公开(公告)号：US08124165B2

公开(公告)日：2012-02-28

申请号：US11711253

申请日：2007-02-26

Applicant: Steve Tsai

Inventor： Steve Tsai

IPC: B05D3/02 ,  B05D1/18 ,  A61B17/04

CPC classification number: B05D1/18 ,  B05D3/0486 ,  B05D3/0493

Abstract: The present disclosure provides a method and apparatus for coating a medical device.

Abstract translation: 本公开提供了一种用于涂覆医疗装置的方法和装置。

公开(公告)号：US20110287190A1

公开(公告)日：2011-11-24

申请号：US12930826

申请日：2011-01-18

Applicant: John W. Bulluck

Inventor： John W. Bulluck

IPC: B05D7/00 ,  C08J3/28 ,  B05D3/00 ,  B05D3/06 ,  B05D3/02 ,  C08L63/00 ,  B05D5/00

CPC classification number: B05D3/067 ,  B05D3/0493 ,  B05D2202/10 ,  B05D2202/25 ,  C08F220/06 ,  C08F220/14 ,  C08F220/16 ,  C08F222/1006 ,  C08J3/28 ,  C08J2363/00

Abstract: Methods and compositions concerning an ultraviolet light curable formulation useful for repairing composite materials including the repair of a hole in the exterior of an airplane. The formulation may contain an acrylic oligomer, an acrylic monomer, an organic peroxide, a dialkylaniline promoter, a photoinitiator. The formulation can include a filler such as carbon fabric or Kevlar fabric.

Abstract translation: 涉及可用于修复复合材料的紫外光固化制剂的方法和组合物，包括修复飞机外部的孔。 制剂可以含有丙烯酸低聚物，丙烯酸单体，有机过氧化物，二烷基苯胺促进剂，光引发剂。 制剂可以包括填料如碳织物或Kevlar织物。

公开(公告)号：US08020508B2

公开(公告)日：2011-09-20

申请号：US11901566

申请日：2007-09-18

Applicant: M. Cengiz Altan ,  Levent Aktas

Inventor： M. Cengiz Altan ,  Levent Aktas

IPC: B05D1/12

CPC classification number: B05D1/12 ,  B05D3/0493 ,  B05D2201/04 ,  B05D2401/32 ,  B82Y30/00 ,  Y10S977/773 ,  Y10S977/841 ,  Y10S977/858

Abstract: The present invention is a process for uniformly depositing nanomaterials having particles smaller than 1 μm (i.e., nanoparticles) onto a surface of a base material (substrate or surface). The process is used to deposit any solid (nanoparticle) of any shape such as nanofibers, nanotubes, nanoclays (e.g., platelet shaped), nano-spheres, or irregularly shaped granules. The base material upon which the nano-particles are deposited can be made of any material. The method substantially prevents the deposition on the base material of larger particles (contaminants or clusters of the nanoparticles) which are often mixed with the nanomaterials. The amount of deposition and the range of particle sizes to be deposited can also be controlled by this method. Maintaining deposition uniformity, controlling the amount of deposition, and the elimination of larger particles enhances the utility of nanomaterials, and by subsequent processing, enables the development of multifunctional composite materials (or other coated substrates) to be used in commercial applications. In the present invention nanoparticles are applied to other base materials by substantially eliminating deposition of larger clusters or aggregates of nano-sized materials or other large impurities of other materials upon or in the base materials by positioning the base material within an upper portion of a deposition chamber.

