公开(公告)号：US20020153495A1

公开(公告)日：2002-10-24

申请号：US10131805

申请日：2002-04-22

Applicant: Nikon Corporation.

Inventor： Motofusa Kageyama

IPC: H01J037/07

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J2237/0264 ,  H01J2237/31793

Abstract: Magnetically shielded enclosures are provided that house charged-particle-beam (CPB) systems (e.g., CPB microlithography apparatus) having active-canceler coils. The enclosures have outer walls comprised of anisotropic magnetic materials or of magnetically divided plates. The magnetically divided plates may be made of Permalloy or other similar material. The anisotropic or magnetically divided outer walls may be configured to align the external magnetic field in the direction of the magnetic field produced by the active canceler. Thus, controlling the electrical current in the active-canceler coils to cancel the external magnetic field is simplified, even if the CPB microlithography apparatus has a complex shape or is in an environment with a non-uniform magnetic field.

Abstract translation: 提供了具有带有主动消除线圈的带电粒子束（CPB）系统（例如CPB微光刻设备）的磁屏蔽外壳。 外壳具有由各向异性磁性材料或磁性分隔板组成的外壁。 磁分离板可以由坡莫合金或其它类似材料制成。 各向异性或磁分割的外壁可以被配置为使外部磁场沿着由有效消除器产生的磁场的方向对准。 因此，即使CPB微光刻设备具有复杂形状或处于具有不均匀磁场的环境中，也能够简化控制主动加速器线圈中的电流以抵消外部磁场。

公开(公告)号：US5847399A

公开(公告)日：1998-12-08

申请号：US876876

申请日：1997-06-16

Applicant: Reinhold Schmitt ,  Stefan Lanio ,  Thomas Jasinski

Inventor： Reinhold Schmitt ,  Stefan Lanio ,  Thomas Jasinski

IPC: H01J37/141 ,  H01J37/09 ,  H01J37/147 ,  H01L21/027

CPC classification number: H01J37/147 ,  H01J37/09 ,  H01J2237/0264

Abstract: A deflection system (6) for a charged particle beam (2), in particular for rrangement in an objective lens for a charged particle beam device with a deflection means (60) for generating a magnetic field acting on the charged particle beam (2) and a shield (61) for avoiding eddy currents, which surrounds the deflection means and guides the formed outer magnetic field. The shield (61) consists, transversely to the direction of the charged particle beam (2), of at least one soft magnetic layer which is preferably formed as a strip material and rolled up to a cylinder together with an electrically insulating layer.

Abstract translation: 一种用于带电粒子束（2）的偏转系统（6），特别用于布置在用于产生作用在带电粒子束（2）上的磁场的偏转装置（60）的带电粒子束装置的物镜中， 以及用于避免涡流的屏蔽件（61），其围绕偏转装置并引导所形成的外部磁场。 至少一个软磁性层的横向于带电粒子束（2）的方向的屏蔽层（61），其优选地形成为带状材料并与电绝缘层一起卷绕到圆柱体上。

公开(公告)号：US4524261A

公开(公告)日：1985-06-18

申请号：US533822

申请日：1983-09-19

Applicant: Paul F. Petric ,  Michael S. Foley

Inventor： Paul F. Petric ,  Michael S. Foley

IPC: B01J3/00 ,  H01J37/18 ,  H01J37/317 ,  H01L21/027 ,  B23K15/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/18 ,  H01J37/3174 ,  H01J2237/0264 ,  H01J2237/162 ,  H01J2237/188 ,  H01J2237/2006

Abstract: Localized vacuum envelope apparatus includes a housing member having a bottom plate with a downwardly extending first sleeve and an upwardly extending flange. The flange includes ports for vacuum pumping and is adapted for attachment to an electron beam column. The apparatus further includes a lower plate having a second downwardly extending sleeve and an upper plate having a third downwardly extending sleeve. The first, second and third sleeves, which can have a truncated conical shape and are concentric, define vacuum zones. Channels are provided for connecting the vacuum zones to individual ports. The tips of the sleeves are coplanar and form the tip of the vacuum envelope. A noncontacting graded vacuum seal is formed between the tip of the vacuum envelope and a workpiece. The housing member and the upper plate can be ferromagnetic material to provide double magnetic shielding.

