公开(公告)号：US20240339287A1

公开(公告)日：2024-10-10

申请号：US18131271

申请日：2023-04-05

Applicant: Applied Materials, Inc.

Inventor： Alexandre Likhanskii ,  Nirbhav Singh Chopra ,  Peter F. Kurunczi ,  Anthony Renau ,  Joseph C. Olson ,  Frank Sinclair

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/05 ,  H01J37/1472 ,  H01J37/3171 ,  H01J37/12 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/1207 ,  H01J2237/2505

Abstract: An apparatus may include an electrodynamic mass analysis (EDMA) assembly disposed downstream from the convergent ion beam assembly. The EDMA assembly may include a first stage, comprising a first upper electrode, disposed above a beam axis, and a first lower electrode, disposed below the beam axis, opposite the first upper electrode. The EDMA assembly may also include a second stage, disposed downstream of the first stage and comprising a second upper electrode, disposed above the beam axis, and a second lower electrode, disposed below the beam axis. The EDMA assembly may further include a deflection assembly, disposed between the first stage and the second stage, the deflection assembly comprising a blocker, disposed along the beam axis, an upper deflection electrode, disposed on a first side of the blocker, and a lower deflection electrode, disposed on a second side of the blocker.

公开(公告)号：US12087541B2

公开(公告)日：2024-09-10

申请号：US17460381

申请日：2021-08-30

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/12 ,  H01J37/1472 ,  H01J37/1477 ,  H01J2237/04924 ,  H01J2237/083 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US12080510B2

公开(公告)日：2024-09-03

申请号：US18378421

申请日：2023-10-10

Applicant: mi2-factory GmbH

Inventor： Florian Krippendorf ,  Constantin Csato

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/05 ,  H01J37/1472 ,  H01J37/317 ,  H01J37/3171 ,  H01J37/3172 ,  H01J2237/002 ,  H01J2237/047 ,  H01J2237/057 ,  H01J2237/31705 ,  H01J2237/3171

Abstract: A method of monitoring compliance with filter specification during the implantation of ions into a substrate reading a signature of the filter and comparing the read signature with filter signatures stored in a database to identify properties of the filter including at least one of a maximum allowable temperature of the filter and a maximum allowable accumulated ion dose of the filter. The temperature and/or the accumulated ion dose of the filter is measured while ions are implanted into the substrate by an ion beam passing through the filter. The implantation is terminated when the measured temperature or accumulated ion dose of the filter reaches or exceeds the maximum allowable threshold.

公开(公告)号：US20240274396A1

公开(公告)日：2024-08-15

申请号：US18110284

申请日：2023-02-15

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： John Breuer ,  Dominik Patrick Ehberger ,  Kathrin Mohler ,  Ivo Liska

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/153 ,  H01J37/28

CPC classification number: H01J37/1472 ,  H01J37/09 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/24514

Abstract: A method of forming a multipole device (100) for influencing an electron beam (11) is provided. The method is carried out in an electron beam apparatus (200) that comprises an aperture body (110) having at least one aperture opening (112). The method comprises directing the electron beam (11) onto two or more surface portions of the aperture body (110) on two or more sides of the at least one aperture opening (112) to generate an electron beam-induced deposition pattern (120) configured to act as a multipole in a charged state, particularly configured to act as a quadrupole, a hexapole and/or an octupole. The electron beam-induced deposition pattern (120) can be an electron beam-induced carbon or carbonaceous pattern. Further provided are methods of influencing an electron beam in an electron beam apparatus, particularly with a multipole device as described herein. Further provided is a multipole device for influencing an electron beam in an electron beam apparatus in a predetermined manner.

公开(公告)号：US11961708B2

公开(公告)日：2024-04-16

申请号：US17236007

申请日：2021-04-21

Applicant: NuFlare Technology, Inc.

Inventor： Haruyuki Nomura ,  Noriaki Nakayamada

IPC: H01J37/00 ,  G03F7/00 ,  H01J37/12 ,  H01J37/147 ,  H01J37/153 ,  H01J37/302 ,  H01J37/317 ,  H01L21/027

CPC classification number: H01J37/3174 ,  G03F7/70008 ,  G03F7/70558 ,  H01J37/12 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/3026 ,  H01L21/0274 ,  H01J2237/20228 ,  H01J2237/31761

Abstract: Position shifts caused by charging phenomena can be corrected with high accuracy. A charged particle beam writing apparatus includes an exposure-amount distribution calculator calculating an exposure amount distribution of a charged particle beam using a pattern density distribution and a dose distribution, a fogging charged particle amount distribution calculator calculating a plurality of fogging charged particle amount distributions by convoluting each of a plurality of distribution functions for fogging charged particles with the exposure amount distribution, a charge-amount distribution calculator calculating a charge amount distribution due to direct charge using the pattern density distribution, the dose distribution, and the exposure amount distribution, and calculating a plurality of charge amount distributions due to fogging charge using the plurality of fogging charged particle amount distributions, a position shift amount calculator calculating a position shift amount of a writing position based on the charge amount distribution due to direct charge and the plurality of charge amount distributions due to fogging charge, a corrector correcting an exposure position using the position shift amount, and a writer exposing the corrected exposure position to a charged particle beam.