Abstract translation: 本发明是将具有小于1μm的粒子的纳米材料（即，纳米粒子）均匀地沉积在基材（基材或表面）的表面上的方法。 该方法用于沉积任何形状的任何固体（纳米颗粒），例如纳米纤维，纳米管，纳米粘土（例如，血小板形），纳米球或不规则形状的颗粒。 纳米颗粒沉积在其上的基材可以由任何材料制成。 该方法基本上防止了通常与纳米材料混合的较大颗粒（污染物或纳米颗粒簇）在基材上的沉积。 沉积量和沉积粒径的范围也可以通过这种方法来控制。 维持沉积均匀性，控制沉积量和消除较大的颗粒增强了纳米材料的用途，并且随后的处理使得能够开发用于商业应用的多功能复合材料（或其它涂覆的基材）。 在本发明中，通过将基底材料定位在沉积物的上部中，通过基本上消除了在基材上或其中的其它材料的较大簇或者其它大量杂质的纳米尺寸材料或其他大杂质的沉积，将纳米颗粒应用于其它基底材料 房间。

公开(公告)号：US08006637B2

公开(公告)日：2011-08-30

申请号：US11729732

申请日：2007-03-29

Applicant: Wei Liu ,  Curtis Robert Fekety ,  Todd P St Clair

Inventor： Wei Liu ,  Curtis Robert Fekety ,  Todd P St Clair

IPC: B05C3/02 ,  C23C14/00

CPC classification number: B05D7/22 ,  B01D63/061 ,  B01D63/066 ,  B01D67/0046 ,  B01D67/0069 ,  B01D2323/42 ,  B05C7/04 ,  B05D1/00 ,  B05D3/0493 ,  C04B38/0096 ,  C23C18/1216 ,  C23C18/1628 ,  C23C18/1644 ,  C23C18/1678 ,  C23C18/42 ,  C04B35/00 ,  C04B38/0006

Abstract: A method and apparatus for applying a uniform membrane coating to a substrate, such as a honeycomb structure, having a plurality of through-channels, wherein the through-channels have an average diameter of less than or equal to 3 mm. The method includes providing a liquid precursor comprising membrane-forming materials to the substrate and applying a pressure differential across the substrate. The pressure differential causes the liquid precursor to travel uniformly through the through-channels, depositing the membrane-forming materials on the walls of the through-channels and forming the membrane on the walls of the through-channels. The apparatus includes a chamber capable of holding the substrate and of maintaining a pressure differential across the plurality of through-channels.

Abstract translation: 一种用于将均匀的膜涂层施加到具有多个通道的基底例如蜂窝结构的方法和装置，其中所述通道的平均直径小于或等于3mm。 该方法包括向衬底提供包含成膜材料的液体前体，并在衬底上施加压力差。 压力差导致液体前体均匀地流过通道，将膜形成材料沉积在通道的壁上并在通道的壁上形成膜。 该装置包括能够保持基板并且保持跨越多个通道的压差的室。

公开(公告)号：US20110189402A1

公开(公告)日：2011-08-04

申请号：US13008268

申请日：2011-01-18

Applicant: Uwe Wagner

Inventor： Uwe Wagner

IPC: B05C11/10 ,  B05D1/36

CPC classification number: B05C11/1039 ,  B01D21/003 ,  B01D45/12 ,  B05B1/044 ,  B05B13/0221 ,  B05B14/30 ,  B05B14/45 ,  B05C5/0254 ,  B05D1/26 ,  B05D3/0493 ,  B05D2201/00

Abstract: Apparatus for application of primer with the aid of vacuum, includes a reservoir (26) for liquid primer, an applicator nozzle (14) having an applicator chamber (16) and a suction chamber (18), a supply system (24, 26) for supplying primer from the reservoir (28) to the applicator chamber (16), a suction system (30, 32) for withdrawing air and primer from the suction chamber (18) and a separator (34) for separating primer from the withdrawn air and recirculating the separated primer into the reservoir (28), wherein the separator (34) is a cyclone.