Abstract translation: 局部真空包封装置包括具有底板的壳体构件，底板具有向下延伸的第一套筒和向上延伸的凸缘。 凸缘包括用于真空泵送的端口，并且适于附接到电子束柱。 该装置还包括具有第二向下延伸套筒的下板和具有第三向下延伸套筒的上板。 可以具有截头圆锥形并且同心的第一，第二和第三套筒限定了真空区域。 提供通道用于将真空区域连接到各个端口。 袖子的尖端是共面的并形成真空外壳的尖端。 在真空外壳的尖端和工件之间形成非接触式分级真空密封。 外壳构件和上板可以是铁磁材料，以提供双重磁屏蔽。

公开(公告)号：US09673017B1

公开(公告)日：2017-06-06

申请号：US14947723

申请日：2015-11-20

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Pavel Adamec

IPC: H01J37/00 ,  H01J37/09 ,  H01J37/28

CPC classification number: H01J37/09 ,  H01J2237/0264 ,  H01J2237/28

Abstract: A housing device for providing a magnetic shielding of a charged particle beam is described. The housing device includes a housing element configured to at least partially enclose a charged particle beam propagation path and comprising a magnetic shielding material, wherein the housing element includes an inner surface directed toward the charged particle beam propagation path, an outer surface directed away from the charged particle beam propagation path and at least one edge region with an edge surface connecting the inner surface with the outer surface; and a contacting element comprising a conductive material and fixed to the at least one edge region in at least one of a form-fit connection and a bonded connection. Further, a housing arrangement including two or more electrically contacting housing devices, a charged particle beam device with a housing device, and methods of manufacturing a housing device are described.

公开(公告)号：US09653261B2

公开(公告)日：2017-05-16

申请号：US14400569

申请日：2013-05-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus

IPC: G03B27/52 ,  H01J37/317 ,  H01J37/09 ,  H01J37/30 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

Abstract: The invention relates to a charged particle lithography system for exposing a target. The system includes a charged particle beam generator for generating a charged particle beam; an aperture array (6) for forming a plurality of beamlets from the charged particle beam; and a beamlet projector (12) for projecting the beamlets onto a surface of the target. The charged particle beam generator includes a charged particle source (3) for generating a diverging charged particle beam; a collimator system (5a,5b,5c,5d; 72;300) for refracting the diverging charged particle beam; and a cooling arrangement (203) for removing heat from the collimator system, the cooling arrangement comprising a body surrounding at least a portion of the collimator system.

公开(公告)号：US09640363B2

公开(公告)日：2017-05-02

申请号：US15282028

申请日：2016-09-30

Applicant: Institute Of Physics, Chinese Academy Of Sciences

Inventor： Guoqiang Yu ,  Peng Guo ,  Xiufeng Han ,  Chaohui Guo ,  Xiaoyu Sun ,  Xiangqian Zhou

IPC: H01J37/09 ,  H01F41/00 ,  G01R33/09 ,  H01L43/12 ,  H01F7/20 ,  H01J37/141

CPC classification number: H01J37/09 ,  G01R33/093 ,  G01R33/096 ,  H01F7/202 ,  H01F7/204 ,  H01F41/00 ,  H01J37/141 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/28 ,  H01J2237/31754 ,  H01L43/12

Abstract: A nano-patterned system comprises a vacuum chamber, a sample stage and a magnetic-field applying device, which comprises a power supply, a magnetic-field generation device and a pair of magnetic poles. The magnetic-field generation device comprises a coil and a magnetic conductive soft iron core. The power supply is connected to the coil, which is wound on the soft iron core to generate a magnetic field. The soft iron core is of a semi-closed frame structure and the magnetic poles are at the ends of the frame structure. The stage is inside a vacuum chamber. The poles are oppositely arranged inside the vacuum chamber relative to the stage. The coil and the soft iron core are outside the vacuum chamber. The soft iron core leads the magnetic field generated by the coil into the vacuum chamber. The magnetic poles locate a sample on the stage and apply a local magnetic field.

公开(公告)号：US20160133433A1

公开(公告)日：2016-05-12

申请号：US14893669

申请日：2014-03-19

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Masashi FUJITA ,  Masahiro TSUNODA ,  Katsunori ONUKI ,  Katsuya AIBARA ,  Seiichi SHINDO ,  Takaaki NISHIMORI

IPC: H01J37/16 ,  H01J37/18

CPC classification number: H01J37/165 ,  H01J37/09 ,  H01J37/18 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/0266 ,  H01J2237/26 ,  H01L21/6719 ,  H01L21/67201

Abstract: An object of the present invention is to provide a charged particle beam device that suppresses the influence of an external electromagnetic wave, even when a shielding member, such as a vacuum valve, is in the open state. To achieve the above object, a charged particle beam device including a vacuum chamber (111) having an opening (104) that surrounds a sample delivery path is proposed. The charged particle beam device includes a conductive material (118) surrounding the opening (104) for conduction between the vacuum chamber (111) and a conductive member (106) disposed on the atmosphere side. According to an embodiment of the present invention, it is possible to restrict an electromagnetic wave (117) from reaching the sample chamber via the delivery path.

