：CA3116145

申请日：2019-10-02

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWOL PIETER-JAN ,  BALTUSSEN SANDER ,  DE GRAAF DENNIS ,  FRANKEN JOHANNES CHRISTIAAN LEONARDUS ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  KNAPEN PETER SIMON ANTONIUS ,  KURGANOVA EVGENIA ,  KUZNETSOV ALEXEY SERGEEVICH ,  NOTENBOOM ARNOUD WILLEM ,  VALEFI MAHDIAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER WOORD TIES WOUTER ,  WONDERGEM HENDRIKUS JAN ,  ZDRAVKOV ALEKSANDAR NIKOLOV

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.

公开(公告)号：NL2013493A

公开(公告)日：2015-04-20

申请号：NL2013493

申请日：2014-09-18

Applicant: ASML NETHERLANDS BV

Inventor： BRULS RICHARD ,  ZHAO CHUANGXIN ,  BALTUSSEN SANDER ,  BROMAN PAR ,  CRAUS CRISTIAN ,  GROENEWOLD JAN ,  LABETSKI DZMITRY ,  NADIR KERIM ,  SCHIMMEL HENDRIKUS ,  WÃ HLISCH CHRISTIAN

IPC: G03F7/20 ,  H05G2/00