METHOD FOR FABRICATING A FILM
    44.
    发明公开

    公开(公告)号:US20230347379A1

    公开(公告)日:2023-11-02

    申请号:US17608275

    申请日:2020-04-22

    Abstract: A method for fabricating a film comprising at least one polymer layer, formed of polyazulene, or of a copolymer, wherein one of the monomers is azulene, or of any combination thereof, wherein the film is situated on at least one surface of a substrate, is disclosed. The method comprises the steps of: a) forming an oxidant layer on a deposition surface by applying a solution comprising an oxidant on the deposition surface; b) forming a polymer layer formed of polyazulene, or of a copolymer, wherein one of the monomers is azulene, or of any combination thereof, by exposing the deposition surface to at least azulene monomer vapour at a polymerization temperature of 20 - 95° C. under atmospheric pressure, wherein step a) precedes step b), and wherein, during step b), the temperature of the deposition surface differs from the polymerization temperature by 0 - 30° C.

    SUBSTRATE PROCESSING APPARATUS
    48.
    发明公开

    公开(公告)号:US20230311153A1

    公开(公告)日:2023-10-05

    申请号:US18101121

    申请日:2023-01-25

    CPC classification number: B05C5/001 B05C11/08 B05D1/005

    Abstract: A substrate processing apparatus, which may suppress occurrence of temperature deviation caused by an air current, is provided. The substrate processing apparatus includes a chamber including an upper body and a lower body and having a processing space formed therein by the upper body and the lower body, a substrate support unit disposed in the processing space and having a support surface on which the substrate is supported, a heater disposed to heat gas in the processing space, an introduction unit configured to supply gas toward an edge of the support surface, and a discharge unit configured to discharge the gas in the processing space. The discharge unit may include a plurality of outlets spaced apart from a centerline of the support surface in the upper body and disposed to be closer to the centerline of the support surface than to the introduction unit.

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