公开(公告)号：IL312810A

公开(公告)日：2024-07-01

申请号：IL31281024

申请日：2024-05-12

Applicant: ASML NETHERLANDS BV ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  VERMEULEN PAUL ALEXANDER

Inventor： HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  VERMEULEN PAUL ALEXANDER

Abstract: A method for forming a pellicle for use in a lithographic apparatus is disclosed. The method comprises: providing a porous membrane formed from a first material; applying at least one layer of two-dimensional material to at least one side of the porous membrane; and applying a capping layer to the at least one layer of two-dimensional material on at least one side of the porous membrane such that the at least one layer of two-dimensional material is disposed between the or each capping layer and the porous membrane. The at least one layer of two-dimensional material acts to close the adjacent side of the porous membrane and to form a smoother and flatter exterior surface of the pellicle. Advantageously, this allows the porous membrane to be protected from etching whilst reducing EUV flare, regardless of the material used for the capping layer.

公开(公告)号：CA3235933A1

公开(公告)日：2023-04-27

申请号：CA3235933

申请日：2022-10-07

Applicant: ASML NETHERLANDS BV

Inventor： DONMEZ NOYAN INCI ,  VAN DER WOORD TIES WOUTER ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  KLEIN ALEXANDER LUDWIG ,  HOUWELING ZOMER SILVESTER ,  VERMEULEN PAUL ALEXANDER ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA

IPC: G03F1/62

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：IL312111A

公开(公告)日：2024-06-01

申请号：IL31211124

申请日：2024-04-11

Applicant: ASML NETHERLANDS BV ,  BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA ,  DONMEZ NOYAN INCI ,  GIESBERS ADRIANUS JOHANNES MARIA ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER

Inventor： BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA ,  DONMEZ NOYAN INCI ,  GIESBERS ADRIANUS JOHANNES MARIA ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：CA3149349A1

公开(公告)日：2021-03-04

申请号：CA3149349

申请日：2020-08-20

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  BALTUSSEN SANDER ,  BANINE VADIM YEVGENYEVICH ,  DOLGOV ALEXANDR ,  DONMEZ NOYAN INCI ,  HOUWELING ZOMER SILVESTER ,  NOTENBOOM ARNOUD WILLEM ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER ,  VLES DAVID FERDINAND ,  VORONINA VICTORIA ,  YEGEN HALIL GOKAY

IPC: G03F1/62 ,  C01B32/158 ,  D01F9/12 ,  D01F11/12 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.

公开(公告)号：IL312104A

公开(公告)日：2024-06-01

申请号：IL31210424

申请日：2024-04-11

Applicant: ASML NETHERLANDS BV ,  BAKKER TIES JAN WILLEM ,  DE VRIES GOSSE CHARLES ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ENGEL MICHAEL ,  HILDENBRAND VOLKER DIRK ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KURGANOVA EVGENIA ,  LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES ,  VAN DER HAM RONALD ,  VAN LIPZIG JEROEN PETERUS JOHANNES ,  VERMEULEN PAUL ALEXANDER ,  WOLF ABRAHAM JAN

Inventor： BAKKER TIES JAN WILLEM ,  DE VRIES GOSSE CHARLES ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ENGEL MICHAEL ,  HILDENBRAND VOLKER DIRK ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KURGANOVA EVGENIA ,  LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES ,  VAN DER HAM RONALD ,  VAN LIPZIG JEROEN PETERUS JOHANNES ,  VERMEULEN PAUL ALEXANDER ,  WOLF ABRAHAM JAN

Abstract: A lithographic apparatus comprises: an illumination system; a support structure; a substrate table; a projection system and a heating system. The illumination system is configured to condition a radiation beam. The support structure is constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system. The substrate table is constructed to support a substrate. The projection system is configured to receive the radiation beam from the reticle - pellicle assembly and to project it onto the substrate. The heating system is operable to heat a pellicle of the reticle - pellicle assembly supported by the support structure. A method for using a reticle - pellicle assembly comprises: illuminating the reticle - pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle - pellicle assembly using a separate heat source.

公开(公告)号：CA3210509A1

公开(公告)日：2022-09-09

申请号：CA3210509

申请日：2022-02-03

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN PAUL ALEXANDER ,  HOUWELING ZOMER SILVESTER

IPC: B01D71/02 ,  C01B32/158 ,  D01F9/127 ,  G03F1/62

Abstract: A carbon nanotube membrane comprising carbon nanotubes having a pre-selected bonding configuration or (m, n) chirality, characterised in that the carbon nanotube membrane comprises a substantial amount of carbon nanotubes having zigzag (m, 0) chirality and/or armchair (m, m) chirality. An apparatus for the treatment of a carbon-based membrane, a method for treating carbon based membranes, pellicles comprising carbon based membranes, lithographic apparatuses comprising carbon nanotube membranes, as well as the use of carbon nanotube membranes in lithographic apparatuses and methods are also described.