公开(公告)号：KR20200130289A

公开(公告)日：2020-11-18

申请号：KR20207025911

申请日：2019-02-07

Applicant: ASML NETHERLANDS BV

Inventor： KURGANOVA EVGENIA ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLEIN ALEXANDER LUDWIG ,  NASALEVICH MAXIM ALEKSANDROVICH ,  NOTENBOOM ARNOUD WILLEM ,  PETER MARIA ,  VAN ZWOL PIETER JAN ,  VLES DAVID FERDINAND ,  VOLLEBREGT STEN ,  VOORTHUIJZEN WILLEM PIETER

IPC: B01J21/18 ,  B01J23/28 ,  B01J23/30 ,  B01J23/652 ,  B01J23/883 ,  B01J23/885 ,  B01J27/22 ,  B01J35/00 ,  B01J37/02 ,  G03F1/62 ,  G03F7/20

Abstract: 몰리브덴을포함하는제 1 층; 베이스층; 및중간층을포함하고, 중간층은베이스층과제 1 층사이에배치되는촉매가개시된다. 또한, 촉매를제조하는방법및 그래핀을합성하는방법, 본명세서에개시된촉매또는방법을사용하여생성되는펠리클, 및이러한펠리클을포함하는리소그래피장치가개시된다.

公开(公告)号：IL312810A

公开(公告)日：2024-07-01

申请号：IL31281024

申请日：2024-05-12

Applicant: ASML NETHERLANDS BV ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  VERMEULEN PAUL ALEXANDER

Inventor： HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  VERMEULEN PAUL ALEXANDER

Abstract: A method for forming a pellicle for use in a lithographic apparatus is disclosed. The method comprises: providing a porous membrane formed from a first material; applying at least one layer of two-dimensional material to at least one side of the porous membrane; and applying a capping layer to the at least one layer of two-dimensional material on at least one side of the porous membrane such that the at least one layer of two-dimensional material is disposed between the or each capping layer and the porous membrane. The at least one layer of two-dimensional material acts to close the adjacent side of the porous membrane and to form a smoother and flatter exterior surface of the pellicle. Advantageously, this allows the porous membrane to be protected from etching whilst reducing EUV flare, regardless of the material used for the capping layer.

公开(公告)号：CA3235933A1

公开(公告)日：2023-04-27

申请号：CA3235933

申请日：2022-10-07

Applicant: ASML NETHERLANDS BV

Inventor： DONMEZ NOYAN INCI ,  VAN DER WOORD TIES WOUTER ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  KLEIN ALEXANDER LUDWIG ,  HOUWELING ZOMER SILVESTER ,  VERMEULEN PAUL ALEXANDER ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA

IPC: G03F1/62

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：IL312111A

公开(公告)日：2024-06-01

申请号：IL31211124

申请日：2024-04-11

Applicant: ASML NETHERLANDS BV ,  BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA ,  DONMEZ NOYAN INCI ,  GIESBERS ADRIANUS JOHANNES MARIA ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER

Inventor： BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA ,  DONMEZ NOYAN INCI ,  GIESBERS ADRIANUS JOHANNES MARIA ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：CA3116145A1

公开(公告)日：2020-04-23

申请号：CA3116145

申请日：2019-10-02

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWOL PIETER-JAN ,  BALTUSSEN SANDER ,  DE GRAAF DENNIS ,  FRANKEN JOHANNES CHRISTIAAN LEONARDUS ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  KNAPEN PETER SIMON ANTONIUS ,  KURGANOVA EVGENIA ,  KUZNETSOV ALEXEY SERGEEVICH ,  NOTENBOOM ARNOUD WILLEM ,  VALEFI MAHDIAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER WOORD TIES WOUTER ,  WONDERGEM HENDRIKUS JAN ,  ZDRAVKOV ALEKSANDAR NIKOLOV

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.

公开(公告)号：CA3104593A1

公开(公告)日：2019-12-26

申请号：CA3104593

申请日：2019-05-29

Applicant: ASML NETHERLANDS BV

Inventor： NASALEVICH MAXIM ALEKSANDROVICH ,  KLEIN ALEXANDER LUDWIG ,  KURGANOVA EVGENIA ,  NOTENBOOM ARNOUD WILLEM ,  VAN ZWOL PIETER-JAN ,  VLES DAVID FERDINAND

IPC: G03F1/62 ,  G03F1/22 ,  G03F7/20

Abstract: A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also described is a method of preparing a pellicle comprising the steps of: (i) providing a pellicle core; (ii) providing a silicon carbide adhesion layer on the pellicle core; and (iii) providing a ruthenium capping layer in contact with the silicon carbide adhesion layer. Also provided is the use of silicon carbide as an adhesion layer in an EUV pellicle as well as an assembly.