公开(公告)号：US09384936B2

公开(公告)日：2016-07-05

申请号：US14800098

申请日：2015-07-15

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Joe Wang ,  Shuai Li ,  Zhongwei Chen

IPC: G01T1/20 ,  H01J37/05 ,  H01J37/10 ,  H01J37/28 ,  H01J37/12 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/05 ,  H01J37/10 ,  H01J37/12 ,  H01J37/244 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/14

Abstract: This invention provides two methods for improving performance of an energy-discrimination detection device with an energy filter of reflective type for a charged particle beam. The first method employs a beam-adjusting means to improve the energy-discrimination power, and the second method uses an electron-multiplication means to enhance the image signal without noise raise. A LVSEM with such an improved energy-discrimination detection device can provide variant high-contrast images of interested features on a specimen surface for multiple application purposes.

Abstract translation: 本发明提供了两种用于利用带电粒子束的反射型能量滤波器来改善能量鉴别检测装置的性能的方法。 第一种方法采用光束调节装置来提高能量鉴别能力，而第二种方法使用电子倍增装置来增强图像信号而没有噪声提高。 具有这种改进的能量鉴别检测装置的LVSEM可以在样本表面上提供用于多种应用目的的感兴趣特征的变体高对比度图像。

公开(公告)号：US20160172156A1

公开(公告)日：2016-06-16

申请号：US15052650

申请日：2016-02-24

Applicant: FEI Company

Inventor： Brian Roberts Routh, JR.

IPC: H01J37/285 ,  H01J37/305 ,  H01J37/147 ,  H01J37/10 ,  H01J37/077 ,  H01J37/08

CPC classification number: H01J37/285 ,  G01T1/28 ,  H01J27/16 ,  H01J37/05 ,  H01J37/077 ,  H01J37/08 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/265 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3056 ,  H01J2237/0817 ,  H01J2237/24415 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/31749

Abstract: A single column charged particle source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the source to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.

Abstract translation: 具有用户可选择配置的单列带电粒子源以离子模式进行FIB操作或SEM操作的电子模式。 配备了X射线检测器，可进行能量色散X射线光谱分析。 用户可以选择性地配置源以在离子模式或FIB模式下准备样品，然后基本上翻转开关选择电子模式或SEM模式，并使用EDS或其他类型的分析来分析样品。

公开(公告)号：US09362087B2

公开(公告)日：2016-06-07

申请号：US14560845

申请日：2014-12-04

Applicant: Hermes Microvision Inc.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/10 ,  H01J37/14 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/02 ,  H01J37/285 ,  H01J37/29

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/10 ,  H01J37/14 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/261 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/04926 ,  H01J2237/1405 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.

公开(公告)号：US09336980B2

公开(公告)日：2016-05-10

申请号：US14663971

申请日：2015-03-20

Applicant: NuFlare Technology, Inc.

Inventor： Haruyuki Nomura

IPC: H01J37/10 ,  H01J37/147 ,  H01J37/04

CPC classification number: H01J37/1471 ,  H01J37/045 ,  H01J37/10 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/06375 ,  H01J2237/1502

Abstract: An electron beam writing apparatus includes an electron gun system to emit an electron beam, a height adjustment unit, arranged at the downstream side compared to the electron gun system with respect to the optical axis direction, to variably adjust a height position of the electron gun system, an electron lens, arranged at the downstream side compared to the height adjustment unit with respect to the optical axis direction, to converge the electron beam, a lens control unit to control, for each variably adjusted and changed height position of the electron gun system, the electron lens such that the electron beam forms a crossover at a predetermined position, and an objective lens, arranged at the downstream side compared to the electron lens with respect to the optical axis direction, to focus the electron beam having passed the electron lens.

Abstract translation: 电子束写入装置包括与电子枪系统相对于光轴方向布置在下游侧的发射电子束的电子枪系统，高度调节单元，以可变地调节电子枪的高度位置 系统，电子透镜，相对于光轴方向布置在与高度调节单元相比的下游侧，以使电子束会聚;透镜控制单元，用于控制电子枪的每个可变调节和改变的高度位置 系统，使电子束在预定位置形成交叉的电子透镜，以及与电子透镜相对于光轴方向配置在下游侧的物镜，以聚焦通过电子的电子束 镜片。