公开(公告)号：US20240112881A1

公开(公告)日：2024-04-04

申请号：US18196499

申请日：2023-05-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jonghyeok PARK ,  Kwangrak KIM ,  Jiwoong KIM ,  Hyenok PARK ,  Jeonghyeon WANG ,  Myungjun LEE ,  Yunje CHO ,  Junghee CHO ,  Yun HWANG

IPC: H01J37/28 ,  G01B11/22 ,  H01J37/20 ,  H01J37/304 ,  H01J37/305

CPC classification number: H01J37/28 ,  G01B11/22 ,  H01J37/20 ,  H01J37/304 ,  H01J37/305 ,  H01J37/1472 ,  H01J2237/24578

Abstract: A substrate analysis system includes a load-lock module configured to load or unload a substrate on which a pattern layer is formed; a milling module configured to form a milling surface from which at least a portion of the pattern layer is removed; a depth measuring module configured to measure a milling depth of an analysis region formed on the milling surface; an imaging module configured to capture a two-dimensional image of the analysis region; and a control module controlling the substrate to circulate through the milling module, the depth measuring module, and the imaging module, when the milling depth is shallower than a set target depth, wherein the milling module adjusts a path of the ion beam so that the ion beam moves horizontally in the milling region according to a scanning profile received based on an intensity map of the ion beam.

公开(公告)号：US11837431B2

公开(公告)日：2023-12-05

申请号：US16018008

申请日：2018-06-25

Applicant: Hermes Microvision, Inc.

Inventor： Shuai Li ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/145 ,  H01J37/28 ,  H01J37/141

CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/1477

Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

公开(公告)号：US20230324318A1

公开(公告)日：2023-10-12

申请号：US18327847

申请日：2023-06-01

Applicant: ASML Netherlands B.V.

Inventor： Yan REN ,  Erwin SLOT ,  Albertus Victor, Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Erwin Paul SMAKMAN

IPC: G01N23/2251 ,  H01J37/244 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147

CPC classification number: G01N23/2251 ,  H01J37/244 ,  H01J37/09 ,  H01J37/12 ,  H01J37/1472 ,  G01N2223/303 ,  H01J2237/2448 ,  H01J2237/0453 ,  H01J37/20

Abstract: A charged-particle tool configured to generate a plurality of sub-beams from a beam of charged particles and direct the sub-beams downbeam toward a sample position, the tool charged-particle tool comprising at least three charged-particle-optical components; a detector module; and a controller. Thea detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode. The charged-particle-optical components include: a charged-particle source configured to emit a beam of charged particles and a beam generator configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.

公开(公告)号：US20230170177A1

公开(公告)日：2023-06-01

申请号：US17922093

申请日：2021-04-27

Applicant: FRIEDRICH-ALEXANDER-UNIVERSITÄT ERLANGEN-NÜRNBERG

Inventor： Robert ZIMMERMANN ,  Michael SEIDLING ,  Peter HOMMELHOFF

IPC: H01J37/147 ,  H01J37/05

CPC classification number: H01J37/1472 ,  H01J37/05 ,  H01J2237/1516 ,  H01J2237/26 ,  H01J2237/057

Abstract: An electrode structure for guiding and, for example, for splitting a beam of charged particles, for example an electron beam, along a longitudinal path has multipole electrode arrangements that are spaced apart from one another along the longitudinal path and that have DC voltage electrodes. The electrode arrangements are configured to generate static multipole fields centered around the path in transverse planes oriented perpendicular to the longitudinal path, wherein the field strengths of the static multipole fields in the transverse planes each have a local minimum at the location of the path and increase as the distance from the location of the path increases. Field directions of the static multipole fields vary periodically with a period length along the path so that the particles propagating along the path are subjected to an inhomogeneous alternating electric field due to their intrinsic movement and experience a transverse return force towards the longitudinal path on average over time.

公开(公告)号：US20180254168A1

公开(公告)日：2018-09-06

申请号：US15448445

申请日：2017-03-02

Applicant: FEI Company

Inventor： Alexander Henstra ,  Peter Christiaan Tiemeijer

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/08

CPC classification number: H01J37/265 ,  H01J37/08 ,  H01J37/1472 ,  H01J37/153 ,  H01J2237/1534

Abstract: A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles; Passing said beam through an illuminator comprising: A source lens, with an associated particle-optical axis; A condenser aperture, which is disposed between the source lens and specimen and is configured to define a footprint of said beam upon the specimen; Irradiating the specimen with the beam emerging from said illuminator; Using a detector to detect radiation emanating from the specimen in response to said irradiation, and producing an associated image, specifically comprising the following steps: Choosing a set of emission angles from said source; For each emission angle in said set, selecting a corresponding sub-beam that emits from the source at that emission angle, and storing a test image formed by that sub-beam, thereby compiling a set of test images corresponding to said set of emission angles; Analyzing said set of test images to evaluate illuminator aberrations generated prior to said condenser aperture.