公开(公告)号：US3521957A

公开(公告)日：1970-07-28

申请号：US3521957D

申请日：1965-09-01

Applicant: YISSUM RES DEV CO

Inventor： FRAENKEL BENJAMIN SEEV ,  FELDMAN URI

IPC: G01J3/00 ,  G01J3/04 ,  G01J3/443 ,  G01J3/40

CPC classification number: G01J3/04 ,  G01J3/0229 ,  G01J3/443

公开(公告)号：US20240290591A1

公开(公告)日：2024-08-29

申请号：US18655368

申请日：2024-05-06

Applicant: Tokyo Electron Limited

Inventor： Atsushi SAWACHI ,  Ichiro SONE ,  Takuya NISHIJIMA ,  Suguru SATO

IPC: H01J37/32 ,  G01J3/443

CPC classification number: H01J37/32972 ,  G01J3/443 ,  H01J37/32733

Abstract: A measuring device for a vacuum processing apparatus including a processing chamber having a first gate for loading and unloading a substrate and a second gate different from the first gate is provided. The measuring device includes a case having an opening that is sized to correspond to the second gate of the processing chamber and is airtightly attachable to the second gate, a decompressing mechanism configured to reduce a pressure in the case, and a measuring mechanism accommodated in the case and configured to measure a state in the processing chamber through the opening in a state where the pressure in the case is reduced by the decompressing mechanism.

公开(公告)号：US20240230409A9

公开(公告)日：2024-07-11

申请号：US17973083

申请日：2022-10-25

Applicant: Tokyo Electron Limited

Inventor： Sergey Voronin ,  Andrej Mitrovic ,  Blaze Messer ,  Yan Chen ,  Joel Ng ,  Ashawaraya Shalini ,  Ying Zhu ,  Da Song

IPC: G01J3/443 ,  G01J3/02

CPC classification number: G01J3/443 ,  G01J3/0205

Abstract: A method of processing a substrate that includes: exposing the substrate in a plasma processing chamber to a plasma powered by applying a first power to a first electrode of a plasma processing chamber; turning OFF the first power to the first electrode after the first time duration; while the first power is OFF, applying a second power to a second electrode of the plasma processing chamber for a second time duration, the second time duration being shorter than the first time duration, an energy of the second power over the second time duration is less than an energy of the first power over the first time duration by a factor of at least 2; and detecting an optical emission spectrum (OES) from species in the plasma processing chamber.

公开(公告)号：US20240192055A1

公开(公告)日：2024-06-13

申请号：US18581626

申请日：2024-02-20

Applicant: Applied Materials, Inc.

Inventor： Kin Pong LO ,  Lara HAWRYLCHAK ,  Malcolm J. BEVAN ,  Theresa Kramer GUARINI ,  Wei LIU ,  Bernard L. HWANG

IPC: G01J3/28 ,  G01J3/02 ,  G01J3/10 ,  G01J3/443

CPC classification number: G01J3/28 ,  G01J3/0218 ,  G01J3/10 ,  G01J3/443 ,  G01J2003/2879

Abstract: One or more embodiments described herein generally relate to systems and methods for calibrating an optical emission spectrometer (OES) used for processing semiconductor substrates. In embodiments herein, a light fixture is mounted to a plate within a process chamber. A light source is positioned within the light fixture such that it provides an optical path that projects directly at a window through which the OES looks into the process chamber for its reading. When the light source is on, the OES measures the optical intensity of radiation from the light source. To calibrate the OES, the optical intensity of the light source is compared at two separate times when the light source is on. If the optical intensity of radiation at the first time is different than the optical intensity of radiation at the second time, the OES is modified.

公开(公告)号：US20240183710A1

公开(公告)日：2024-06-06

申请号：US18427902

申请日：2024-01-31

Applicant: VIAVI Solutions Inc.

Inventor： William D. HOUCK ,  Valton SMITH

IPC: G01J3/02 ,  G01J3/10 ,  G01J3/443 ,  G01N21/27 ,  G01N21/47

CPC classification number: G01J3/0205 ,  G01J3/0202 ,  G01J3/0256 ,  G01J3/0272 ,  G01J3/0291 ,  G01J3/0297 ,  G01J3/10 ,  G01N21/274 ,  G01N21/4738 ,  G01J3/443

Abstract: An optical measurement device may include a light source; an emission optic configured to direct a first portion of light generated by the light source to a measurement target; a collection optic configured to receive light from the measurement target; an optical conduit configured to direct a second portion of light generated by the light source to a spectral reference; the spectral reference; a sensor; and a filter. A first portion of the filter may be provided between the collection optic and a first portion of the sensor. A second portion of the filter may be provided between the spectral reference and a second portion of the sensor.

公开(公告)号：US11965418B2

公开(公告)日：2024-04-23

申请号：US17550556

申请日：2021-12-14

Applicant: Halliburton Energy Services, Inc.

Inventor： Mathew Dennis Rowe

IPC: G01J3/02 ,  E21B49/00 ,  G01J3/443 ,  G01N21/03 ,  G01N21/67

CPC classification number: E21B49/003 ,  E21B49/00 ,  G01J3/0205 ,  G01J3/027 ,  G01J3/443 ,  G01N21/0303 ,  G01N21/67

Abstract: A system includes a discharge tool positioned within a wellbore and configured to generate an electrical discharge that interacts with a rock formation proximate to the discharge tool, wherein the interaction of the electrical discharge with the rock formation vaporizes a portion of the rock formation to generate a discharge plasma. The system further includes an optical emission spectroscopy (OES) sub-system configured to determine an elemental composition of the portion of the rock formation based on optical emission generated by the discharge plasma, wherein at least a portion of the OES sub-system is positioned within the wellbore.

