公开(公告)号：US11837430B2

公开(公告)日：2023-12-05

申请号：US17491963

申请日：2021-10-01

Applicant: mi2-factory GmbH

Inventor： Florian Krippendorf ,  Constantin Csato

IPC: H01J37/05 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/05 ,  H01J37/1472 ,  H01J37/317 ,  H01J37/3171 ,  H01J37/3172 ,  H01J2237/002 ,  H01J2237/047 ,  H01J2237/057 ,  H01J2237/3171 ,  H01J2237/31705

Abstract: A method of doping a wafer includes implanting ions into a wafer by irradiating the wafer with an ion beam using an implantation device. The implantation device includes a filter frame and a filter held by the filter frame, wherein the filter is irradiated by the ion beam passing through the filter to the wafer, and the filter is arranged such that protruding microstructures of the filter face away from the wafer and towards the ion beam.

公开(公告)号：US11810755B2

公开(公告)日：2023-11-07

申请号：US16717211

申请日：2019-12-17

Applicant: Applied Materials, Inc.

Inventor： Ludovic Godet ,  Joseph C. Olson ,  Rutger Meyer Timmerman Thijssen

IPC: H01J37/305 ,  H01J37/32 ,  G02B6/13 ,  H01L21/3065 ,  G02B5/18 ,  H01J37/05 ,  G02B6/12 ,  G02B6/124 ,  G06T19/00 ,  H01J37/073 ,  H01J37/304 ,  H01J37/147

CPC classification number: H01J37/3053 ,  G02B5/1857 ,  G02B6/13 ,  H01J37/32422 ,  H01L21/3065 ,  G02B6/124 ,  G02B6/12007 ,  G02B2006/12176 ,  G06T19/006 ,  H01J37/05 ,  H01J37/073 ,  H01J37/1472 ,  H01J37/3045 ,  H01J37/32449 ,  H01J2237/303 ,  H01J2237/334

Abstract: Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.

公开(公告)号：US20230326703A1

公开(公告)日：2023-10-12

申请号：US17715690

申请日：2022-04-07

Applicant: Applied Materials, Inc.

Inventor： Graham Wright ,  Ryan C. Prager

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/05 ,  C23C14/48

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J37/05 ,  C23C14/48 ,  H01J2237/0815

Abstract: An ion source is provided. The ion source may include an ion chamber to generate an ion beam comprising a metal ion species; and a charge source, coupled to deliver a metal vapor to the ion chamber, the charge source including a charge mixture. The charge mixture may include a first portion, comprising an elemental metal; and a second portion, comprising a heterogeneous metal fluoride compound.

公开(公告)号：US20180345242A1

公开(公告)日：2018-12-06

申请号：US16054243

申请日：2018-08-03

Applicant: Xyleco, Inc.

Inventor： Marshall Medoff

IPC: B01J19/08 ,  H01J37/05 ,  B01J19/10 ,  B01J19/12 ,  C10L1/02 ,  C10L9/00 ,  C12P3/00 ,  C12P7/02 ,  H01J37/04 ,  C10L5/44

CPC classification number: B01J19/081 ,  B01J19/085 ,  B01J19/10 ,  B01J19/12 ,  B01J2219/0879 ,  B01J2219/12 ,  C10L1/02 ,  C10L5/44 ,  C10L9/00 ,  C10L2200/0469 ,  C10L2290/26 ,  C10L2290/36 ,  C12P3/00 ,  C12P7/02 ,  H01J37/04 ,  H01J37/05 ,  Y02E50/30

Abstract: Materials such as biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) and hydrocarbon-containing materials are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, or oil sands, oil shale, tar sands, bitumen, and coal to produce altered materials such as fuels (e.g., ethanol and/or butanol). The processing includes exposing the materials to an ion beam.

公开(公告)号：US20180301315A1

公开(公告)日：2018-10-18

申请号：US15952989

申请日：2018-04-13

Applicant: JEOL Ltd.

Inventor： Masaki Mukai

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/21 ,  H01J37/05 ,  H01J37/14 ,  H01J37/12

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/12 ,  H01J37/14 ,  H01J37/21 ,  H01J37/22 ,  H01J2237/057 ,  H01J2237/1532 ,  H01J2237/24578 ,  H01J2237/24585

Abstract: An electron microscope includes a monochromator, an image acquiring portion for obtaining an electron microscope image containing interference fringes of the electron beam formed by an aperture located behind the monochromator, a line profile acquiring portion for obtaining a plurality of line profiles passing through the center of the aperture on the EM image, an energy dispersion direction identifying portion for identifying the direction of energy dispersion of the monochromator on the basis of the line profiles obtained by the line profile acquiring portion, and an optics controller for controlling an optical system on the basis of a line profile in the direction of energy dispersion to bring the focal plane for the electron beam exiting from the monochromator into coincidence with the achromatic plane.

公开(公告)号：US10037877B1

公开(公告)日：2018-07-31

申请号：US15637538

申请日：2017-06-29

Applicant: Axcelis Technologies, Inc.