Abstract translation: 用于在真空下施加底漆的装置包括用于液体底漆的储存器（26），具有施加器室（16）和吸入室（18）的施加器喷嘴（14），供应系统（24,26） 用于从所述储存器（28）向所述施用器室（16）供应底漆，用于从所述抽吸室（18）抽出空气和底漆的抽吸系统（30,32）和用于将引物与所述抽出的空气分离的分离器（34） 并将分离的底漆再循环到储存器（28）中，其中分离器（34）是旋风分离器。

公开(公告)号：US20110039013A1

公开(公告)日：2011-02-17

申请号：US12540302

申请日：2009-08-12

Applicant: John E. Papp ,  Matthew J. Gillick ,  Kent C. B. Stalker

Inventor： John E. Papp ,  Matthew J. Gillick ,  Kent C. B. Stalker

IPC: B05D3/04 ,  B05C5/00 ,  B05C13/02 ,  B05C11/00

CPC classification number: F26B9/06 ,  A61F2/82 ,  A61F2310/00389 ,  A61L2420/02 ,  B05B13/0221 ,  B05B13/0228 ,  B05B13/041 ,  B05B16/20 ,  B05B16/60 ,  B05B16/90 ,  B05D1/002 ,  B05D1/02 ,  B05D3/0413 ,  B05D3/0493 ,  B05D7/584

Abstract: A system and method allows for processing of two groups of medical devices, both groups being alternatingly spray coated within the same enclosure. The two groups repeatedly move back and forth between a spray area and a drying area which is isolated from the spray area. One group moves into the spray area as the other group moves out and into the drying area. Thereafter, the group in the spray area moves out and into the drying area and the other group moves back into the spraying area for a second coating. The alternating process may be repeated any number of times. The spray area may be located inside a sealed spray isolator enclosure and surrounded by gas discharge nozzles.

Abstract translation: 一种系统和方法允许处理两组医疗装置，两组在相同外壳内交替喷涂。 两组反复在喷雾区域和与喷雾区域隔离的干燥区域之间来回移动。 随着另一组移出并进入干燥区域，一组移入喷雾区域。 此后，喷雾区域中的组移出并进入干燥区域，而另一组移回喷涂区域进行第二次涂覆。 交替过程可以重复任意次数。 喷射区域可以位于密封的喷雾隔离器外壳内并被气体排放喷嘴包围。

公开(公告)号：US07838071B2

公开(公告)日：2010-11-23

申请号：US11631622

申请日：2005-07-05

Applicant: Laurent Danel ,  Frédéric Lecomte ,  Nicolas Chomel

Inventor： Laurent Danel ,  Frédéric Lecomte ,  Nicolas Chomel

IPC: B05D7/22

CPC classification number: C23C16/511 ,  B05D1/62 ,  B05D3/0493 ,  B05D7/227 ,  C23C16/045

Abstract: A container-treatment method, of the type in which the container (12) is disposed inside a chamber (16) which defines a cavity (18) outside the container (12) and which is connected to a Vacuum pumping circuit (50), the interior of the container (12) being connected to the pumping circuit (50). The method includes a preliminary pumping step (E1) which is followed by a treatment step (E2). The preliminary step (E1) includes the following successive phases, namely: an external pumping phase (P1) which produces a drop in the pressure inside the cavity (18) only; and an internal pumping phase (P2) which produces a drop in the pressure inside the container (12) only. A machine used to implement the method is also disclosed.

Abstract translation: 一种容器处理方法，其中容器（12）设置在限定容器（12）外部并且连接到真空泵电路（50）的空腔（18）内的腔室（16）内， 容器（12）的内部连接到泵送回路（50）。 该方法包括初步泵送步骤（E1），其后是处理步骤（E2）。 初步步骤（E1）包括以下连续相，即仅产生空腔（18）内压力的外部泵送相（P1）; 和内部泵送相（P2），仅产生容器（12）内的压力下降。 还公开了用于实现该方法的机器。

公开(公告)号：US07829154B2

公开(公告)日：2010-11-09

申请号：US11665735

申请日：2005-10-21

Applicant: Satoshi Kobayashi ,  Yuki Iguchi

Inventor： Satoshi Kobayashi ,  Yuki Iguchi

IPC: B05D1/06 ,  B05B5/16

CPC classification number: B05B7/0012 ,  B05B5/025 ,  B05B5/087 ,  B05D1/06 ,  B05D3/0493 ,  B82Y10/00

