HIGH-VOLTAGE ENERGY-DISPERSIVE SPECTROSCOPY USING A LOW-VOLTAGE SCANNING ELECTRON MICROSCOPE
    31.
    发明申请
    HIGH-VOLTAGE ENERGY-DISPERSIVE SPECTROSCOPY USING A LOW-VOLTAGE SCANNING ELECTRON MICROSCOPE 有权
    使用低电压扫描电子显微镜的高压能量分散光谱

    公开(公告)号:US20150213995A1

    公开(公告)日:2015-07-30

    申请号:US14162802

    申请日:2014-01-24

    Abstract: A scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) apparatus that includes a scanning electron microscope, an x-ray detector, and an auxiliary acceleration voltage source. The scanning electron microscope includes a sample holder, and a layered electron beam column arranged to output an electron beam towards the sample holder at an initial beam energy. The auxiliary acceleration voltage source is to apply an auxiliary acceleration voltage between the sample holder and the layered electron beam column to accelerate the electron beam to a final beam energy. At the final beam energy, the electron beam is capable of generating x-rays at multiple wavelengths from a larger range of atomic species than the electron beam at the initial beam energy.

    Abstract translation: 包括扫描电子显微镜,X射线检测器和辅助加速电压源的扫描电子显微镜(SEM)和能量色散光谱(EDS)装置。 扫描电子显微镜包括样品保持器和分层电子束柱,其被布置成以初始光束能量朝向样品保持器输出电子束。 辅助加速电压源是在样品架和分层电子束柱之间施加辅助加速电压,以将电子束加速到最终的束能。 在最终光束能量下,电子束能够在起始光束能量下从原子物质的范围比电子束产生多个波长的x射线。

    METHOD FOR TRANSMITTING A BROADBAND ION BEAM AND ION IMPLANTER
    32.
    发明申请
    METHOD FOR TRANSMITTING A BROADBAND ION BEAM AND ION IMPLANTER 有权
    用于发射宽带离子束和离子植入物的方法

    公开(公告)号:US20150069261A1

    公开(公告)日:2015-03-12

    申请号:US14394591

    申请日:2012-08-06

    Abstract: A method for transmitting a broadband ion beam (100) and an ion implanter adopt an analyzing magnetic field (1), a calibration magnetic field (2) and an analyzing grating (6) to transmit a broadband ion beam. If the analyzing magnetic field (1) enables the broadband ion beam (100) emitted into the analyzing magnetic field from an incident face (101) thereof to be deflected anticlockwise in a horizontal direction, the calibration magnetic field (2) enables an ion beam diffusing again after passing through the analyzing grating (6) to be deflected clockwise in the horizontal direction; if the analyzing magnetic field (1) enables the broadband ion beam (100) emitted into the analyzing magnetic field from the incident face (101) thereof to be deflected clockwise in the horizontal direction, the calibration magnetic field (2) enables an ion beam diffusing again after passing through the analyzing grating (6) to be deflected anticlockwise in the horizontal direction. The analyzing magnetic field (1) and the calibration magnetic field (2) enable the ion beam to be deflected along different directions in the horizontal direction, so that distribution of the required ions in the broadband ion beam (100) when emitted out of the calibration magnetic field (2) from an emergence face (202) thereof is the same as the distribution when being emitted into the analyzing magnetic field.

    Abstract translation: 用于传输宽带离子束(100)和离子注入机的方法采用分析磁场(1),校准磁场(2)和分析光栅(6)来传输宽带离子束。 如果分析磁场(1)使得从其入射面(101)发射到分析磁场中的宽带离子束(100)在水平方向上逆时针偏转,则校准磁场(2)能够使离子束 在通过分析光栅(6)之后再次扩散以在水平方向上顺时针偏转; 如果分析磁场(1)使得从其入射面(101)发射到分析磁场中的宽带离子束(100)能够在水平方向上顺时针偏转,则校准磁场(2)能够使离子束 在通过分析光栅(6)之后再次扩散,以在水平方向上逆时针方向偏转。 分析磁场(1)和校准磁场(2)使得离子束沿水平方向沿着不同的方向偏转,使得当宽带离子束(100)中发射出来时,所需离子在宽带离子束(100)中的分布 来自其出射面(202)的校准磁场(2)与发射到分析磁场中时的分布相同。

