公开(公告)号：US3433922A

公开(公告)日：1969-03-18

申请号：US3433922D

申请日：1968-06-10

Applicant: MECH TRONICS CORP

Inventor： MCNABB LOUIS A

IPC: B23K15/06 ,  H01J37/063 ,  H01J37/07 ,  B23K9/02

CPC classification number: H01J37/07 ,  B23K15/06 ,  H01J37/063

公开(公告)号：US3273003A

公开(公告)日：1966-09-13

申请号：US25658863

申请日：1963-02-06

Applicant: HERAEUS GMBH W C

Inventor： WALTER DIETRICH

IPC: H01J1/18 ,  H01J1/94 ,  H01J37/07

CPC classification number: H01J1/94 ,  H01J1/18 ,  H01J37/07

公开(公告)号：US09878060B2

公开(公告)日：2018-01-30

申请号：US15120079

申请日：2015-01-21

Applicant: TETRA LAVAL HOLDINGS & FINANCE S.A.

Inventor： Håkan Mellbin

IPC: A61L2/00 ,  A61L2/08 ,  B65B55/08 ,  G21K5/02 ,  H01J37/07 ,  H01J37/24

CPC classification number: A61L2/087 ,  A61L2202/11 ,  A61L2202/23 ,  B65B55/08 ,  G21K5/02 ,  H01J37/07 ,  H01J37/242

Abstract: Sterilization device, in particular for sterilization of packaging material, comprising a first chamber, a barrier element and a connection area. The first chamber is adapted to provide charge carriers for sterilization, and the connection area is connected to a third chamber so that the barrier element forms at least one part of the boundary of a volume in which a first atmosphere exists.

公开(公告)号：US20170049914A1

公开(公告)日：2017-02-23

申请号：US15119577

申请日：2015-01-21

Applicant: Tetra Laval Holdings & Finance S.A.

Inventor： Jonas DICKNER ,  Håkan MELLBIN ,  Roger LINDGREN ,  Mats ÅKESSON

IPC: A61L2/08 ,  H01J37/16 ,  H01J37/24 ,  B65B3/00 ,  B65B55/08

CPC classification number: A61L2/087 ,  A61L2202/23 ,  B65B3/00 ,  B65B55/08 ,  G21K5/02 ,  H01J37/07 ,  H01J37/165 ,  H01J37/242

Abstract: Sterilization apparatus for sterilizing packaging containers, the sterilization apparatus comprising a first carousel for supporting a plurality of sterilization devices, the sterilization devices being adapted to sterilize an interior of the packaging containers by electron beam irradiation, and a transport system for transporting the packaging containers, the transport system comprising a second carousel coaxial with the first carousel, wherein the first carousel comprises a first rotatable shaft and the second carousel comprises a separate second rotatable shaft coaxial with the first rotatable shaft.

Abstract translation: 灭菌装置，对包装容器进行消毒，所述杀菌装置包括：用于支撑多个灭菌装置的第一转盘，所述灭菌装置适于通过电子束照射对所述包装容器的内部进行灭菌;以及运送所述包装容器的运送系统， 所述运输系统包括与所述第一转盘同轴的第二转盘，其中所述第一转盘包括第一可旋转轴，所述第二转盘包括与所述第一可旋转轴同轴的单独的第二可旋转轴。

公开(公告)号：US20170040140A1

公开(公告)日：2017-02-09

申请号：US14820160

申请日：2015-08-06

Applicant: Seagate Technology LLC

Inventor： Samuel L. Tanaka ,  Christopher L. Platt ,  Thomas L. Greenberg

IPC: H01J37/07 ,  H01J37/02 ,  G11B5/85 ,  C23C16/50

CPC classification number: H01J37/07 ,  C23C16/50 ,  G11B5/85 ,  H01J37/023 ,  H01J37/32018 ,  H01J37/3266 ,  H01J37/32669 ,  H01J2237/3321

Abstract: Provided herein is an apparatus comprising a deposition chamber with a cathode, and a means for creating an asymmetric field about the cathode.

Abstract translation: 本文提供了一种包括具有阴极的沉积室和用于产生围绕阴极的不对称场的装置的装置。

公开(公告)号：US09082586B2

公开(公告)日：2015-07-14

申请号：US14186366

申请日：2014-02-21

Applicant: NuFlare Technology, Inc.

Inventor： Nobuo Miyamoto

IPC: H01J37/304 ,  H01J37/317 ,  H01J3/26 ,  H01J37/07 ,  H01J37/06 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/06 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0653 ,  H01J2237/24585 ,  H01J2237/30461

Abstract: A cathode operating temperature adjusting method includes acquiring an approximate equation approximating a correlation between an emission current value in an electron beam source using a cathode and an operating temperature of the cathode at which a bias voltage becomes saturated at the emission current, measuring a current density of an electron beam from the cathode when in the state where an n-th emission current value and an n-th cathode operating temperature are set in the electron beam source, determining whether the measured current density is within a first tolerance range, changing the n-th emission current value to an (n+1)th emission current value when the measured current density is not within the first tolerance range, calculating an operating temperature of the cathode corresponding to the (n+1)th emission current value by the approximate equation, and setting the calculated operating temperature, as an (n+1)th cathode operating temperature, in the electron beam source.