Abstract translation: 本发明的目的是提供一种抑制外部电磁波的影响的带电粒子束装置，即使在诸如真空阀的屏蔽构件处于打开状态时也是如此。 为了实现上述目的，提出了一种包括具有围绕样品传送路径的开口（104）的真空室（111）的带电粒子束装置。 带电粒子束装置包括围绕开口（104）的导电材料（118），用于在真空室（111）和设置在大气侧的导电构件（106）之间传导。 根据本发明的实施例，可以限制电磁波（117）经由输送路径到达样品室。

公开(公告)号：US20150136994A1

公开(公告)日：2015-05-21

申请号：US14400561

申请日：2013-05-08

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Teunis Van De Peut ,  Hendrik Den Boer

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/243 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/0437 ,  H01J2237/2485 ,  H01J2237/31754 ,  H01J2237/31774

Abstract: The invention relates to a modulation device for modulating charged particle beamlets in accordance with pattern data in a multi-beamlet charged particle lithography system. The device comprises a plate-like body, an array of beamlet deflectors, a plurality of power supply terminals (202-205) for supplying at least two different voltages, a plurality of control circuits, and a conductive slab (201) for supplying electrical power to one or more of the power supply terminals (202-205). The plate-like body is divided into an elongated beam area (51) and an elongated non-beam area (52) positioned with their long edges adjacent to each other. The beamlet deflectors are located in the beam area. The control circuits are located in non-beam area. The conductive slab is connected to the control circuits in the non-beam area. The conductive slab comprises a plurality of thin conductive plates (202-205).

Abstract translation: 本发明涉及一种用于根据多子束带电粒子光刻系统中的图案数据调制带电粒子子束的调制装置。 该装置包括板状主体，​​子束偏转器阵列，用于提供至少两个不同电压的多个电源端子（202-205），多个控制电路和用于提供电气的导电板（201） 一个或多个电源端子（202-205）的电力。 板状体被分成细长的射束区域（51）和长边相邻的细长非光束区域（52）。 子束偏转器位于光束区域中。 控制电路位于非光束区域。 导电板连接到非射束区域中的控制电路。 导电板包括多个薄导电板（202-205）。

公开(公告)号：US20150034842A1

公开(公告)日：2015-02-05

申请号：US14444893

申请日：2014-07-28

Applicant: CANON KABUSHIKI KAISHA

Inventor： Shinji Uchida

IPC: H01F7/06 ,  H01J37/26 ,  H01J37/317

CPC classification number: H01F7/06 ,  H01J37/20 ,  H01J2237/0264 ,  H01J2237/20221 ,  H01J2237/20278 ,  H01J2237/3175 ,  H02K11/01 ,  H02K41/035

Abstract: A driving apparatus includes an electromagnetic actuator configured to generate a motive power by an electromagnetic force; a movable portion configured to be movable by the electromagnetic actuator; a magnetic shield unit that surrounds the electromagnetic actuator, wherein the magnetic shield unit includes a first magnetic shield having an opening and a second magnetic shield having an opening arranged in this order from a side closer to electromagnetic actuator. The opening opposes the second magnetic shield at least part of an area of the opening, and the movable portion is bent so as to penetrate through the openings of the first and the second magnetic shields.

Abstract translation: 驱动装置包括电磁致动器，其构造成通过电磁力产生动力; 被构造成可由所述电磁致动器移动的可动部; 磁屏蔽单元，其围绕所述电磁致动器，其中所述磁屏蔽单元包括具有开口的第一磁屏蔽和具有从靠近电磁致动器的一侧依次布置的开口的第二磁屏蔽。 开口与开口的至少一部分区域的第二磁屏蔽相对，并且可动部被弯曲以穿过第一和第二磁屏蔽的开口。

公开(公告)号：US20110147612A1

公开(公告)日：2011-06-23

申请号：US12970842

申请日：2010-12-16

Applicant: Jerry Peijster ,  Aditya Mehendale ,  Andre Johannes Maria Hilderink

Inventor： Jerry Peijster ,  Aditya Mehendale ,  Andre Johannes Maria Hilderink

IPC: G21K5/08 ,  B25J11/00 ,  B23Q1/25

CPC classification number: H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/202

Abstract: The invention relates to a charged particle system provided with a support and positioning structure for supporting and positioning a target on a table, the support and positioning structure comprising a first member and a second member and at least one motor so as to move the first member relative to the second member, wherein a shield is present to shield at least one charged particle beam from electromagnetic fields generated by said at least one motor, the support and positioning structure further comprising a spring mechanically coupling the first member and the second member for at least partially bearing the weight of the first member, table and target.

Abstract translation: 本发明涉及一种具有支撑和定位结构的带电粒子系统，用于将靶材支撑并定位在桌子上，支撑和定位结构包括第一构件和第二构件以及至少一个马达，以使第一构件 相对于第二构件，其中存在用于屏蔽来自由所述至少一个电动机产生的电磁场的至少一个带电粒子束的屏蔽，所述支撑和定位结构还包括弹簧，其将所述第一构件和所述第二构件机械地联接在一起 最少部分地承载第一构件，工作台和目标的重量。