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    Hybrid charged-particle beam and light beam microscopy
    21.
    发明授权
    Hybrid charged-particle beam and light beam microscopy 有权
    混合带电粒子束和光束显微镜

    公开(公告)号：US09564291B1

    公开(公告)日：2017-02-07

    申请号：US14742697

    申请日：2015-06-17

    Applicant: Mochii, Inc.

    Inventor： Christopher Su-Yan Own ,  Matthew Francis Murfitt

    IPC: G01N23/04 ,  G01N23/22 ,  H01J37/28 ,  G02B21/00 ,  G02B21/36 ,  H01J37/147 ,  H01J37/20

    CPC classification number: H01J37/28 ,  C23C14/24 ,  C23C14/52 ,  C23C14/54 ,  G02B21/002 ,  G02B21/0048 ,  G02B21/008 ,  G02B21/367 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/18 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J2237/0203 ,  H01J2237/2007 ,  H01J2237/28

    Abstract: A charged-particle beam microscope is provided for imaging a sample. The microscope has a stage to hold a sample and a charged-particle beam column to direct a charged-particle beam onto the sample. The charged-particle beam column includes a charged-particle beam source to generate a charged-particle beam, and charged-particle beam optics to converge the charged-particle beam onto the sample. The microscope also has a light beam column to direct a light beam onto the sample. The light beam column includes a light beam source to generate a light beam, and light-beam optics to converge the light beam onto the sample. One or more detectors are provided to detect charged-particle and light radiation emanating from the sample to generate an image. A controller to analyze the detected charged-particle radiation and detected light radiation to generate an image of the sample.

    Abstract translation: 提供带电粒子束显微镜用于对样品进行成像。 显微镜具有载置样品和带电粒子束柱以将带电粒子束引导到样品上的阶段。 带电粒子束柱包括带电粒子束源以产生带电粒子束，并且带电粒子束光学器件将带电粒子束收敛到样品上。 显微镜还具有将光束引导到样品上的光束柱。 光束列包括用于产生光束的光束源和用于将光束会聚到样品上的光束光学器件。 提供一个或多个检测器以检测从样品发出的带电粒子和光辐射以产生图像。 控制器，用于分析检测到的带电粒子辐射和检测到的光辐射以产生样品的图像。

    Bipolar wafer charge monitor system and ion implantation system comprising same
    22.
    发明授权
    Bipolar wafer charge monitor system and ion implantation system comprising same 有权
    双极晶片电荷监测系统和包括其的离子注入系统

    公开(公告)号：US09558914B2

    公开(公告)日：2017-01-31

    申请号：US14631066

    申请日：2015-02-25

    Applicant: Axcelis Technologies, Inc.

    Inventor： Marvin Farley ,  Takao Sakase ,  Joseph Foley

    IPC: H01J37/08 ,  H01J37/304 ,  H01J37/317 ,  H01J37/32

    CPC classification number: H01J37/304 ,  H01J37/3171 ,  H01J37/32412 ,  H01J2237/0041 ,  H01J2237/0203 ,  H01J2237/24507 ,  H01J2237/304 ,  H01J2237/31701 ,  H01L22/14

    Abstract: A charge monitor having a Langmuir probe is provided, wherein a positive and negative charge rectifier are operably coupled to the probe and configured to pass only a positive and negative charges therethrough, respectively. A positive current integrator is operably coupled to the positive charge rectifier, wherein the positive current integrator is biased via a positive threshold voltage, and wherein the positive current integrator is configured to output a positive dosage based, at least in part, on the positive threshold voltage. A negative current integrator is operably coupled to the negative charge rectifier, wherein the negative current integrator is biased via a negative threshold voltage, and wherein the negative current integrator is configured to output a negative dosage based, at least in part, on the negative threshold voltage. A positive charge counter and a negative charge counter are configured to respectively receive the output from the positive current integrator and negative current integrator in order to provide a respective cumulative positive charge value and cumulative negative charge value associated with the respective positive charge and negative charge.

