公开(公告)号：KR20180072786A

公开(公告)日：2018-06-29

申请号：KR20187014403

申请日：2016-10-11

Applicant: ASML NETHERLANDS BV

Inventor： PETER MARIA ,  ABEGG ERIK ACHILLES ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  NASALEVICH MAXIM ALEKSANDROVICH ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VLES DAVID FERDINAND ,  VOORTHUIJZEN WILLEM PIETER

IPC: G03F1/62 ,  G03F1/66 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70958 ,  G03F1/62 ,  G03F7/70983 ,  G21K2201/067

Abstract: 리소그래피장치를위한펠리클을제조하는방법들이개시된다. 일배치에서, 상기방법은기판의평탄한표면상에적어도하나의그래핀층을증착하는단계를포함한다. 상기기판은제1기판부및 제2기판부를포함한다. 상기방법은상기적어도하나의그래핀층으로부터프리스탠딩막을형성하기위해상기제1기판부를제거하는단계를더 포함한다. 상기프리스탠딩막은상기제2기판부에의해지지된다.

公开(公告)号：WO2017067813A3

公开(公告)日：2017-06-01

申请号：PCT/EP2016074280

申请日：2016-10-11

Applicant: ASML NETHERLANDS BV

Inventor： PÉTER MÁRIA ,  ABEGG ERIK ACHILLES ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  NASALEVICH MAXIM ALEKSANDROVICH ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VLES DAVID FERDINAND ,  VOORTHUIJZEN WILLEM-PIETER

IPC: G03F7/20 ,  B01D67/00 ,  G03F1/62 ,  G21K1/06

CPC classification number: G03F7/70958 ,  G03F1/62 ,  G03F7/70983 ,  G21K2201/067

Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.

Abstract translation: 公开了制造用于光刻设备的薄膜的方法。 在一种布置中，该方法包括在衬底（6）的平坦表面（4）上沉积至少一个石墨烯层（2）。 衬底包括第一衬底部分和第二衬底部分（12）。 该方法进一步包括移除第一衬底部分以从该至少一个石墨烯层形成独立膜（14）。 独立式膜由第二基底部分支撑。

公开(公告)号：CA3008477A1

公开(公告)日：2017-06-22

申请号：CA3008477

申请日：2016-12-02

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： VLES DAVID FERDINAND ,  ABEGG ERIK ACHILLES ,  BENDIKSEN AAGE ,  BROUNS DERK SERVATIUS GERTRUDA ,  GOVIL PRADEEP K ,  JANSSEN PAUL ,  NASALEVICH MAXIM ALEKSANDROVICH ,  NOTENBOOM ARNOUD WILLEM ,  PETER MARIA ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VOORTHUIJZEN WILLEM-PIETER ,  WILEY JAMES NORMAN

IPC: G03F1/62 ,  G03F1/22 ,  G03F7/20

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

公开(公告)号：CA3002702A1

公开(公告)日：2017-04-27

申请号：CA3002702

申请日：2016-10-11

Applicant: ASML NETHERLANDS BV

Inventor： PETER MARIA ,  ABEGG ERIK ACHILLES ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  NASALEVICH MAXIM ALEKSANDROVICH ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VLES DAVID FERDINAND ,  VOORTHUIJZEN WILLEM-PIETER

IPC: G03F7/20 ,  B01D67/00 ,  G03F1/62 ,  G21K1/06

Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.

公开(公告)号：CA3021916A1

公开(公告)日：2017-11-02

申请号：CA3021916

申请日：2017-04-12

Applicant: ASML NETHERLANDS BV

Inventor： NASALEVICH MAXIM ALEKSANDROVICH ,  ABEGG ERIK ACHILLES ,  BANERJEE NIRUPAM ,  BLAUW MICHIEL ALEXANDER ,  BROUNS DERK SERVATIUS GERTRUDA ,  JANSSEN PAUL ,  KRUIZINGA MATTHIAS ,  LENDERINK EGBERT ,  MAXIM NICOLAE ,  NIKIPELOV ANDREY ,  NOTENBOOM ARNOUD WILLEM ,  PILIEGO CLAUDIA ,  PETER MARIA ,  RISPENS GIJSBERT ,  SCHUH NADJA ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERBURG ANTONIUS WILLEM ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VLES DAVID ,  VOORTHUIJZEN WILLEM-PIETER ,  ZDRAVKOV ALEKSANDAR NIKOLOV

IPC: G03F1/24 ,  G03F1/62 ,  G03F7/20

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.