公开(公告)号：CA3149349A1

公开(公告)日：2021-03-04

申请号：CA3149349

申请日：2020-08-20

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  BALTUSSEN SANDER ,  BANINE VADIM YEVGENYEVICH ,  DOLGOV ALEXANDR ,  DONMEZ NOYAN INCI ,  HOUWELING ZOMER SILVESTER ,  NOTENBOOM ARNOUD WILLEM ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER ,  VLES DAVID FERDINAND ,  VORONINA VICTORIA ,  YEGEN HALIL GOKAY

IPC: G03F1/62 ,  C01B32/158 ,  D01F9/12 ,  D01F11/12 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.