    Abstract translation: 提供具有朗缪尔探针的电荷监测器，其中正和负电荷整流器可操作地耦合到探针并且被配置为分别仅通过正和负电荷。 正电流积分器可操作地耦合到正电荷整流器，其中正电流积分器经由正阈值电压偏置，并且其中正电流积分器被配置为至少部分地基于正阈值输出正剂量 电压。 负电流积分器可操作地耦合到负电荷整流器，其中负电流积分器经由负阈值电压被偏置，并且其中负电流积分器被配置为基于至少部分地基于负阈值输出负剂量 电压。 配置正电荷计数器和负电荷计数器以分别接收来自正电流积分器和负电流积分器的输出，以便提供与相应的正电荷和负电荷相关联的相应的累积正电荷值和累积负电荷值。

    MEMBER FOR CHARGED PARTICLE BEAM DEVICE, CHARGED PARTICLE BEAM DEVICE AND DIAPHRAGM MEMBER
    23.
    发明申请
    MEMBER FOR CHARGED PARTICLE BEAM DEVICE, CHARGED PARTICLE BEAM DEVICE AND DIAPHRAGM MEMBER 审中-公开
    充电颗粒光束装置的成员，充电颗粒光束装置和透镜成员

    公开(公告)号：US20150206705A1

    公开(公告)日：2015-07-23

    申请号：US14423367

    申请日：2013-07-11

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Noriyuki Sakuma ,  Yusuke Ominami

    IPC: H01J37/20 ,  H01J37/18 ,  H01J37/28

    CPC classification number: H01J37/20 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0203 ,  H01J2237/063 ,  H01J2237/164 ,  H01J2237/166 ,  H01J2237/18 ,  H01J2237/1825 ,  H01J2237/2006 ,  H01J2237/202 ,  H01J2237/2605 ,  H01J2237/2608 ,  H01J2237/2801

    Abstract: A member for a charged particle beam device (56), which is used for a charged particle beam device (1c), includes a frame (55) to be attached to a frame (3c), and a diaphragm element (18a) provided in the frame (55). In the diaphragm element (18a), a diaphragm (19), which air-tightly separates the inside and the outside of a vacuum chamber (4a) from each other in a state where the pressure inside the vacuum chamber (4a) partitioned by the frame (3c) and the frame (55) is reduced more than the pressure outside the vacuum chamber (4a), and allows a charged particle beam to be transmitted therethrough, is formed. Moreover, in the diaphragm element (18a), a buffer film (33) for preventing a sample (12) and the diaphragm (19) from coming into contact with each other is formed so as to be positioned on a sample stage (22) side rather than on the diaphragm (19).

    Abstract translation: 用于带电粒子束装置（1c）的带电粒子束装置（56）的构件包括：被附接到框架（3c）的框架（55）和设置在框架 框架（55）。 在隔膜元件（18a）中，隔膜（19）在真空室（4a）内分隔的真空室（4a）内的压力的状态下将真空室（4a）的内部和外部气密地分离 框架（3c）和框架（55）比真空室（4a）外面的压力还原，并且允许带电粒子束透过。 此外，在隔膜元件（18a）中，形成用于防止样品（12）和隔膜（19）相互接触的缓冲膜（33），位于样品台（22）上， 而不是在隔膜（19）上。

    ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE
    25.
    发明申请
    ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE 审中-公开
    具有多个阴极的电弧室用于离子源

    公开(公告)号：US20150130353A1

    公开(公告)日：2015-05-14

    申请号：US14578575

    申请日：2014-12-22

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Chin-Tsung LIN ,  Hsiao-Yin HSIEH ,  Chi-Hao HUANG ,  Hong-Shing CHOU ,  Yeh-Chieh WANG

    IPC: H01J37/08 ,  H01J37/244 ,  H01J37/317

    CPC classification number: H01J37/08 ,  H01J37/244 ,  H01J37/3171 ,  H01J2237/0203 ,  H01J2237/024 ,  H01J2237/026 ,  H01J2237/08 ,  H01J2237/303 ,  H01J2237/30405

    Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.

    Abstract translation: 一种用于延长离子源的使用寿命的装置，包括电弧室，其包含要顺序使用的多个阴极，以及多个防水剂，以在不使用时保护阴极。 电弧室包括限定反应腔的电弧室壳体，气体注入开口，多个阴极和至少一个排斥元件。 用于延长离子源的使用寿命的方法包括向离子源中的电弧室的第一阴极提供电力，操作第一阴极，检测第一阴极的故障或性能下降，激励第二阴极，以及 与第二阴极连续操作电弧室。

    Drift control in a charged particle beam system
    27.
    发明授权
    Drift control in a charged particle beam system 有权
    带电粒子束系统中的漂移控制

    公开(公告)号：US08618478B2

    公开(公告)日：2013-12-31

    申请号：US13724323

    申请日：2012-12-21

    Applicant: FEI Company

    Inventor： Casper Maria Smit ,  Johannes Antonius Maria van den Oetelaar

    IPC: H01J37/26

    CPC classification number: H01J37/26 ,  G05D23/00 ,  H01J37/16 ,  H01J37/24 ,  H01J2237/002 ,  H01J2237/0203

    Abstract: A method and apparatus for reducing drift in a charged particle beam system. The method includes providing a charged particle beam column including a charged particle beam, a lens system, and a sample chamber; disposing a temperature-controlled device between the lens system and the sample chamber to control heat transfer between the lens system and the sample chamber; and controlling the temperature of the temperature-controlled device to reduce or eliminate the thermal drift of the position of a sample within the sample chamber relative to the position of the charged particle beam.

