公开(公告)号：CA3021916A1

公开(公告)日：2017-11-02

申请号：CA3021916

申请日：2017-04-12

Applicant: ASML NETHERLANDS BV

Inventor： NASALEVICH MAXIM ALEKSANDROVICH ,  ABEGG ERIK ACHILLES ,  BANERJEE NIRUPAM ,  BLAUW MICHIEL ALEXANDER ,  BROUNS DERK SERVATIUS GERTRUDA ,  JANSSEN PAUL ,  KRUIZINGA MATTHIAS ,  LENDERINK EGBERT ,  MAXIM NICOLAE ,  NIKIPELOV ANDREY ,  NOTENBOOM ARNOUD WILLEM ,  PILIEGO CLAUDIA ,  PETER MARIA ,  RISPENS GIJSBERT ,  SCHUH NADJA ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERBURG ANTONIUS WILLEM ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VLES DAVID ,  VOORTHUIJZEN WILLEM-PIETER ,  ZDRAVKOV ALEKSANDAR NIKOLOV

IPC: G03F1/24 ,  G03F1/62 ,  G03F7/20

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.