ELECTROSTATIC ABRASIVE PARTICLE COATING APPARATUS AND METHOD
    127.
    发明申请
    ELECTROSTATIC ABRASIVE PARTICLE COATING APPARATUS AND METHOD 审中-公开
    静电抛光颗粒涂料装置及方法

    公开(公告)号:US20150224629A1

    公开(公告)日:2015-08-13

    申请号:US14692229

    申请日:2015-04-21

    Abstract: A method of applying particles to a backing having a make layer on one of the backing's opposed major surfaces. The method including the steps of: supporting the particles on a feeding member having a feeding surface such that the particles settle into one or more layers on the feeding surface; the feeding surface and the backing being arranged in a non-parallel manner; and translating the particles from the feeding surface to the backing and attaching the particles to the make layer by an electrostatic force.

    Abstract translation: 将颗粒施加到在背衬的相对的主表面之一上具有成层的背衬的方法。 该方法包括以下步骤:将颗粒支撑在具有进料表面的进料构件上,使得颗粒沉积在进料表面上的一个或多个层中; 馈送表面和背衬以不平行的方式布置; 并将颗粒从进料表面平移到背衬,并通过静电力将颗粒附着到制备层上。

    FILM FORMING DEVICE AND FILM FORMING METHOD
    129.
    发明申请
    FILM FORMING DEVICE AND FILM FORMING METHOD 审中-公开
    薄膜成型装置和薄膜成型方法

    公开(公告)号:US20150174605A1

    公开(公告)日:2015-06-25

    申请号:US14638170

    申请日:2015-03-04

    Abstract: A film forming device includes: a microwave supplying unit configured to supply microwave pulses to generate plasma along a processing surface of a workpiece material; an applying unit configured to apply negative bias voltage pulses to spread a sheath layer along the processing surface of the workpiece material, and a control unit configured to control an applying timing of the negative bias voltage pulses and a supplying timing of the microwave pulses, wherein the control unit is configured to control the applying timing of the negative bias voltage pulses and the supplying timing of the microwave pulses so that a ratio of an applying time period of one negative bias voltage pulse in a supplying time period of one microwave pulse to the supplying time period of one microwave pulse is equal to or greater than 0.9.

    Abstract translation: 一种成膜装置,包括:微波供给单元,被配置为沿着工件材料的处理表面供给微波脉冲以产生等离子体; 施加单元,被配置为施加负偏压脉冲以沿着所述工件材料的处理表面扩展鞘层;以及控制单元,被配置为控制所述负偏置电压脉冲的施加定时和所述微波脉冲的供给定时,其中 控制单元被配置为控制负偏置电压脉冲的施加定时和微波脉冲的供给定时,使得在一个微波脉冲的供给时间段中的一个负偏置电压脉冲的施加时间的比率与 一个微波脉冲的供给时间段等于或大于0.9。

    ELECTROSTATIC APPLICATION APPARATUS AND METHOD FOR APPLYING LIQUID
    130.
    发明申请
    ELECTROSTATIC APPLICATION APPARATUS AND METHOD FOR APPLYING LIQUID 有权
    静电应用装置及应用液体的方法

    公开(公告)号:US20150125619A1

    公开(公告)日:2015-05-07

    申请号:US14401381

    申请日:2013-05-14

    Inventor: Tsutomu Ueno

    Abstract: An electrostatic application apparatus 100 comprises a tubular electrode 1 forming a first flow path F1 whose inner surface is formed of an electrically conductive wall; a counter electrode 20 placed to block an extension of an axis line of the first flow path F1; a power source 30 applying a voltage between the tubular electrode 1 and the counter electrode 20, and a liquid supply unit 40 supplying a liquid to the first flow path F1. If an axial length of the first flow path F1 is L1 and an inside diameter of the first flow path F1 is D1, then L1/D1 is 35 or more, the inside diameter D1 of the first flow path is 0.5 to 2.0 mm, and the length L1 of the first flow path is 20 to 100 mm.

    Abstract translation: 静电施加装置100包括形成第一流路F1的管状电极1,其内表面由导电壁形成; 放置成阻挡第一流路F1的轴线的延伸线的对置电极20; 在管状电极1和对电极20之间施加电压的电源30以及向第一流路F1供给液体的液体供给单元40。 如果第一流路F1的轴向长度为L1,第一流路F1的内径为D1,则L1 / D1为35以上,第一流路的内径D1为0.5〜2.0mm, 第一流路的长度L1为20〜100mm。

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