    Abstract translation: 一种减少带电粒子束系统漂移的方法和装置。 该方法包括提供包括带电粒子束，透镜系统和样品室的带电粒子束柱; 在透镜系统和样品室之间设置温度控制装置，以控制透镜系统和样品室之间的热传递; 以及控制温度控制装置的温度以相对于带电粒子束的位置来减少或消除样品室内的样品位置的热漂移。

    IMPURITY-DOPED LAYER FORMATION APPARATUS AND ELECTROSTATIC CHUCK PROTECTION METHOD
    28.
    发明申请
    IMPURITY-DOPED LAYER FORMATION APPARATUS AND ELECTROSTATIC CHUCK PROTECTION METHOD 有权
    防腐层形成装置和静电保护保护方法

    公开(公告)号：US20130019797A1

    公开(公告)日：2013-01-24

    申请号：US13548254

    申请日：2012-07-13

    Applicant: Masaru Tanaka ,  Masashi Kuriyama ,  Hiroki Murooka

    Inventor： Masaru Tanaka ,  Masashi Kuriyama ,  Hiroki Murooka

    IPC: H01L21/687 ,  B23P17/04 ,  B05C13/00

    CPC classification number: H01L21/68764 ,  H01J37/32871 ,  H01J2237/02 ,  H01J2237/0203 ,  H01L21/6831 ,  H01L21/6833 ,  Y10T29/49

    Abstract: An electrostatic chuck protection method includes providing an exposed chuck surface with a protective surface for preventing adherence of foreign materials including a substance exhibiting volatility in a vacuum environment, and removing the protective surface in order to perform a process of forming a substrate electrostatically held on the chuck surface with a surface layer including a substance having volatility in a vacuum chamber. The protective surface may be provided when a low vacuum pumping mode of operation is performed in a vacuum environment surrounding the chuck surface.

    Abstract translation: 静电卡盘保护方法包括：将露出的卡盘表面提供有保护表面，用于防止在真空环境中包括表现出挥发性的物质的异物附着，以及去除保护表面，以便进行静电保持在基板上的基板的形成工艺 卡盘表面具有包括在真空室中具有挥发性的物质的表面层。 当在围绕卡盘表面的真空环境中执行低真空泵送操作模式时，可以提供保护表面。

    METHOD FOR IN-SITU REFURBISHING A CERAMIC SUBSTRATE HOLDER
    30.
    发明申请
    METHOD FOR IN-SITU REFURBISHING A CERAMIC SUBSTRATE HOLDER 有权
    用于现场翻新陶瓷基板支架的方法

    公开(公告)号：US20090166327A1

    公开(公告)日：2009-07-02

    申请号：US11968369

    申请日：2008-01-02

    Applicant: Tadahiro Ishizaka ,  Kentaro Asakura ,  Masanao Ando ,  Toshio Hasegawa

    Inventor： Tadahiro Ishizaka ,  Kentaro Asakura ,  Masanao Ando ,  Toshio Hasegawa

    IPC: B44C1/22

    CPC classification number: H01J37/20 ,  H01J37/3244 ,  H01J37/32862 ,  H01J2237/0203

    Abstract: Method for operating a processing system and refurbishing a ceramic substrate holder within a process chamber of the processing system are described. The method includes plasma processing one or more substrates on the ceramic substrate holder, where the processing causes erosion of a nitride material of the ceramic substrate holder. The method further includes refurbishing the ceramic substrate holder in-situ without a substrate residing on the ceramic substrate holder, where the refurbishing includes exposing the ceramic substrate holder to a plasma-excited nitrogen-containing gas in the process chamber to at least partially reverse the erosion of the nitride material.

    Abstract translation: 描述了在处理系统的处理室内操作处理系统和翻新陶瓷衬底保持器的方法。 该方法包括等离子体处理陶瓷衬底保持器上的一个或多个衬底，其中处理引起陶瓷衬底保持器的氮化物材料的侵蚀。 该方法还包括原位翻新陶瓷衬底保持器，而不需要驻留在陶瓷衬底保持器上的衬底，其中翻新包括将陶瓷衬底保持器暴露于处理室中的等离子体激发的含氮气体，以至少部分地将 氮化物材料的侵蚀。

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