Abstract: To provide a (homogeneous) particle deposit without any impurity contamination, on which only particles with a desired size are deposited. A solution, with particles dispersed in a solvent, is jetted as a flow of fine liquid droplets from a tip part of a capillary, and the jetted fine liquid droplets are electrically charged. This flow of the droplets is introduced into a vacuum chamber through a jet nozzle, as a free jet flow. The free jet flow that travels in the vacuum chamber is introduced into an inside of a deposition chamber, inside of which is set at lower pressure, through a skimmer nozzle provided in the deposition chamber, as an ion beam. Subsequently, by an energy separation device, only particles having particular energy are selected from the electrically charged particles in the flow, and are deposited on a deposited body disposed in an inside of the deposition chamber.

Abstract translation: 为了提供没有任何杂质污染的（均匀）颗粒沉积物，其上只沉积所需尺寸的颗粒。 将分散在溶剂中的颗粒的溶液作为毛细管的尖端部分的细液滴流喷射，并且喷射的细液滴被带电。 该液滴的流动通过喷嘴引入真空室，作为自由射流。 作为离子束，在真空室内行进的自由射流引入沉积室的内部，该沉积室的内部通过设置在沉积室中的分离器喷嘴设置在较低的压力下。 随后，通过能量分离装置，只有具有特定能量的颗粒从流动中的带电粒子中选择，并且沉积在沉积室内的沉积体上。

公开(公告)号：US20100098740A1

公开(公告)日：2010-04-22

申请号：US12643063

申请日：2009-12-21

Applicant: Stephen M. Blinn ,  Barry M. Zide

Inventor： Stephen M. Blinn ,  Barry M. Zide

IPC: A61K9/00 ,  A61P9/10

CPC classification number: C23C14/022 ,  A61F2/82 ,  A61F2/86 ,  A61F2250/0067 ,  A61L31/14 ,  A61L31/16 ,  A61L2300/00 ,  B05D1/02 ,  B05D3/0493 ,  B05D3/06 ,  C23C14/221 ,  C23C14/24 ,  C23C14/505 ,  C23C14/5833

Abstract: A method of controlling the drug release rate of a drug coated endovascular stent by depositing a drug material layer on the stent and then modifying the drug material using gas cluster ion beam irradiation to create a carbon matrix with interstices containing the original drug. The rate at which the drug elutes through the interstices can be controlled by processing parameters. Multiple layers may be employed to create time varying release rates.

Abstract translation: 一种通过在支架上沉积药物材料层，然后使用气体簇离子束照射来改变药物材料来控制药物包被的血管内支架的药物释放速率的方法，以产生含有原始药物的间隙的碳基质。 药物通过间隙洗脱的速率可以通过加工参数来控制。 可以采用多层来产生时变释放速率。

公开(公告)号：US07663121B2

公开(公告)日：2010-02-16

申请号：US11424368

申请日：2006-06-15

Applicant: Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Andrzej Kaszuba ,  Scott A. Hendrickson ,  Dustin W. Ho ,  Sanjeev Baluja ,  Tom Cho ,  Josephine Chang ,  Hichem M'Saad

Inventor： Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Andrzej Kaszuba ,  Scott A. Hendrickson ,  Dustin W. Ho ,  Sanjeev Baluja ,  Tom Cho ,  Josephine Chang ,  Hichem M'Saad

IPC: G01N23/00

CPC classification number: B05D3/067 ,  B05D3/0209 ,  B05D3/0493 ,  H01L21/31058

Abstract: An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.

Abstract translation: 紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。 串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。 每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。 紫外光可以在固化过程中被脉冲。 使用远程生成的氧自由基/臭氧和/或原位实现清洁室。 灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。