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公开(公告)号:US20140239175A1
公开(公告)日:2014-08-28
申请号:US13779142
申请日:2013-02-27
Applicant: FEI COMPANY
Inventor: Mostafa Maazouz
CPC classification number: H01J37/07 , H01J3/026 , H01J37/04 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/21 , H01J37/248 , H01J37/3056 , H01J37/3178 , H01J2237/0473 , H01J2237/04735 , H01J2237/04756 , H01J2237/1518 , H01J2237/1534 , H01J2237/28 , H01J2237/31749
Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.
Abstract translation: 本发明提供了一种带电粒子束系统,其中聚焦离子束列的中间部分被偏压到高的负电压,允许光束以比该塔的该部分内的最终光束能量更高的电位移动。 在低kV电位下,像差和库仑相互作用减小,这导致光斑尺寸的显着改善。
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公开(公告)号:US12237142B2
公开(公告)日:2025-02-25
申请号:US17807362
申请日:2022-06-16
Applicant: FEI Company
Inventor: Sean M. Kellogg , Mostafa Maazouz , James B. McGinn
IPC: H01J37/09 , H01J37/22 , H01J37/24 , H01J37/244
Abstract: Variations in charged-particle-beam (CPB) source location are determined by scanning an alignment aperture that is fixed with respect to a beam defining aperture in a CPB, particularly at edges of a defocused CPB illumination disk. The alignment aperture is operable to transmit a CPB portion to a secondary emission surface that produces secondary emission directed to a scintillator element. Scintillation light produced in response is directed out of a vacuum enclosure associated with the CPB via a light guide to an external photodetection system.
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公开(公告)号:US09679742B2
公开(公告)日:2017-06-13
申请号:US14981164
申请日:2015-12-28
Applicant: FEI Company
Inventor: Richard Swinford , Mostafa Maazouz , David William Tuggle , William M. Steinhardt
CPC classification number: H01J37/21 , H01J37/10 , H01J37/31 , H01J2237/0453 , H01J2237/30472 , H01J2237/317 , H01J2237/31745 , H01J2237/31749
Abstract: The present invention provides a method for optimizing a shaped working beam having a sharp edge for making sufficiently precise cuts and a high beam current for faster processing. An ion beam is directed along an optical column through a reference aperture to form a reference beam that has a preferred shape and an associated reference current. The reference beam is optimized using selected parameters of the optical components within the optical column. The ion beam is then directed through a working aperture to form a working beam for use in a processing application. The working beam has a different shape from the reference beam and an associated working current that is higher than the reference current. The reference aperture and working aperture have at least one corresponding dimension. The working beam is then optimized using the selected optical component parameters used to align and focus the reference beam.
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公开(公告)号:US09443692B2
公开(公告)日:2016-09-13
申请号:US14803964
申请日:2015-07-20
Applicant: FEI Company
Inventor: Mostafa Maazouz
IPC: H01J3/14 , H01J37/07 , H01J37/21 , H01J37/10 , H01J37/04 , H01J37/305 , H01J3/02 , H01J37/06 , H01J37/147 , H01J37/248
CPC classification number: H01J37/07 , H01J3/026 , H01J37/04 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/21 , H01J37/248 , H01J37/3056 , H01J37/3178 , H01J2237/0473 , H01J2237/04735 , H01J2237/04756 , H01J2237/1518 , H01J2237/1534 , H01J2237/28 , H01J2237/31749
Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.
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公开(公告)号:US20150083929A1
公开(公告)日:2015-03-26
申请号:US14565051
申请日:2014-12-09
Applicant: FEI Company
Inventor: Mostafa Maazouz
IPC: H01J37/147 , H01J37/248 , H01J37/06
CPC classification number: H01J37/07 , H01J3/026 , H01J37/04 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/21 , H01J37/248 , H01J37/3056 , H01J37/3178 , H01J2237/0473 , H01J2237/04735 , H01J2237/04756 , H01J2237/1518 , H01J2237/1534 , H01J2237/28 , H01J2237/31749
Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.