公开(公告)号：US20160049278A1

公开(公告)日：2016-02-18

申请号：US14483740

申请日：2014-09-11

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Shih-Chi Wang ,  Tsung-Chih Chien ,  Hui-Min Huang ,  Jaw-Jung Shin ,  Shy-Jay Lin ,  Burn Jeng Lin

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/10

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/10 ,  H01J37/12 ,  H01J37/20 ,  H01J2237/0435 ,  H01J2237/1205

Abstract: An apparatus for use in a charged particle multi-beam lithography system is disclosed. The apparatus includes a plurality of charged particle doublets each having a first aperture and each configured to demagnify a beamlet incident upon the first aperture thereby producing a demagnified beamlet. The apparatus further includes a plurality of charged particle lenses each associated with one of the charged particle doublets, each having a second aperture, and each configured to receive the demagnified beamlet from the associated charged particle doublet and to realize one of two states: a switched-on state, wherein the demagnified beamlet is allowed to travel along a desired path, and a switched-off state, wherein the demagnified beamlet is prevented from traveling along the desired path. In embodiments, the first aperture is greater than the second aperture, thereby improving particle beam efficiency in the charged particle multi-beam lithography system.

Abstract translation: 公开了一种用于带电粒子多光束光刻系统的装置。 该装置包括多个带电荷的微粒双峰，每个具有第一孔，并且每个被配置成使入射在第一孔上的子束缩小，从而产生缩小的子束。 该装置还包括多个带电粒子透镜，每个与带电粒子双重体中的一个相关联，每个具有第二孔径，并且每个被配置成从相关联的带电粒子双重体接收已缩小的子束并实现两种状态之一： 在状态下，其中允许缩小的子束沿着期望的路径行进，并且关闭状态，其中防止了缩小的子束沿所需的路径行进。 在实施例中，第一孔径大于第二孔径，从而提高带电粒子多光束光刻系统中的粒子束效率。

公开(公告)号：US20150364296A1

公开(公告)日：2015-12-17

申请号：US14761963

申请日：2014-01-10

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsunenori NOMAGUCHI ,  Toshihide AGEMURA

IPC: H01J37/28 ,  G01T1/20 ,  H01J37/147 ,  H01J37/244 ,  H01J37/10 ,  H01J37/30

CPC classification number: H01J37/28 ,  G01T1/20 ,  H01J37/10 ,  H01J37/147 ,  H01J37/22 ,  H01J37/24 ,  H01J37/244 ,  H01J37/30 ,  H01J37/3178

Abstract: The present invention relates to modulating an irradiation condition of a charged particle beam at high speed and detecting a signal in synchronization with a modulation period for the purpose of extracting a signal arising from a certain charged particle beam when a sample is irradiated with a plurality of charged particle beams simultaneously or, for example, for the purpose of separating a secondary electron signal arising from ion beam irradiation and a secondary electron signal arising from electron beam irradiation in an FIB-SEM system. The present invention further relates to dispersing light emitted from two or more kinds of scintillators having different light emitting properties, detecting each signal strength, and processing a signal on the basis of a ratio of first signal strength when the sample is irradiated with a first charged particle beam alone to second signal strength when the sample is irradiated with a second charged particle beam alone, the ratio being set by a mechanism. The present invention enables extraction of only a signal arising from a desired charged particle beam even when the sample is irradiated with the plurality of charged particle beams simultaneously. The SEM observation can be performed in the middle of the FIB processing using the secondary electron in the FIB-SEM system, for example.

Abstract translation: 本发明涉及以高速度调制带电粒子束的照射条件，并且与调制周期同步地检测信号，以便在样品被多个照射时提取由某个带电粒子束产生的信号 或者例如为了分离由离子束照射产生的二次电子信号和在FIB-SEM系统中从电子束照射引起的二次电子信号。 本发明还涉及分散具有不同发光特性的两种或更多种闪烁体发射的光，检测每种信号强度，并且基于当样品被照射第一个带电量时的第一信号强度的比例来处理信号 当单独用第二带电粒子束照射样品时，粒子束单独到第二信号强度，该比例由机构设定。 即使当同时对多个带电粒子束照射样品时，本发明仅能够提取由期望的带电粒子束产生的信号。 例如，可以使用FIB-SEM系统中的二次电子在FIB处理的中间进行SEM观察。

公开(公告)号：US09153413B2

公开(公告)日：2015-10-06

申请号：US12528307

申请日：2008-02-22

Applicant: Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

Inventor： Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

IPC: G21K7/00 ,  H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

Abstract: A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

Abstract translation: 描述了多光束扫描电子束装置（100）。 具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130） 用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标 透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号 光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

公开(公告)号：US20150228455A1

公开(公告)日：2015-08-13

申请号：US14607559

申请日：2015-01-28

Applicant: NuFlare Technology, Inc.

