Abstract:
PROBLEM TO BE SOLVED: To provide a chip container or a chip carrying container capable of storing and carrying opto-electronic elements and a manufacturing method for the same, in particular a chip container capable of managing and carrying respective chips without substantially damaging and contaminating them, and a manufacturing method for the same. SOLUTION: The chip container 7 equipped with a number of cavities 8 for respective semiconductor chips 9 has a cavity plate 2 equipped with etched cavities 8. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide an especially compact semiconductor laser module. SOLUTION: The semiconductor laser module includes a module carrier with a fixing surface, a pumping device arranged on the fixing surface, a surface emission semiconductor laser arranged on the fixing surface, and a frequency converter arranged on the fixing surface, wherein the maximum fixing surface of the module carrier is 100 m 2 , the surface emission semiconductor laser includes a fixing block having an upper surface and a fixing surface, and at least one semiconductor laser chip arranged on the upper surface of the fixing block, the fixing surface of the fixing block extends substantially perpendicularly to the upper surface of the fixing block, and the surface emission semiconductor laser is fixed onto the fixing surface of the module carrier by the fixing surface of the module carrier. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To manufacture exceptionally compact semiconductor lasers in high-volume. SOLUTION: A method of manufacturing a plurality of semiconductor lasers 100 includes (a) a step of preparing a supporting wafer 30, (b) a step of forming a complex 70 by fixing a plurality of semiconductor laser chips 4 to the surface 31 of the supporting wafer 30, and (c) a step of forming a plurality of semiconductor lasers 100 by dividing the complex 70. The semiconductor laser 100 has a fixing block 3 and at least one semiconductor laser chip 4. The fixing block 3 has a fixing surface 13, and the fixing surface 13 is extended substantially perpendicularly to the surface 12 of the fixing block 3. The semiconductor laser chip 4 is arranged on the fixing block 3, and the fixing surface 13 is formed when the complex 70 is divided. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
A transparent material, especially a 6 inch glass wafer, is divided into strips (2) by sawing. Cut surfaces are smoothed. The strips are bonded to a substrate (4), e.g. a silicon wafer. The substrate and bonded strips are divided, in order to make the optical components required. Opposite planar surfaces of the glass are parallel; at least one of them has an anti-reflective coating. At least one has a reflective coating. The cut strips are arranged so that two or more cut surfaces are smoothed together, before bonding. The smoothed strips are bonded to the substrate by their smoothed, cut sides. The substrate is made of silicon. Anodic bonding, or alternatively low-temperature bonding, is used. Strips are fastened at right angles to the surface of the substrate, and are mutually-parallel. Spacers are used to align the strips on the substrate. These are removed before dividing the substrate with its bonded strips. The substrate and bonded strips are bodily-divided, to make carriers with optical elements, in such a manner that after division, only one optical element is present on each carrier. Alternatively, the division may leave numbers of optical elements (cut from their respective original strips) on a single carrier. This stage of division is also achieved by sawing.
Abstract:
Production of a lens made from a gallium phosphide (GaP) based semiconductor material comprises: (a) preparing a substrate made from a GaP-based semiconductor material; (b) applying a photolacquer on the substrate; structuring the layer and rounding into a lacquer lens by heating; and (c) etching the photolacquer and the substrate in a plasma etching process. Preferably the substrate is etched against the photolacquer layer with a selectivity of 0.5-4. The flow of process gases introduced during the plasma etching is adjusted so that the selectivity of the etching of the semiconductor layer/photolacquer remains constant. During plasma etching, Cl2 or SiCl4, a noble gas, a fluorine compound and a hydrogen compound are introduced.
Abstract:
The process gases comprise a chlorine-containing gas, noble gas, a fluorine compound and a hydrogen compound. The flow is so proportioned that the GaP based semiconductor layer is etched with a selectivity of 0.5-4, in relation to etching of the photolacquer layer. An Independent claim is included for the method photo lacquer application, by coating and structuring, before plasma etching under the conditions described.
Abstract:
The method involves preparing a supporting disk made of ceramic material, and producing wafer interconnections (40) by a set of semiconductor laser chips (4) on an upper surface of the supporting disk. The interconnections are isolated by a set of semiconductor lasers (100) that includes a mounting block (3) with a mounting surface, which runs perpendicular to an upper surface (12) of the mounting block. One of the chips is arranged on the upper surface of the mounting block, where the mounting surface is manufactured during the isolation of the interconnections. An independent claim is also included for a semiconductor laser comprising a mounting block.
Abstract:
The device has a substrate, a laser component whose radiation axis is essentially parallel to a first main plane, a deflector for deflecting the beam perpendicularly to a main surface, at least one signal detector for detecting laser radiation reflected from the data memory and an optical element joined to the substrate via a supporting element(s) for guiding the deflected beam to the data memory and the reflected beam to the signal detector(s). The device has a substrate (12) with a main surface, an edge emitting laser component (30) whose radiation axis is essentially parallel to the first main plane, a deflector (36) on the main substrate surface for deflecting the laser radiation (32) essentially perpendicularly to the main surface, at least one signal detector (20,22) for detecting the laser radiation reflected from the data memory and an optical element (40) for guiding the deflected beam to the data memory and the reflected beam to the signal detector(s). The optical element is joined to the substrate via at least one supporting element (36,38). AN Independent claim is also included for the following: (a) a method of manufacturing an inventive scanning head.
Abstract:
Die Erfindung betrifft ein Verfahren zum Herstellen einer Laserdiode, wobei mehrere Laserdioden auf einem Wafer hergestellt werden, wobei der Wafer in Waferstücke zerteilt wird, wobei jedes Waferstück mehrere Laserdioden nebeneinander aufweist, wobei ein Waferstück in eine erste Halterung eingelegt wird, wobei die erste Halterung ein erstes Abdeckelement aufweist, das über eine Vorderseite des Waferstücks hinausragt und einen unteren Bereich der Vorderseite des Waferstückes abschattet, wobei auf einen nicht abgeschatteten oberen Bereich der Vorderseite des Waferstückes eine Spiegelschicht abgeschieden wird, wobei das Waferstück in eine zweite Halterung eingelegt wird, wobei die zweite Halterung ein zweites Abdeckelement aufweist, wobei das zweite Abdeckelement die Spiegelschicht des oberen Bereiches der Vorderseite abschattet, wobei auf einen nicht abgeschatteten unteren Bereich der Vorderseite des Waferstückes eine elektrisch leitende Kontaktschicht abgeschieden wird, wobei das Waferstück anschließend in einzelne Laserdioden aufgeteilt wird. Zudem betrifft die Erfindung eine einfach herzustellende Laserdiode und Halterungen zur Durchführung des Verfahrens.
Abstract:
The device has a heating element provided for a frequency conversion crystal (7) and including an electric insulation support (1) that consists of a material, which possesses thermal conductivity of 3 watt/meter Kelvin or glass. An electric thermal resistor (2) is applied on an upper surface (5) of the support, and is provided between the support and the frequency conversion crystal. The support is provided with a recess at the upper surface, where the support has thickness of 200 micrometers and 400 micrometers at a region of the recess. An independent claim is also included for a method for producing a frequency conversion device.