Inventor： Bo H. Vanderberg ,  Edward C. Eisner

IPC: A61N5/00 ,  H01J49/20 ,  H01J49/12 ,  H01J49/06

CPC classification number: H01J49/20 ,  H01J37/05 ,  H01J37/244 ,  H01J37/3171 ,  H01J49/061 ,  H01J49/126 ,  H01J49/30 ,  H01J2237/15

Abstract: An ion implantation system has an ion source forming an ion beam. An mass analyzer defines and varies a mass analyzed beam along a beam path. A moveable mass resolving aperture assembly has a resolving aperture whose position is selectively varied in response to the variation of the beam path by the mass analyzer. A deflecting deceleration element positioned selectively deflects the beam path and selectively decelerate the mass analyzed beam. A controller selectively operates the ion implantation system in both a drift mode and decel mode. The controller passes the mass analyzed beam along a first path through the resolving aperture without deflection or deceleration in the drift mode and deflects and decelerates the beam along a second path in the decel mode. The position of the resolving aperture is selectively varied based on the variation in the beam path through the mass analyzer and the deflecting deceleration element.

公开(公告)号：US20180197716A1

公开(公告)日：2018-07-12

申请号：US15862335

申请日：2018-01-04

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Haruka Sasaki

IPC: H01J37/317 ,  H01J37/05 ,  H05H15/00

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/304 ,  H01J2237/0473 ,  H01J2237/04924 ,  H01J2237/24535 ,  H05H7/001 ,  H05H9/041 ,  H05H15/00 ,  H05H2277/12

Abstract: An ion implantation apparatus includes: a multistage linear acceleration unit including a plurality of stages of high-frequency resonators and a plurality of stages of focusing lenses; a first beam measuring unit disposed in the middle of the multistage linear acceleration unit and configured to allow passage of a beam portion adjacent to a center of a beam trajectory and measure a current intensity of another beam portion blocked by an electrode body outside a vicinity of the center of the beam trajectory; a second beam measuring unit disposed downstream of the multistage linear acceleration unit and configured to measure a current intensity of an ion beam exiting from the multistage linear acceleration unit; and a control device configured to adjust a control parameter of the plurality of stages of focusing lenses based on measurement results of the first and second beam measuring units.

公开(公告)号：US20180185811A1

公开(公告)日：2018-07-05

申请号：US15910142

申请日：2018-03-02

Applicant: XYLECO, INC.

Inventor： Marshall Medoff

IPC: B01J19/08 ,  C12P3/00 ,  C10L1/02 ,  C12P7/02

CPC classification number: B01J19/081 ,  B01J19/085 ,  B01J19/10 ,  B01J19/12 ,  B01J2219/0879 ,  B01J2219/12 ,  C10L1/02 ,  C10L5/44 ,  C10L9/00 ,  C10L2200/0469 ,  C10L2290/26 ,  C10L2290/36 ,  C12P3/00 ,  C12P7/02 ,  H01J37/04 ,  H01J37/05 ,  Y02E50/30

Abstract: Materials such as biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) and hydrocarbon-containing materials are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, or oil sands, oil shale, tar sands, bitumen, and coal to produce altered materials such as fuels (e.g., ethanol and/or butanol). The processing includes exposing the materials to an ion beam.

公开(公告)号：US09999118B2

公开(公告)日：2018-06-12

申请号：US15469636

申请日：2017-03-27

Applicant: Scholtz E Fontana Consultoria LTDA-ME

Inventor： Juliano Sadi Scholtz ,  Luis Cesar Fontana

IPC: H01J7/24 ,  H05H1/46 ,  H01J37/32 ,  H05H1/24 ,  H01J37/05

CPC classification number: H05H1/46 ,  H01J37/05 ,  H01J37/32009 ,  H01J37/32091 ,  H01J37/32146 ,  H01J2237/0473 ,  H05H1/24 ,  H05H2001/4675

Abstract: The plasma is formed between electrodes to be energized from an electric power source, containing a partially ionized mass having a luminescence region including neutral atoms (NA), primary electrons (PE), secondary electrons (SE), and ions. The method comprises the steps of: accelerating the primary electrons (PE) toward one of said electrodes polarized by a positive high voltage pulse impacting primary electrons (PE) against said electrode and ejecting secondary electrons (SE) from it; subsequently, accelerating the secondary electrons (SE) toward the luminescence region by polarization of said electrode by a negative voltage to collide the secondary electrons with neutral atoms (NA) and producing positive ions (PI) and derived electrons (DE); repeating the previous steps in order to obtain a steady state plasma with a desired degree of ionization.

公开(公告)号：US20180090295A1

公开(公告)日：2018-03-29

申请号：US15826445

申请日：2017-11-29

Applicant: Sean R. Kirkpatrick ,  Richard C. Svrluga ,  Stephen M. Blinn

Inventor： Sean R. Kirkpatrick ,  Richard C. Svrluga ,  Stephen M. Blinn

IPC: H01J37/05 ,  H05H3/02 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/05 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H05H1/20 ,  H05H3/02 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: An apparatus and method provided a drug layer formed on a surface region of a medical device, the drug layer comprised of a drug deposition and a carbonized or densified layer formed from the drug deposition by irradiation on an outer surface of the drug deposition, wherein the carbonized or densified layer does not penetrate through the drug deposition and is adapted to release drug from the drug deposition at a predetermined rate.