公开(公告)号：US20240094056A1

公开(公告)日：2024-03-21

申请号：US17948407

申请日：2022-09-20

Applicant: Tokyo Electron Limited

Inventor： Sergey Voronin ,  Blaze Messer ,  Yan Chen ,  Joel Ng ,  Ashawaraya Shalini ,  Ying Zhu ,  Da Song

IPC: G01J3/443 ,  H01J37/32

CPC classification number: G01J3/443 ,  H01J37/32146 ,  H01J37/32972 ,  H01J2237/24485 ,  H01J2237/24507 ,  H01J2237/24585 ,  H01J2237/334

Abstract: A method of characterizing a plasma in a plasma processing system that includes: generating a pulsed plasma in a plasma processing chamber of the plasma processing system, the pulsed plasma being powered with a pulsed power signal, each pulse of the pulsed plasma including three periods: a overshoot period, a stable-ON period, and a decay period; performing cyclic optical emission spectroscopy (OES) measurements for the pulsed plasma, the cyclic OES measurements including: obtaining first OES data during one of the three periods from more than one pulses of the pulsed plasma; and obtaining a characteristic of the pulsed plasma for the one of the three periods based only on the first OES data.

公开(公告)号：US11925153B2

公开(公告)日：2024-03-12

申请号：US17669744

申请日：2022-02-11

Applicant: Sensor Electronic Technology, Inc.

Inventor： Michael Shur ,  Alexander Dobrinsky ,  Maxim S. Shatalov ,  Arthur Peter Barber, III

IPC: A01G7/04 ,  A01G9/20 ,  A01G22/00 ,  G01J3/10 ,  G01J3/42 ,  G01J3/44 ,  G01J3/443 ,  G01N21/55 ,  G05B15/02

CPC classification number: A01G7/045 ,  A01G9/20 ,  A01G22/00 ,  G01J3/10 ,  G01J3/42 ,  G01J3/4406 ,  G01J3/443 ,  G01N21/55 ,  G05B15/02 ,  G01J2003/102 ,  Y02P60/14

Abstract: An approach for controlling light exposure of a light sensitive object is described. Aspects of this approach involve using a first set of radiation sources to irradiate the object with visible radiation and infrared radiation. A second set of radiation sources spot irradiate the object in a set of locations with a target ultraviolet radiation having a range of wavelengths. Radiation sensors detect radiation reflected from the object and environment condition sensors detect conditions of the environment in which the object is located during irradiation. A controller controls irradiation of the light sensitive object by the first and second set of radiation sources according to predetermined optimal irradiation settings specified for various environmental conditions. In addition, the controller adjusts irradiation settings of the first and second set of radiation sources as a function of measurements obtained by the various sensors.

公开(公告)号：US11920979B2

公开(公告)日：2024-03-05

申请号：US17653299

申请日：2022-03-03

Applicant: VIAVI Solutions Inc.

Inventor： William D. Houck ,  Valton Smith

IPC: G01J3/02 ,  G01J3/10 ,  G01J3/443 ,  G01N21/27 ,  G01N21/47

CPC classification number: G01J3/0205 ,  G01J3/0202 ,  G01J3/0256 ,  G01J3/0272 ,  G01J3/0291 ,  G01J3/0297 ,  G01J3/10 ,  G01N21/274 ,  G01N21/4738 ,  G01J3/443

Abstract: An optical measurement device may include a light source; an emission optic configured to direct a first portion of light generated by the light source to a measurement target; a collection optic configured to receive light from the measurement target; an optical conduit configured to direct a second portion of light generated by the light source to a spectral reference; the spectral reference; a sensor; and a filter. A first portion of the filter may be provided between the collection optic and a first portion of the sensor. A second portion of the filter may be provided between the spectral reference and a second portion of the sensor.

公开(公告)号：US20240053201A1

公开(公告)日：2024-02-15

申请号：US17766184

申请日：2019-12-23

Applicant: Agilent Technologies, Inc.

Inventor： Daniel Finn McCarthy ,  Mark Andrew Woods

IPC: G01J3/443 ,  G01N21/73

CPC classification number: G01J3/443 ,  G01N21/73 ,  G01J2003/2843

Abstract: The present invention is directed to a computer-implemented method of automatically identifying the presence of one or more elements in a sample via optical emission spectroscopy. The method includes the steps of obtaining sample spectrum data from the sample, obtaining a list of one or more predetermined emission wavelengths for each element in the periodic table quantifiable by optical emission spectroscopy, each predetermined emission wavelength being associated with a list of one or more potential interference emission wavelengths, determining a list of one or more analyte wavelengths corresponding to spectral peaks in the sample spectrum data based on the list of emission wavelengths, for each analyte wavelength, determining whether the corresponding spectral peak has a likelihood of being affected by an interference emission wavelength causing spectral interference based on the list of one or more potential interference emission wavelengths corresponding to the analyte wavelength, determining a revised list of one or more analyte wavelengths by removing from the list of analyte wavelengths, analyte wavelengths corresponding to spectral peaks having a likelihood of being affected by an interference emission wavelength, and determining a level of confidence that one or more elements are present in the sample based on a set of criteria applied to the revised list of analyte wavelengths.