    Beam line design to reduce energy contamination
    33.
    发明授权
    Beam line design to reduce energy contamination 有权
    梁线设计,以减少能源污染

    公开(公告)号:US08963107B2

    公开(公告)日:2015-02-24

    申请号:US13348855

    申请日:2012-01-12

    Abstract: Methods and apparatus for reducing energy contamination can be provided to a beam line assembly for ion implantation. Protrusions comprising surface areas and grooves therebetween can face neutral trajectories within a line of sight view from the workpiece within the beam line assembly. The protrusions can alter the course of the neutral trajectories away from the workpiece or cause alternate trajectories for further impacting before hitting a workpiece, and thereby, further reduce energy contamination for more sensitive implants.

    Abstract translation: 可以将用于减少能量污染的方法和装置提供给用于离子注入的束线组件。 包括其间的表面区域和凹槽的突起可以在来自光束线组件内的工件的视线范围内面对中性轨迹。 突起可以改变中性轨迹离开工件的过程,或者在撞击工件之前引起交替的轨迹以进一步冲击,从而进一步减少更敏感的植入物的能量污染。

    Spherical Aberration Corrector, Method of Spherical Aberration Correction, and Charged Particle Beam Instrument
    34.
    发明申请
    Spherical Aberration Corrector, Method of Spherical Aberration Correction, and Charged Particle Beam Instrument 有权
    球面畸变校正器,球面畸变校正方法和带电粒子束仪器

    公开(公告)号:US20150029593A1

    公开(公告)日:2015-01-29

    申请号:US14338542

    申请日:2014-07-23

    Applicant: JEOL Ltd.

    Abstract: A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector (100) is for use with a charged particle beam instrument (1) for obtaining the image and the diffraction pattern and has a hexapole field generating portion (110) for producing plural stages of hexapole fields, an octopole field superimposing portion (120) for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion (130) for deflecting a charged particle beam.

    Abstract translation: 提供了一种球面像差校正器,其允许校正图像和衍射图案中的至少一个的圆度的偏差和单独进行的轴上像差校正。 球面像差校正器(100)用于带电粒子束仪器(1),用于获得图像和衍射图案,并具有用于产生多级六极场的六极场产生部分(110),八极场叠加部分 (120),用于将至少一个六极场中的至少一个叠加八极杆,以校正图像和衍射图案中的至少一个的圆度的偏差,以及用于偏转带电粒子束的偏转部分(130)。

    Deceleration apparatus for ribbon and spot beams
    35.
    发明授权
    Deceleration apparatus for ribbon and spot beams 有权
    带和点光束减速装置

    公开(公告)号:US08941077B2

    公开(公告)日:2015-01-27

    申请号:US13280162

    申请日:2011-10-24

    Abstract: A deceleration apparatus capable of decelerating a short spot beam or a tall ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.

    Abstract translation: 公开了一种减速装置,能够使短点光束或高色带光束减速。 在任一种情况下,都会控制趋向于降低光束轮廓形状的效果。 提供了用于将离子束屏蔽到外部电位的盖子。 其位置和电位可调的电极设置在梁的相对两侧,以确保减速和偏转电场的形状不会显着偏离最佳形状,即使存在显着的空间电荷高 目前低能量的重离子束。

    Simultaneous electron detection
    40.
    发明授权
    Simultaneous electron detection 有权
    同时电子检测

    公开(公告)号:US08859966B2

    公开(公告)日:2014-10-14

    申请号:US13106726

    申请日:2011-05-12

    Abstract: The invention provides multiple detectors that detect electrons that have passed through a sample. The detectors preferably detect electrons after the electrons have been passed through a prism that separates electrons according to their energies. Electrons in different energy ranges are then detected by different detectors, with preferably at least one of the detectors measuring the energy lost by the electrons as they pass through the sample. One embodiment of the invention provides EELS on core-loss electrons while simultaneously providing a bright-field STEM signal from low-loss electrons.

    Abstract translation: 本发明提供了多个检测器,其检测已经通过样品的电子。 检测器优选在电子通过通过根据其能量分离电子的棱镜之后检测电子。 不同能量范围的电子然后由不同的检测器检测,优选地,至少一个检测器测量当电子通过样品时由电子损失的能量。 本发明的一个实施例为核心损耗电子提供EELS,同时从低损耗电子提供亮场STEM信号。

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