Abstract translation: 阴极工作温度调节方法包括获取接近于使用阴极的电子束源中的发射电流值与在发射电流下偏置电压饱和的阴极的工作温度之间的相关性的近似方程，测量电流密度 当在电子束源中设置第n个发射电流值和第n个阴极操作温度的状态下，确定所测量的电流密度是否处于第一公差范围内，从而改变阴极的电子束 当测量的电流密度不在第一公差范围内时，将第n发射电流值设置为第（n + 1）个发射电流值，通过以下方式计算与第（n + 1）个发射电流值对应的阴极的工作温度： 近似等式，并将计算出的工作温度设定为电子束源中的第（n + 1）个阴极工作温度。

公开(公告)号：US09070527B2

公开(公告)日：2015-06-30

申请号：US14000988

申请日：2011-02-25

Applicant: Hiroshi Yasuda

Inventor： Hiroshi Yasuda

IPC: H01J29/48 ,  H01J1/148 ,  H01J1/26 ,  H01J37/075 ,  H01J37/317 ,  H01J37/065 ,  H01J37/07 ,  H01J37/26 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J29/485 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/148 ,  H01J1/26 ,  H01J37/065 ,  H01J37/07 ,  H01J37/075 ,  H01J37/26 ,  H01J37/3174

Abstract: An electron gun cathode (104) is column shaped, and emits electrons by being heated. A holder (103), which covers the bottom and sides of the electron gun cathode, has electrical conductivity and holds the electron gun cathode, and is composed of a material that does not easily react with the electron gun cathode when in a heated state, is provided. The tip of the electron gun cathode (104) protrudes from the holder (103) so as to be exposed, and electrons are emitted from the tip toward the front by applying an electric field to the tip.

Abstract translation: 电子枪阴极（104）为柱状，通过加热发射电子。 覆盖电子枪阴极的底部和侧面的保持器（103）具有导电性并保持电子枪阴极，并且由处于加热状态时不易与电子枪阴极反应的材料构成， 被提供。 电子枪阴极（104）的尖端从保持器（103）突出以露出，并且通过向尖端施加电场，从尖端向前方发射电子。

公开(公告)号：US20140239175A1

公开(公告)日：2014-08-28

申请号：US13779142

申请日：2013-02-27

Applicant: FEI COMPANY

Inventor： Mostafa Maazouz

IPC: H01J3/02 ,  H01J37/04

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/04 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/248 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/1518 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

Abstract translation: 本发明提供了一种带电粒子束系统，其中聚焦离子束列的中间部分被偏压到高的负电压，允许光束以比该塔的该部分内的最终光束能量更高的电位移动。 在低kV电位下，像差和库仑相互作用减小，这导致光斑尺寸的显着改善。

公开(公告)号：US20140014850A1

公开(公告)日：2014-01-16

申请号：US13937321

申请日：2013-07-09

Applicant: Mapper Lithography IP B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Remco JAGER ,  Alexander Hendrik Vincent VAN VEEN ,  Stijn Willem Herman Karel STEENBRINK

IPC: H01J37/317

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

Abstract: The invention relates to a charged particle lithography system for patterning a target. The lithography system has a beam generator for generating a plurality of charged particle beamlets, a beam stop array with a beam-blocking surface provided with an array of apertures; and a modulation device for modulating the beamlets by deflection. The modulation device has a substrate provided with a plurality of modulators arranged in arrays, each modulator being provided with electrodes extending on opposing sides of a corresponding aperture. The modulators are arranged in groups for directing a group of beamlets towards a single aperture in the beam stop array. Individual modulators within each group have an orientation such that a passing beamlet, if blocking is desired, is directed to a blocking position onto the beam stop array. Beamlet blocking positions for different beamlets are substantially homogeneously spread around the corresponding single aperture in the beam stop array.

公开(公告)号：US20100026161A1

公开(公告)日：2010-02-04

申请号：US12446584

申请日：2007-10-18

Applicant: Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

Inventor： Eiichi Iijima ,  Guo Hua Shen ,  Tohru Satake

IPC: H01J29/48

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/004 ,  H01J2237/182

Abstract: [Object] In the control of electron beam focusing of a pierce-type electron gun, any influences from the space charge effect and space charge neutralizing action within the electron gun are eliminated to attain complete control of an electron beam.[Solving Means] Feedback control of the pressure within the electron gun is performed by directly measuring temperature at an internal of the pierce-type electron gun. It is desirable that locations where the direct measurement of the temperature at the internal of the electron gun is performed are an anode (39) and a flow register (43). Further, the direct measurement can be performed at any one of a ring, an aperture and an exhaust pipe provided at an outlet or an inlet of any one of a cathode chamber (31), an intermediate chamber, and a scanning chamber (33). Accordingly, all of stabilization of beam producing area (optimized design of electron gun itself), stabilization of beam transporting portion and stabilization of beam using portion have become appropriate.

Abstract translation: 目的在穿透型电子枪的电子束聚焦的控制中，消除了电子枪内的空间电荷效应和空间电荷中和作用的任何影响，以完全控制电子束。 [解决方法]电子枪内的压力的反馈控制通过直接测量穿孔式电子枪内部的温度来进行。 期望进行电子枪内部的温度的直接测量的位置是阳极（39）和流动寄存器（43）。 此外，直接测量可以在设置在阴极室（31），中间室和扫描室（33）中的任一个的出口或入口处的环，孔和排气管中的任一个处进行， 。 因此，射束产生区域的所有稳定（电子枪本身的优化设计），光束传送部分的稳定和光束使用部分的稳定已经变得合适。