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公开(公告)号:US20250157780A1
公开(公告)日:2025-05-15
申请号:US19020049
申请日:2025-01-14
Applicant: FEI Company
Inventor: Sean M. Kellogg , Mostafa Maazouz , James B. McGinn
IPC: H01J37/09 , H01J37/22 , H01J37/244
Abstract: Variations in charged-particle-beam (CPB) source location are determined by scanning an alignment aperture that is fixed with respect to a beam defining aperture in a CPB, particularly at edges of a defocused CPB illumination disk. The alignment aperture is operable to transmit a CPB portion to a secondary emission surface that produces secondary emission directed to a scintillator element. Scintillation light produced in response is directed out of a vacuum enclosure associated with the CPB via a light guide to an external photodetection system.
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公开(公告)号:US20250157779A1
公开(公告)日:2025-05-15
申请号:US18506957
申请日:2023-11-10
Applicant: FEI Company
Inventor: Radovan Vašina , Bohuslav Sed'a , Mostafa Maazouz , Lukáš Král
IPC: H01J37/05 , H01J37/04 , H01J37/10 , H01J37/147
Abstract: Charged-particle beam (CPB) optical systems can include a beam acceptance aperture plate defining a first acceptance aperture and at least one second acceptance aperture, situated with respect to a CPB source so that a first CPB is transmitted by the first acceptance aperture and a second CPB is transmitted by a second acceptance aperture. A CPB lens is situated to receive the first and second CPBs from the beam acceptance aperture plate and direct the first and second CPBs towards a filter aperture plate to transmit selected spectral portion of the second CPB. The selected spectral component of the first CPB can be selectively directed to a workpiece by a beam steering deflector along the same axis. In some examples, the first and second CPBs have different beam currents and only one is directed to a workpiece.
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8.
公开(公告)号:US10923318B2
公开(公告)日:2021-02-16
申请号:US16228201
申请日:2018-12-20
Applicant: FEI Company
Inventor: Galen Gledhill , Mostafa Maazouz , Gavin Mitchson
IPC: H01J37/304 , H01J37/305 , G01T1/29 , G06N3/08 , G06N3/04
Abstract: A focused ion beam (FIB) is used to mill beam spots into a substrate at a variety of ion beam column settings to form a set of training images that are used to train a convolutional neural network. After the neural network is trained, an ion beam can be adjusted by obtaining spot image which is processed with the neural network. The neural network can provide a magnitude and direction of defocus, aperture position, lens adjustments, or other ion beam or ion beam column settings. In some cases, adjustments are not made by the neural network, but serve to indicate that the ion beam and associated ion column continue to operate stably, and additional adjustment is not required.
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公开(公告)号:US08933414B2
公开(公告)日:2015-01-13
申请号:US13779142
申请日:2013-02-27
Applicant: FEI Company
Inventor: Mostafa Maazouz
CPC classification number: H01J37/07 , H01J3/026 , H01J37/04 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/21 , H01J37/248 , H01J37/3056 , H01J37/3178 , H01J2237/0473 , H01J2237/04735 , H01J2237/04756 , H01J2237/1518 , H01J2237/1534 , H01J2237/28 , H01J2237/31749
Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.
Abstract translation: 本发明提供了一种带电粒子束系统,其中聚焦离子束列的中间部分被偏压到高的负电压,允许光束以比该塔的该部分内的最终光束能量更高的电位移动。 在低kV电位下,像差和库仑相互作用减小,这导致光斑尺寸的显着改善。
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公开(公告)号:US20230411109A1
公开(公告)日:2023-12-21
申请号:US17807362
申请日:2022-06-16
Applicant: FEI Company
Inventor: Sean M. Kellogg , Mostafa Maazouz , James B. McGinn
IPC: H01J37/09 , H01J37/244 , H01J37/22
CPC classification number: H01J37/09 , H01J37/244 , H01J37/226 , H01J2237/2443 , H01J2237/2445 , H01J2237/0458
Abstract: Variations in charged-particle-beam (CPB) source location are determined by scanning an alignment aperture that is fixed with respect to a beam defining aperture in a CPB, particularly at edges of a defocused CPB illumination disk. The alignment aperture is operable to transmit a CPB portion to a secondary emission surface that produces secondary emission directed to a scintillator element. Scintillation light produced in response is directed out of a vacuum enclosure associated with the CPB via a light guide to an external photodetection system.
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