Inventor： Tomoo MOTOSUGI ,  Takayuki OHNISHI ,  Kaoru TSURUTA ,  Kenji OHTOSHI

IPC: H01J37/317 ,  H01J37/10 ,  H01J37/20 ,  H01J37/302 ,  H01J37/21

CPC classification number: H01J37/3174 ,  H01J37/10 ,  H01J37/20 ,  H01J37/21 ,  H01J37/3026 ,  H01J2237/006 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/103 ,  H01J2237/2007

Abstract: A charged particle beam writing apparatus includes an emission unit to emit a charged particle beam, a stage to mount thereon a target object to be written, an objective lens to focus the charged particle beam on a surface of the target object, a chamber to house the stage, a measurement unit to measure a partial pressure of a predetermined gas in the chamber in a state where a pressure inside the chamber is controlled to be lower than an atmospheric pressure, and an adjustment unit to adjust a focus position for focusing the charged particle beam on the target object, based on the partial pressure of the predetermined gas.

Abstract translation: 带电粒子束写入装置包括发射带电粒子束的发射单元，其上安装待写入的目标物体的载物台，将带电粒子束聚焦在目标物体的表面上的物镜， 该阶段是在室内的压力被控制为低于大气压力的状态下测量室内的预定气体的分压的测量单元，以及调节单元，用于调整聚焦位置以聚焦带电 基于预定气体的分压，靶物体上的粒子束。

公开(公告)号：US20150226648A1

公开(公告)日：2015-08-13

申请号：US14305323

申请日：2014-06-16

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Sinichi FURUKAWA

IPC: G01N1/28 ,  G01N1/44 ,  H01J37/10 ,  H01J37/30 ,  H01J37/08

CPC classification number: H01J37/10 ,  H01J37/1471 ,  H01J37/20 ,  H01J37/3045 ,  H01J2237/0245 ,  H01J2237/151 ,  H01J2237/2482 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: In one embodiment, a sample processing apparatus includes a sample stage including electrodes on which a sample is to be placed, and a polarity setting module to set polarity of each electrode to first or second polarity. The apparatus further includes a beam generator to irradiate, with a beam, a portion of the sample placed on an electrode with the second polarity. The apparatus further includes a leading edge recognition module to recognize a leading edge of the sample, and a measuring module to measure a positional displacement between the leading edge and the electrode with the second polarity. The apparatus further includes a position changing module to change a relative position between the sample and the beam generator, based on the positional displacement measured by the measuring module, and a polarity changing module to change polarity of an electrode under the leading edge to the second polarity.

Abstract translation: 在一个实施例中，样本处理装置包括：样本台，其包括待放置样本的电极;极性设定模块，用于将每个电极的极性设定为第一或第二极性。 该装置还包括一个光束发生器，用光束照射放置在具有第二极性的电极上的样品的一部分。 该装置还包括用于识别样品前缘的前缘识别模块，以及测量模块，用于测量前缘和电极之间具有第二极性的位置位移。 该装置还包括基于由测量模块测量的位置位移来改变样品和光束发生器之间的相对位置的位置改变模块以及改变前缘处的电极极性的极性改变模块， 极性。

公开(公告)号：US20150144785A1

公开(公告)日：2015-05-28

申请号：US14532805

申请日：2014-11-04

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/153

CPC classification number: H01J37/1472 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/153 ,  H01J2237/10 ,  H01J2237/1508 ,  H01J2237/1516 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/2602 ,  H01J2237/28

Abstract: An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.

Abstract translation: 用于检查目标衬底或样本的电子束装置包括具有不对称四极静电偏转器的光束分离器，用于改善单个偏转方向的场均匀性。 不对称四极静电偏转器包括跨越大约60度的两个正交电极板和跨越大约120度的两个电极板，后两个板限定单向偏转场。 器件产生一次电子束，并将一次电子束沿光轴聚焦到目标衬底中。 在目标衬底处检测到的二次电子被聚焦成二次电子束。 具有不对称四极静电偏转器的光束分离器使二次电子束在偏转方向上偏离一次电子束的轴线并且进入检测器阵列。