SYSTEM AND METHOD FOR PREPARING A SEQUENCING DEVICE

    公开(公告)号:WO2020037284A1

    公开(公告)日:2020-02-20

    申请号:PCT/US2019/046941

    申请日:2019-08-16

    Abstract: The disclosure generally relates to systems, methods, and apparatuses for magnetic bead loading. An example embodiment of the disclosure relates to mixing magnetic beads with sequencing beads to form a solution. The solution containing both beads is injected onto a microchip having a plurality of microwells. The magnetic beads may have larger diameter than the microwell while the sequencing beads may have a smaller diameter, allowing them to enter and reside in the microwell. One or more magnets positioned under the microchip move back and forth across the microchip surface. The magnetic beads form a line and follow the movement of the magnets. During rounds of sweeping, the sequencing beads load into the respective wells. The magnets may be disengaged and the magnetic beads may be washed away after the sequencing beads are loaded.

    SURFACE TREATMENT OF SEMICONDUCTOR SENSORS
    3.
    发明申请
    SURFACE TREATMENT OF SEMICONDUCTOR SENSORS 审中-公开
    半导体传感器的表面处理

    公开(公告)号:WO2016004244A1

    公开(公告)日:2016-01-07

    申请号:PCT/US2015/038894

    申请日:2015-07-01

    CPC classification number: G01N27/414 G01N27/4145

    Abstract: A sensor component includes a sensor including a sensor surface and a reaction site in cooperation with the sensor and exposing the sensor surface. The reaction site including a reaction site surface. A surface agent is bound to the reaction site surface or the sensor surface. The surface agent includes a surface active functional group reactive with Bronsted base or Lewis acid functionality on the reaction site surface or the sensor surface and including distal functionality that does not have a donor electron pair.

    Abstract translation: 传感器部件包括传感器,传感器包括与传感器协作的传感器表面和反应部位,并暴露传感器表面。 反应位点包括反应位点表面。 表面剂与反应位点表面或传感器表面结合。 表面活性剂包括在反应位点表面或传感器表面上与布朗斯台德碱或路易斯酸官能团反应的表面活性官能团,并且包括不具有供体电子对的远端官能团。

    MATRIX ARRAYS AND METHODS FOR MAKING SAME
    5.
    发明申请
    MATRIX ARRAYS AND METHODS FOR MAKING SAME 审中-公开
    矩阵阵列及其制作方法

    公开(公告)号:WO2014151961A1

    公开(公告)日:2014-09-25

    申请号:PCT/US2014/026735

    申请日:2014-03-13

    CPC classification number: C12Q1/6837 C12Q1/6806 C12Q1/6834 C12Q2523/101

    Abstract: A method of forming a polymer matrix array includes applying an aqueous solution into wells of a well array. The aqueous solution includes polymer precursors. The method further includes applying an immiscible fluid over the well array to isolate the aqueous solution within the wells of the well array and polymerizing the polymer precursors isolated in the wells of the well array to form the polymer matrix array. An apparatus includes a sensor array, a well array corresponding to the sensor array, and an array of polymer matrices disposed in the well array.

    Abstract translation: 形成聚合物基质阵列的方法包括将水溶液施加到阱阵列的孔中。 该水溶液包括聚合物前体。 该方法还包括在井阵列上施加不混溶流体以将井阵列中的水溶液隔离并聚合在井阵列的孔中分离的聚合物前体以形成聚合物基质阵列。 一种装置包括传感器阵列,对应于传感器阵列的阱阵列,以及设置在阱阵列中的聚合物阵列阵列。

    DEEP MICROWELL DESIGNS AND METHODS OF MAKING THE SAME
    6.
    发明申请
    DEEP MICROWELL DESIGNS AND METHODS OF MAKING THE SAME 审中-公开
    DEEP MICROWELL设计及其制造方法

    公开(公告)号:WO2017035338A1

    公开(公告)日:2017-03-02

    申请号:PCT/US2016/048658

    申请日:2016-08-25

    CPC classification number: G01N27/4148 G01N27/4145 H01L29/42324

    Abstract: An apparatus includes a substrate, a gate structure disposed over the substrate and having an upper surface, a well structure disposed over the substrate and defining a well over the upper surface of the gate structure, a conductive layer disposed on the upper surface of the gate structure and at least partially extending along a wall of the well in the well structure, and a dielectric structure disposed over the well structure and defining an opening to the well.

    Abstract translation: 一种设备包括:衬底,设置在衬底上方并具有上表面的栅极结构,设置在衬底上并在栅极结构的上表面上限定阱的阱结构;设置在栅极的上表面上的导电层 结构,并且沿着井的结构中的井的壁至少部分地延伸,以及设置在井结构上并且限定到井的开口的电介质结构。

    MATRIX ARRAYS AND METHODS FOR MAKING SAME
    10.
    发明公开
    MATRIX ARRAYS AND METHODS FOR MAKING SAME 有权
    MATRIXARRAYS UND VERFAHREN ZUR HERSTELLUNG DAVON

    公开(公告)号:EP2971089A1

    公开(公告)日:2016-01-20

    申请号:EP14716714.2

    申请日:2014-03-13

    CPC classification number: C12Q1/6837 C12Q1/6806 C12Q1/6834 C12Q2523/101

    Abstract: A method of forming a polymer matrix array includes applying an aqueous solution into wells of a well array. The aqueous solution includes polymer precursors. The method further includes applying an immiscible fluid over the well array to isolate the aqueous solution within the wells of the well array and polymerizing the polymer precursors isolated in the wells of the well array to form the polymer matrix array. An apparatus includes a sensor array, a well array corresponding to the sensor array, and an array of polymer matrices disposed in the well array.

    Abstract translation: 形成聚合物基质阵列的方法包括将水溶液施加到阱阵列的孔中。 水溶液包括聚合物前体。 该方法还包括在井阵列上施加不混溶流体以将井阵列中的水溶液隔离并聚合在井阵列的孔中分离的聚合物前体以形成聚合物基质阵列。 一种装置包括传感器阵列,对应于传感器阵列的阱阵列和布置在阱阵列中的聚合物阵列阵列。

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